METROLOGY FOR ROLL-TO-ROLL NANOIMPRINT LITHOGRAPHY

 

Hongtao Zhang, Gregg Gallatin, J. Alexander Liddle

 

Roll-to-Roll (R2R) nanoimprint lithography (NIL) can continuously fabricate nano-scale structures on flexible substrate at high throughput and low cost.  A fast cheap online metrology for R2R nanoimprint will become vital for enabling cost effective nanomanufacturing. However, existing methods for nanoscale testing, such as scanning electron microscopy (SEM) and atomic force microscopy (AFM), are expensive, offline, time-consuming, and destructive. Therefore they are not suitable for high speed online metrology. In this presentation we proposed a “matched optical filter” approach which monitors the change in reflectivity of the combination of the nanostructure with a “matched optical filter” as the nanostructure moves with the flexible substrate (web). This method is intrinsically fast, simple, lightweight, non-contact, and non-destructive.