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951. The Multi-Relationship Evaluation Design Framework: Creating Evaluation Blueprints to Assess Advanced and Intelligent Technologies
Topic: Manufacturing
Published: 10/29/2010
Authors: Brian A Weiss, Linda C. Schmidt
Abstract: Technological evolutions are constantly occurring across advanced and intelligent systems within a range of fields including those within the military, law enforcement, automobile, and manufacturing industries. Testing the performance of these techno ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=906659

952. The NIST Advanced Measurement Laboratory: at the Leading Edge of Measurement Science and Technology
Topic: Manufacturing
Published: 8/1/2006
Authors: C Londono, John Russell Lawall, Michael T Postek, Jack A Stone Jr., John Richard Stoup
Abstract: The National Institute of Standards and Technology as the U.S. National Metrology Institute has the fundamental responsibility to continuously push the limits of measurement science (metrology) to promote U.S. innovation and industrial competitivenes ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=824616

953. The NIST Gage Block Calibration Software System User's Manual
Series: NIST Interagency/Internal Report (NISTIR)
Report Number: 6387
Topic: Manufacturing
Published: 1/1/2000
Author: Jay H Zimmerman
Abstract: The NIST Gage Block Calibration Software System is a complete calibration system with custom integrated software to calibrate and measurehigh-precision quality gage blocks as individual blocks or sets, both English and metric.  The calibration s ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=823120

954. The NIST Length Scale Interferometer
Topic: Manufacturing
Published: 5/1/1999
Authors: John S Beers, William B. Penzes
Abstract: The National Institute of Standards and Technology (NIST) interferometer for measuring graduated length scales has been in use since 1965. It was developed in response to the redefinition of the meter in 1960 from the prototype platinum-iridium bar t ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820924

955. The NIST Length Scale Interferometer
Series: Journal of Research (NIST JRES)
Topic: Manufacturing
Published: 7/23/1999
Authors: John S Beers, William B. Penzes
Abstract: The National Institute of Standards and Technology (NIST) interferometer for measuring graduated length scales has been in use since 1965. It was developed in response to the redefinition of the meter in 1960 from the prototype platinum-iridium bar t ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=823093

956. The NIST/DOE Oak Ridge Centers for Manufacturing Technology Collaboration in Dimensional Metrology
Series: NIST Interagency/Internal Report (NISTIR)
Report Number: 5482
Topic: Manufacturing
Published: 1/1/1994
Author: David C Stieren
Abstract: Abstract not available.
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820715

957. The National Ballistics Imaging Comparison (NBIC) Project
Topic: Manufacturing
Published: 3/10/2012
Authors: Jun-Feng Song, Theodore Vincent Vorburger, Susan M Ballou, Robert Meryln Thompson, James H Yen, Thomas B Renegar, Xiaoyu A Zheng, Richard M Silver, Martin Ols
Abstract: In response to the guidelines issued by the ASCLD/LAB-International (American Society of Crime Laboratory Directors/Laboratory Accreditation Board) to establish traceability and quality assurance in U.S. crime laboratories, a NIST/ATF joint project e ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=907871

958. The Neolithography Consortium
Topic: Manufacturing
Published: 6/1/2000
Author: James Edward Potzick
Abstract: The role of process simulation in microlithography is becoming an increasingly important part of process control as wafer feature sizes become smaller than the exposure wavelength, because the pattern transfer from photomask to wafer is nonlinear. An ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820976

959. The Potentials of Helium Ion Microscopy for Semiconductor Process Metrology
Topic: Manufacturing
Published: 2/6/2008
Authors: Michael T Postek, Andras Vladar
Abstract: Semiconductor manufacturing is always looking for more effective ways to monitor and control the manufacturing process. Helium Ion Microscopy (HIM) presents a new approach to process monitoring which has several potential advantages over the traditio ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=824597

960. The Role of Periodic Interferometer Errors in the Calibration of Capacitance Displacement Sensors for Nanometrology Applications
Topic: Manufacturing
Published: 1/1/2000
Authors: R Koning, Ronald G Dixson, Joseph Fu, Theodore Vincent Vorburger
Abstract: Although the role of the periodic errors of optical heterodyne interferometers in displacement measurements is fairly well understood, their influence on the calibration of other types of displacement sensors do not seem to be studied as extensively. ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820965



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