NIST logo

Publications Portal

You searched on:
Topic Area: Manufacturing
Sorted by: title

Your search results exceeded 1,000 records. Please refine your search and try again.
Displaying records 971 to 980 of 1000 records.
Resort by: Date / Title


971. Scanning Electron Microscope Dimensional Metrology using a Model-based Library
Topic: Manufacturing
Published: 1/1/2005
Authors: John S Villarrubia, Andras Vladar, Michael T Postek
Abstract: The semiconductor electronics industry places significant demands upon secondary electron imaging to obtain dimensional measurements that are used for process control or failure analysis. Tolerances for measurement uncertainty and repeatability are ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=822374

972. Scanning Electron Microscope Length Standards (Chapter VII in: Benchmarking the Length Measurement Capabilities of the National Institute of Standards and Technology, R.M. Silver, J.L. Land, Editors, NISTIR 6036)
Series: NIST Interagency/Internal Report (NISTIR)
Report Number: 6036
Topic: Manufacturing
Published: 1/1/1998
Authors: Michael T Postek, Joseph Fu
Abstract: A cross-section of length measurement capabilities fiom the Precision Engineering Division within the National Institute of Standards and Technology is benchmarked against those of other leading National Measurement Institutes. We present a variety ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820863

973. Scanning Electron Microscope Metrology
Topic: Manufacturing
Published: 1/1/1994
Author: Michael T Postek
Abstract: During the manufacturing of present-day integrated circuits, certain measurements must be made of the submicrometer structures composing the device with a high degree of precision. Optical microscopy, scanning electron microscopy and the various form ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820702

974. Scanning Electron Microscopy at the National Institute of Standards and Technology
Topic: Manufacturing
Published: 1/1/1995
Author: Michael T Postek
Abstract: An attitude has developed that the results of any SEM measurement arc absolutely true. If this were the case, there would be no need for standards and no metrological problems would exist in making submicrometer measurements. Multiple, basic errors a ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820755

975. Scanning electron microscope dimensional metrology using a model-based library
Topic: Manufacturing
Published: 11/1/2005
Authors: John S Villarrubia, Andras Vladar, Michael T Postek
Abstract: The semiconductor electronics industry places significant demands upon secondary electron imaging to obtain dimensional measurements that are used for process control or failure analysis. Tolerances for measurement uncertainty and repeatability are s ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=822537

976. Scatterfield Optical Imaging for sub-10 nm Dimensional Metrology
Topic: Manufacturing
Published: 1/1/2009
Author: Richard M Silver
Abstract: Recent developments in optical microscopy promise to advance optical metrology and imaging to unprecedented levels through theoretical and experimental development of a new measurement technique called "scatterfield optical imaging". ". Current met ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=901009

977. Scattering From Sinusoidal Gratings
Topic: Manufacturing
Published: 9/1/1997
Authors: B C. Park, Theodore Vincent Vorburger, Thomas Avery Germer, Egon Marx
Abstract: Laser light scattering from holographic sinusoidal gratings has been investigated with a view to its use in the calibration of the linearity of BRDF instruments, a task that requires a wide dynamic range in the scattered intensity. An aluminum-coated ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820855

978. Scattering by Dielectric Strips on a Dielectric Layer of Finite Thickness
Topic: Manufacturing
Published: 1/1/2004
Author: Egon Marx
Abstract: Accurate simulation of optical images of lines and trenches placed on semiconductors are of great interest to industry, especially in the overlay process.  Similarly, optical images of photomasks in the transmission mode are also of interest. &n ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=823169

979. Scattering by Wedges
Topic: Manufacturing
Published: 1/1/2003
Author: Egon Marx
Abstract: Some of the components of the fields produced by an incident plane monochromatic wave scattered by a wedge diverge near the edge of the wedge. Rigorous solutions for the fields scattered by a perfectly conducting infinite wedge have been obtained, bu ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=822043

980. Scattering by a Dielectric Wedge for Oblique Incidence
Topic: Manufacturing
Published: 1/1/2002
Author: Egon Marx
Abstract: Electromagnetic scattering of an incident plane monochromatic wave by dielectric or finitely conducting infinite cylinders of arbitrary cross section can be reduced to the solution of scalar Helmholtz equations in two dimensions for the components of ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=822431



Search NIST-wide:


(Search abstract and keywords)


Last Name:
First Name:







Special Publications:

Looking for a NIST Special Publication (NIST SP Series)? Place the series number and dash in the report number field (Example: 800-) and begin your search.

  • SP 250-XX: Calibration Services
  • SP 260-XX: Standard Reference Materials
  • SP 300-XX: Precision Measurement and Calibration
  • SP 400-XX: Semiconductor Measurement Technology
  • SP 480-XX: Law Enforcement Technology
  • SP 500-XX: Computer Systems Technology
  • SP 700-XX: Industrial Measurement Series
  • SP 800-XX: Computer Security Series
  • SP 823-XX: Integrated Services Digital Network Series