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951. The Potentials of Helium Ion Microscopy for Semiconductor Process Metrology
Topic: Manufacturing
Published: 2/6/2008
Authors: Michael T Postek, Andras Vladar
Abstract: Semiconductor manufacturing is always looking for more effective ways to monitor and control the manufacturing process. Helium Ion Microscopy (HIM) presents a new approach to process monitoring which has several potential advantages over the traditio ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=824597

952. The Role of Periodic Interferometer Errors in the Calibration of Capacitance Displacement Sensors for Nanometrology Applications
Topic: Manufacturing
Published: 1/1/2000
Authors: R Koning, Ronald G Dixson, Joseph Fu, Theodore Vincent Vorburger
Abstract: Although the role of the periodic errors of optical heterodyne interferometers in displacement measurements is fairly well understood, their influence on the calibration of other types of displacement sensors do not seem to be studied as extensively. ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820965

953. The Role of Space Charge in Scanned Probe Oxidation
Topic: Manufacturing
Published: 1/1/1998
Author: John A Dagata
Abstract: The growth rate and electrical character of nanostructures produced by scanned probe oxidation are investigated by integrating an in-situ electrical force characterization technique, scanning Maxwell-stress microscopy, into the fabrication process. S ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820888

954. The Scanning Electron Microscope
Topic: Manufacturing
Published: 1/1/1997
Author: Michael T Postek
Abstract: The scanning electron microscope (SEM) is an important research and production tool extensively used in many phases of industry throughout the world. The popularity of the instrument results from the need to inspect and obtain information about sampl ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820862

955. The State of Container Security Standards
Series: NIST Interagency/Internal Report (NISTIR)
Report Number: 7153
Topic: Manufacturing
Published: 10/17/2007
Authors: Shaw C Feng, Simon Paul Frechette
Abstract: As cargo container security is a critical component in the U.S. homeland security, the communication among people in a chain of custody of a container needs to be timely and effective. Since people in the container custody chain often use different c ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=823012

956. The Study of Silicon Stepped Surfaces as Atomic Force Microscope Calib Standards With a Calibrated AFM at NIST
Topic: Manufacturing
Published: 9/29/2005
Authors: V W. Tsai, Theodore Vincent Vorburger, Ronald G Dixson, Joseph Fu, R Koning, Richard M Silver, Edwin Ross Williams
Abstract: Due to the limitations of modern manufacturing technology, there is no commercial height artifact at the sub-nanometer scale currently available. The single-atom steps on a cleaned silicon (111) surface with a height of 0.314 nm, derived from the lat ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820918

957. The Study of Silicon Stepped Surfaces as Atomic Force Microscope Calibration Standards With a Calibrated AFM at NIST
Topic: Manufacturing
Published: 1/1/1998
Authors: V W. Tsai, Theodore Vincent Vorburger, Ronald G Dixson, Joseph Fu, R Koning, Richard M Silver, E. C. Williams
Abstract: Due to the limitations of modern manufacturing technology, there is no commercial height artifact at the sub-nanometer scale currently available. The single-atom steps on a cleaned silicon (111) surface with a height of 0.314 nm, derived from the lat ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=823099

958. The Validation of CMM Task Specific Measurement Uncertainty Software
Topic: Manufacturing
Published: 1/1/2003
Authors: Steven David Phillips, Bruce R. Borchardt, A Abackerli, Craig M Shakarji, Daniel S Sawyer, P Murray, B Rasnick, K Summerhays, J M Baldwin, M P Henke
Abstract: Task specific CMM measurement uncertainty statements can be generated using computer (Monte Carlo) simulation. Recently, commercial products using this powerful technique have become available; however they typically involve megabytes of code inacces ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=822036

959. The stability of milling: an impact oscillator with delay
Topic: Manufacturing
Published: 6/20/2014
Authors: Matthew A Davies, Tony Schmitz, Timothy J Burns
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=915737

960. Theory and Algorithms for L1 Fitting Used for Planar Datum Establishment in Support of Tolerancing Standards
Topic: Manufacturing
Published: 10/15/2013
Authors: Craig M Shakarji, Vijay Srinivasan
Abstract: We present the theory and algorithms for establishing a datum plane consistent with ASME Y14.5 standard definitions corresponding to a planar datum feature sampled with coordinate data that is weighted,. The method uses a one-sided minimization searc ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=913789



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