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931. Room-temperature Single-electron Memory Made by Pulse-mode Atomic Force Microscopy Nano-oxidation Process on Atomically Flat Alpha-alumina Substrate
Topic: Manufacturing
Published: 1/10/2000
Authors: K Matsumoto, Y Gotoh, T Maeda, John A. Dagata, J S Harris
Abstract: A single-electron memory was fabricated using the improved pulse-mode atomic force microscopy nano oxidation process which oxidized the surface of the thin titanium (Ti) metal on the atomically flat -alumina (-Al2O3) substrate and formed the narrow o ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=821783

932. Round Robin Determination of Power Spectral Densities of Different Si Wafer Surfaces
Topic: Manufacturing
Published: 3/1/1998
Authors: Egon Marx, I J Malik, Y Strausser, T Bristow, N Poduje, J C Stover
Abstract: Power spectral densities (PSDs) were used to characterize a set of surfaces over a wide range of lateral as well as perpendicular dimensions. Twelve 200-mm-diameter Si wafers were prepared and the surface finishes ranged from as-ground wafers to epit ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820901

933. Roundness Measurements Using the NIST Fiber Probe
Topic: Manufacturing
Published: 1/1/2007
Authors: Balasubramanian Muralikrishnan, Jack A Stone Jr, John Richard Stoup
Abstract: We have described a fiber probe for dimensional measurement of micro-holes in the 2004 and 2006 ASPE annual meetings. In this abstract, we describe the adaptation of this probe for measuring roundness of tiny holes and knife edge apertures. In its cu ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=823241

934. SEM Image Sharpness Analysis
Topic: Manufacturing
Published: 1/1/1996
Authors: Michael T Postek, Andras Vladar
Abstract: The technique described here, utilizing the sharpness concept, is facilitated by the use of the FFT techniques to analyze the electron micrograph to obtain the evaluation. This is not the first application of Fourier techniques to SEM images, but it ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820808

935. SEM Performance Evaluation Using the Sharpness Criterion
Topic: Manufacturing
Published: 5/1/1996
Authors: Michael T Postek, Andras Vladar
Abstract: Fully automated or semi-automated scanning electron microscopes (SEM) are now commonly used in semiconductor production and other forms of manufacturing. The industry requires that an automated instrument must be routinely capable of 5 nm resolution ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820809

936. SEM Sentinel - SEM Performance Measurement System
Topic: Manufacturing
Published: 1/1/2001
Authors: Bradley N Damazo, Andras Vladar, Alice V. Ling, M Alkan Donmez, Michael T Postek, Crossley E Jayewardene
Abstract: This paper describes the design and implementation of a system for monitoring the performance of a critical dimension measurement scanning electron microscope (CD-SEM). Experiments were performed for tests involving diagnosis of the vacuum system an ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=823137

937. SEM Sentinel - SEM Performance Measurement System, Part 1
Series: NIST Interagency/Internal Report (NISTIR)
Report Number: 6498
Topic: Manufacturing
Published: 4/1/2000
Authors: Alice V. Ling, Andras Vladar, Bradley N Damazo, M Alkan Donmez, Michael T Postek
Abstract: This report describes the current design of a system for monitoring the performance of several major subsystems of a scanning electron microscope (SEM). The following subsystems and the associated functional parameters will be monitored. 1) Vacuum sy ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=821786

938. SEM Sentinel-SEM Performance Measurement System
Topic: Manufacturing
Published: 8/1/2001
Authors: Bradley N Damazo, Andras Vladar, Alice V. Ling, M Alkan Donmez, Michael T Postek, Crossley E Jayewardene
Abstract: This paper describes the design and implementation of a system for monitoring the performance of a critical dimension measurement scanning electron microscope (CD-SEM). Experiments were performed for tests involving diagnosis of the vacuum system and ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=821586

939. SI Traceability of Force at the Nanonewton Level
Topic: Manufacturing
Published: 1/1/2001
Authors: David B Newell, Jon Robert Pratt, John A Kramar, Douglas T Smith, L Feeney, Edwin Ross Williams
Abstract: Although nanonewton force measurements are commonplace in industry, no National Measurement Institute supports a link to the International System of Units (SI) below one newton. The National Institute of Standards and Technology has launched a five-y ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=821766

940. SIMULATION-BASED DESIGN CONCEPT EVALUATION FOR AMBULANCE PATIENT COMPARTMENTS
Topic: Manufacturing
Published: 5/19/2014
Authors: Deogratias Kibira, Yung-Tsun Tina Lee, Jennifer Lyn Marshall, Allison Barnard Feeney, Larry Avery, Allie Jacobs
Abstract: To address the inadequacy of existing standards regarding interior layout design, the Department of Homeland Security (DHS) Science and Technology Directorate, the National Institute of Standards and Technology (NIST), the National Institute for Occu ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=914864



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