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Displaying records 951 to 960 of 1000 records.
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951. The Estimation of Measurement Uncertainty of Small Circular Features Measured by Coordinate Measuring Machines
Topic: Manufacturing
Published: 4/1/1998
Authors: Steven David Phillips, Bruce R. Borchardt, William Tyler Estler, J Buttress
Abstract: This paper examines the measurement uncertainty of small circular features as a function of the sampling strategy; i.e., the number and distribution of measurement points. Specifically, we examine measuring a circular feature using a three-point samp ...

952. The Gage Block Handbook
Series: Monograph (NIST MN)
Report Number: 180
Topic: Manufacturing
Published: 6/1/1995
Authors: Theodore D Doiron, John S Beers
Abstract: Gage blocks are the primary method used by industry to standardize the measurement of dimension. This work discusses every aspect of gage block calibration, including definitions, characteristics of gage blocks, calibration by interferometry and mech ...

953. The Geometric Characterization of Rockwell Diamond Indenters
Topic: Manufacturing
Published: 1/1/1994
Authors: Jun-Feng Song, F Rudder, Theodore Vincent Vorburger, A Hartman, Brian R Scace, J Smith
Abstract: By using a stylus instrument, a series of calibration and check standards, and calibration and uncertainty calculation procedures, we have calibrated Rockwell diamond indenters with a traceability to fundamental measurements. The combined measurement ...

954. The Guidelines for Expressing Measurement Uncertainties and the 4:1 Test Uncertainty Ratio
Topic: Manufacturing
Published: 1/1/1997
Author: Jun-Feng Song
Abstract: In 1988, MIL-STD-45662A adopted the 4:1 Test Uncertainty Ratio (TUR); this was later incorporated into the ANSI/NCSL Z540-1 standard in 1994. However, in 1992, the National Institute of Standards and Technology (NIST) began to adopt a new method for ...

955. The Helium Ion Microscope: A New Tool for Nanotechnology and  Nanomanufacturing
Topic: Manufacturing
Published: 9/1/2007
Authors: Michael T Postek, Andras Vladar, John A Kramar, L A Stern, John Notte, Sean McVey
Abstract: Helium Ion Microscopy (HIM) is a new, potentially disruptive technology for nanotechnology and nanomanufacturing. This methodology presents a potentially revolutionary approach to imaging and measurements which has several potential advantages over t ...

956. The Impact of Scenario Development on the Performance of Speech Translation Systems Prescribed by the SCORE Framework
Topic: Manufacturing
Published: 9/25/2009
Authors: Brian A Weiss, Craig I Schlenoff
Abstract: The Defense Advanced Research Projects Agency's (DARPA) Spoken Language Communication and Translation for Tactical Use (TRANSTAC) program is a focused advanced technology research and development program. The intent of the TRANSTAC program is to ...

957. The Influence of Defects on the Morphology of Si (111) Etched in NHF
Topic: Manufacturing
Published: 1/1/2005
Authors: Hui Zhou, Joseph Fu, Richard M Silver
Abstract: We have implemented a kinetic Monte-Carlo (KMC) simulation to study the morphologies of Si (111) surfaces etched in NHF. Although our initial simulations reproduced the previous results from Hines, it failed to produce the morphologies observed in ou ...

958. The International Standard of Length
Topic: Manufacturing
Published: 1/1/1994
Author: Dennis A Swyt
Abstract: This chapter discusses the modern concept of traceability as it applies to CMM measurements of manufactured parts. It shows the means by which those dimensional measurements are functionally related to the international standard of length, the variou ...

959. The Limits of Image-Based Optical Metrology
Topic: Manufacturing
Published: 3/1/2006
Authors: Richard M Silver, Bryan M Barnes, Ravikiran Attota, Jay Shi Jun, James J Filliben, Juan Soto, Michael T. Stocker, P Lipscomb, Egon Marx, Heather J Patrick, Ronald G Dixson, Robert D. Larrabee
Abstract: An overview of the challenges encountered in imaging device-sized features using optical techniques recently developed in our laboratories is presented in this paper.  We have developed a set of techniques we refer to as scatterfield microscopy ...

960. The Measurement and Uncertainty of a Calibration Standard for the SEM
Topic: Manufacturing
Published: 3/1/1994
Authors: Joseph Fu, M Croarkin, Theodore Vincent Vorburger
Abstract: Standard Reference Material 484 is an artifact for calibration the magnification scale of a Scanning Electron Microscope (SEM) within the range of 1000X to 20000X. Seven issues, SRM-484, and SRM-484a to SRM-484f, have been certified between 1977 and ...

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