@article{1307436,
  author = {Daniel Josell and Zhitian Shi and Konstantins Jefimovs and Joan Vial Comamala and Alexandre Pereira and Marco Stampanoni and Lucia Romano},
  title = {Deep-reactive-ion-etching in X-ray grating fabrication: a review},
  year = {2025},
  number = {201},
  month = {2025-09-08 04:09:00},
  publisher = {Materials Science in Semiconductor Processing},
  url = {https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=960121},
  doi = {https://doi.org/10.1016/j.mssp.2025.110041},
  language = {en},
}