Stability in Nanoimprinted Structures

Author:  K. J. Alvine

Mentor:  Christopher Soles

Office: (301) 975-5891

Fax: (301) 975-3928

Email: kalvine@nist.gov

nonmember

Category: Physics / Materials

Patterning nanoscale features with Nanoimprint Lithography is strongly affected by surface forces, where mold adhesion can delaminate or fracture nanoscale features and capillary forces can induce pattern decay or collapse.  Fluorinated surfactants are useful for reducing mold adhesion, yet the effects of these additives on the nanostructure stability are not yet well understood.  Here we present thermal stability studies on nanoimprinted patterns with fluorinated surfactant additives.  We investigate the effect of this surfactant on both pattern height decay and novel capillary force driven lateral instabilities.