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Topic Area: Manufacturing
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Displaying records 951 to 960 of 1000 records.
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951. SEM Image Sharpness Analysis
Topic: Manufacturing
Published: 1/1/1996
Authors: Michael T Postek, Andras Vladar
Abstract: The technique described here, utilizing the sharpness concept, is facilitated by the use of the FFT techniques to analyze the electron micrograph to obtain the evaluation. This is not the first application of Fourier techniques to SEM images, but it ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820808

952. SEM Performance Evaluation Using the Sharpness Criterion
Topic: Manufacturing
Published: 5/1/1996
Authors: Michael T Postek, Andras Vladar
Abstract: Fully automated or semi-automated scanning electron microscopes (SEM) are now commonly used in semiconductor production and other forms of manufacturing. The industry requires that an automated instrument must be routinely capable of 5 nm resolution ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820809

953. SEM Sentinel - SEM Performance Measurement System
Topic: Manufacturing
Published: 1/1/2001
Authors: Bradley N Damazo, Andras Vladar, Alice V. Ling, M. Alkan Donmez, Michael T Postek, Crossley E Jayewardene
Abstract: This paper describes the design and implementation of a system for monitoring the performance of a critical dimension measurement scanning electron microscope (CD-SEM). Experiments were performed for tests involving diagnosis of the vacuum system an ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=823137

954. SEM Sentinel - SEM Performance Measurement System, Part 1
Series: NIST Interagency/Internal Report (NISTIR)
Report Number: 6498
Topic: Manufacturing
Published: 4/1/2000
Authors: Alice V. Ling, Andras Vladar, Bradley N Damazo, M. Alkan Donmez, Michael T Postek
Abstract: This report describes the current design of a system for monitoring the performance of several major subsystems of a scanning electron microscope (SEM). The following subsystems and the associated functional parameters will be monitored. 1) Vacuum sy ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=821786

955. SEM Sentinel-SEM Performance Measurement System
Topic: Manufacturing
Published: 8/1/2001
Authors: Bradley N Damazo, Andras Vladar, Alice V. Ling, M. Alkan Donmez, Michael T Postek, Crossley E Jayewardene
Abstract: This paper describes the design and implementation of a system for monitoring the performance of a critical dimension measurement scanning electron microscope (CD-SEM). Experiments were performed for tests involving diagnosis of the vacuum system and ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=821586

956. SI Traceability of Force at the Nanonewton Level
Topic: Manufacturing
Published: 1/1/2001
Authors: David B Newell, Jon Robert Pratt, John A Kramar, Douglas T Smith, L Feeney, Edwin Ross Williams
Abstract: Although nanonewton force measurements are commonplace in industry, no National Measurement Institute supports a link to the International System of Units (SI) below one newton. The National Institute of Standards and Technology has launched a five-y ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=821766

957. SIMULATION-BASED DESIGN CONCEPT EVALUATION FOR AMBULANCE PATIENT COMPARTMENTS
Topic: Manufacturing
Published: 5/19/2014
Authors: Deogratias Kibira, Yung-Tsun Tina Lee, Jennifer Lyn Marshall, Allison Barnard Feeney, Larry Avery, Allie Jacobs
Abstract: To address the inadequacy of existing standards regarding interior layout design, the Department of Homeland Security (DHS) Science and Technology Directorate, the National Institute of Standards and Technology (NIST), the National Institute for Occu ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=914864

958. SIMULATIONS OF NOISE-PARAMETER VERIFICATION USING CASCADE WITH ISOLATOR OR MISMATCHED TRANSMISSION LINE
Topic: Manufacturing
Published: 11/30/2007
Authors: James Paul Randa, Ken Wong, Roger Pollard
Abstract: Results are presented for simulations of a verification process for noise-parameter measurements. The verification process consists of first measuring separately both a passive device and the amplifier or transistor of interest (the DUT) and then mea ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=32814

959. SPM-Based Lithography for Electronics Device Fabrication: New Strategies and Directions
Topic: Manufacturing
Published: 1/1/1995
Author: John A Dagata
Abstract: Direct patterning of a semiconductor surface to produce an ultrathin oxide mask has proven to be a promising approach for integrating lithographic methods based on scanned probe microscopy (SPM) into existing electronics device processing. The result ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820730

960. SRM 2460/2461 Standard Bullets and Casings Project
Topic: Manufacturing
Published: 7/10/2002
Authors: Jun-Feng Song, Eric Paul Whitenton, David R Kelley, Robert A. Clary, L Ma, Susan M Ballou, M Ols
Abstract: The National Institute of Standards and Technology (NIST) Standard Reference Material (SRM) 2460/2461 standard bullets and casings project will provide support to firearms examiners and to the National Integrated Ballistics Information Network (NIBIN ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=822361



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