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971. Tip Characterization for Dimensional Nanometrology
Topic: Manufacturing
Published: 1/1/2004
Author: John S Villarrubia
Abstract: Abstract: Technological trends are increasingly requiring dimensional metrology at size scales below a micrometer. Scanning probe microscopy has unique advantages in this size regime, but width and roughness measurements must be corrected for imagin ...

972. Tip Characterization for Scanned Probe Microscope Width Metrology
Topic: Manufacturing
Published: 3/1/1998
Authors: Samuel Dongmo, John S Villarrubia, Samuel N Jones, Thomas B Renegar, Michael T Postek, Jun-Feng Song
Abstract: Determination of the tip shape is an important prerequisite for converting the various scanning probe microscopies form imaging tools into dimensional metrology tools with sufficient accuracy to meet the critical dimension measurement requirements of ...

973. Tip and Surface Reconstruction in Scanned Probe Microscopy
Topic: Manufacturing
Published: 1/1/1997
Author: John S Villarrubia
Abstract: The non-vanishing size of tips in scanned probe microscopes (e.g., atomic force microscope or scanning tunneling microscope) results in imaging errors. Correction of these errors requires estimation of the tip shape (tip reconstruction) followed by e ...

974. Tolerancing Form Deviations for NIST Standard Reference Material (SRM) 2809 Rockwell Diamond Indenters
Topic: Manufacturing
Published: 1/1/2007
Authors: Jun-Feng Song, Samuel Rea Low III, Li Ma
Abstract: The National Institute of Standards and technology (NIST) plans to develop Standard Reference Material (SRM) 2809 Rockwell Diamond Indenter to support Rockwell hardness standardization.  Most tolerances of the SRM indenters are adopted from thos ...

975. Tolerancing Form Deviations for Rockwell Diamond Indenters
Topic: Manufacturing
Published: 9/1/2002
Authors: Jun-Feng Song, Samuel Rea Low III, Li Ma
Abstract: The spherical tip of Rockwell diamond indenters tends to be manufactured either a flat- or sharp-shaped surface because of the anisotropy property of the diamond. This can cause significant differences in the hardness readings. In order to control th ...

976. Topography Measurements and Applications
Topic: Manufacturing
Published: 1/1/2006
Authors: Jun-Feng Song, Theodore Vincent Vorburger
Abstract: Based on auto- and cross-correlation functions (ACF and CCF), a new surface parameter called profile (or topography) difference, Ds, has been developed for quantifying differences between 2D profiles or between 3D topographies with a single number. & ...

977. Topography Measurements for Determining the Decay Factors in Surface Replication
Topic: Manufacturing
Published: 7/4/2008
Authors: Jun-Feng Song, P Rubert, Xiaoyu A Zheng, Theodore Vincent Vorburger
Abstract: The electro-forming technique is used at National Institute of Standards and Technology (NIST) for the production of standard reference material (SRM) 2461 standard casings to support nationwide ballistics measurement traceability and measurement q ...

978. Toward Accurate Linewidth Metrology Using Atomic Force Microscopy and Tip Characterization
Topic: Manufacturing
Published: 5/1/1996
Authors: Ronald G Dixson, J Schneir, T Mcwaid, N. Sullivan, V W. Tsai, S Zaidi, S Brueck
Abstract: As the critical dimensions of integrated circuit features decrease toward 0.18 um, feature width measurements with nanometer level accuracy will become increasingly important to the semiconductor processing industry. Atomic force microscopy (AFM) off ...

979. Toward Accurate Measurements of Pitch, Height, and Width Artifacts with the NIST Calibrated AFM
Topic: Manufacturing
Published: 1/1/1996
Authors: Ronald G Dixson, Theodore Vincent Vorburger, P Sullivan, V W. Tsai, T Mcwaid
Abstract: Atomic force microscope (AFM) measurements are being used increasingly for metrological applications such as semiconductor process development and control. Common types of measurements are those of feature spacing (pitch), feature height (or depth), ...

980. Toward Nanometer Accuracy Measurements
Topic: Manufacturing
Published: 6/1/1999
Authors: John A Kramar, E Amatucci, David E. Gilsinn, Jay Shi Jun, William B. Penzes, Fredric Scire, E Clayton Teague, John S Villarrubia
Abstract: We at NIST are building a metrology instrument called the Molecular Measuring Machine (MMM) with the goal of performing 2D point-to-point measurements with one nanometer accuracy cover a 50 mm by 50 mm area. The instrument combines a scanning tunneli ...

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