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A single-atom-thick sheet of carbon known as graphene has remarkable properties on its own, but things can get even more interesting when you stack up multiple
Max Planck, one of the Twentieth Century’s most eminent physicists, observed, "An experiment is a question that science poses to Nature, and a measurement is
Theoretical work relevant to the determination of values of the fundamental constants, tests of bound-state quantum electrodynamics (QED), and methods of
Every four years, the Committee on Data for Science and Technology (CODATA) issues recommended values of the fundamental physical constants. The values are
Much of the activity of the UV Physics Group is aimed at supporting the R&D effort by the microelectronics industry to develop Extreme Ultraviolet Lithography
Optical systems that operate at wavelengths in the ultraviolet (UV) and extreme-ultraviolet (EUV) are susceptible to degradation by a number of different
William Borders, Advait Madhavan, Matthew Daniels, Vasileia Georgiou, Martin Lueker-Boden, Tiffany Santos, Patrick Braganca, Mark Stiles, Jabez J. McClelland, Brian Hoskins
The increasing scale of neural networks needed to support more complex applications has led to an increasing requirement for area- and energy-efficient hardware
Albert Davydov, Yaw S. Obeng, Ndubuisi George Orji, Umberto Celano, Daniel Schmidt, Carlos Beitia
The international roadmap of devices and systems (IRDS) projects that 2D materials will be inserted into high-volume manufacturing as channel materials, mostly
Olga Ridzel, Wataru Yamane, Ishiaka Mansaray, John S. Villarrubia
We are beginning projects to validate the physics models used for interpretation of electron microscopy images. In one, we will measure electron yields and
An electron hologram is a fringe modulated image containing the amplitude and phase information of an electron transparent object. The HolograFREE routines
The new beamline 10, currently under construction, is intended for applications that make use of the super-thermal brightness from SURF in the near- to mid
Beamline 5 of the Synchrotron Ultraviolet Radiation Facility is a diagnostics end-station used to determine the transverse size of the stored electron beam. The
The NIST/DARPA EUV Reflectometry facility began in the late 1980's to make measurements of the reflectivity of EUV multilayer optics for lithography. Since then
Beamline 8 is used to study the degradation of surfaces that are irradiated by EUV radiation in the presence of common outgas species. Its multilayer mirror