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You searched on: Topic Area: Manufacturing Sorted by: title

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Displaying records 971 to 980 of 1000 records.
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971. Testing Interoperability Standards - A Test Case Generation Methodology
Topic: Manufacturing
Published: 6/16/2010
Authors: Nenad Ivezic, Jungyub Woo
Abstract: Over many years, National Institute of Standards and Technology (NIST) built test beds to support interoperability standards development and their implementation within software applications. A general test framework has been proposed to enhance new ...

972. Testing System of IEEE 1451.5-802.11 Standard-based Wireless Sensors
Topic: Manufacturing
Published: Date unknown
Authors: Kang B Lee, Yuyin Song, Frederick M Proctor
Abstract: The hierarchical architecture of factory equipment networks consists of the factory level, cell level, and device level. The equipment at different levels of the factory networks may employ different network communication protocols. The challenges th ...

973. Testing the Digital Thread in Support of Model-Based Manufacturing and Inspection
Topic: Manufacturing
Published: 3/8/2016
Authors: Thomas D Hedberg, Joshua Lubell, Lyle Fischer, Larry Maggiano, Allison Barnard Feeney
Abstract: A number of manufacturing companies have reported anecdotal evidence describing the benefits of Model-Based Enterprise (MBE). Based on this evidence, the entire industry has embraced a vision to deploy MBE. In our view, the best chance of realizing ...

974. The Advanced Angle Metrology System at NIST
Topic: Manufacturing
Published: 11/1/2003
Author: Jack A Stone Jr.
Abstract: At the National Institute of Standards and Technology, our best capability for angle measurement is our Advanced Automated Master Angle Calibration System (AAMACS). This instrument is based on a triple-stack of indexing tables, used in conjunction w ...

975. The Biological Evidence Preservation Handbook: Best Practices for Evidence Handlers
Series: NIST Interagency/Internal Report (NISTIR)
Report Number: 7928
Topic: Manufacturing
Published: 4/23/2013
Authors: Susan M Ballou, Margaret C Kline, Mark David Stolorow, Melissa K Taylor, Shannan R Williams, Phylis S Bamberger, Burney Yvette, Larry Brown, Cynthia E. Jones, Ralph Keaton, William Kiley, Karen Thiessen, Gerry LaPorte, Joseph Latta, Linda E Ledray, Randy Nagy, Linda Schwind, Stephanie Stoiloff, Brian Ostrom
Abstract: The report of the Technical Working Group on Biological Evidence Preservation offers guidance for individuals involved in the collection, examination, tracking, packaging, storing, and disposition of biological evidence. This may include crime sc ...

976. The Calculation of CMM Measurement Uncertainty via The Method of Simulation by Constraints
Topic: Manufacturing
Published: 1/1/1997
Authors: Steven David Phillips, Bruce R. Borchardt, Daniel S Sawyer, William Tyler Estler, David E Ward, K Eberhardt, M. Levenson, Marjorie A McClain, B Melvin, Ted Hopp, Y Shen
Abstract: The calculation of task specific measurement uncertainty when using coordinate measuring machines is an important and challenging task. Current methods to address this issue use simulation techniques (e.g., the virtual CMM) where the propagation of k ...

977. The Challenge of Nanometrology
Topic: Manufacturing
Published: 7/1/2002
Author: Michael T Postek
Abstract: The promise and challenge of nanotechnology is immense. The National Nanotechnology Initiative provides an opportunity to develop a new technological base for U.S. Industry. Nanometrology is the basis of the new measurement methods that must be devel ...

978. The Challenges of Nanometrology
Topic: Manufacturing
Published: 1/1/2002
Author: Michael T Postek
Abstract: The promise and challenge of nanotechnology is immense. The National Nanotechnology Initiative provides an opportunity to develop a new technological base for U.S. Industry. Nanometrology is the basis of the new measurement methods that must be dev ...

979. The Coming of Age of Tilt CD-SEM
Topic: Manufacturing
Published: 3/1/2007
Authors: B Bunday, J Allgair, E Solecky, C Archie, Ndubuisi George Orji
Abstract: The need for 3D metrology is becoming more urgent to address critical gaps in metrology for both lithographic and etch processes. Current generation lithographic processing (ArF source, where lambda=193 nm) sometimes results in photoresist lines with ...

980. The DOE2000 Materials MicroCharacterization Collaboratory
Topic: Manufacturing
Published: 1/1/1998
Authors: E Voelkl, K Alexander, J Mabon, M O'Keefe, Michael T Postek, M Wright, N J Zaluzec
Abstract: The Materials Microcharacterization Collaboratory (MMC) was created last year as a pilot project within the U.S. Department of Energy''s DOE2000 program. The DOE2000 program has, as its main goals, to develop improved capabilities for solving DOE''s ...

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