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Topic Area: Manufacturing
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Displaying records 961 to 970 of 1000 records.
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961. Final Report, 1997-1998 NIST/SEMATECH Collaboration for Improvement of High-Accuracy Critical-dimension Metrology for Semiconductor Manufacturing
Topic: Manufacturing
Published: 3/30/1998
Authors: Andras Vladar, Michael T Postek
Abstract: Beginning on or about April 1, 1997, the National Institute of Standards and Technology (NIST) received partial support from SEMATECH to collaborate in a program designated 1997-1998 NIST/SEMATECH Collaboration for Improvement of High-Accuracy Critic ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=823100

962. Analytical/Experimental Study of Vibration of a Room-Sized Airspring-Supported Slab
Topic: Manufacturing
Published: 3/1/1998
Authors: H Amick, B Sennewald, E Clayton Teague, Brian R Scace
Abstract: This paper reports the results of the finite element analysis and in-situ testing of a large-scale (4 m x 10 m) pneumatically isolated concrete slab are reported. The slab was constructed as a design prototype for next generation metrology laboratori ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=822527

963. Influence of Data Analysis and Other Factors on the Short-term Stability of Vertical Scanning-Probe Microscope Calibration Measurements
Topic: Manufacturing
Published: 3/1/1998
Authors: H Edwards, J Jorgensen, John A. Dagata, Y Strausser, J Schneir
Abstract: We report a study of a fundamental limit to the accuracy of vertical measurements made using scanning-probe microscopes (SPM): the short-term stability of a vertical calibration using a waffle-pattern artifact. To test the instrumental component of t ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820998

964. Round Robin Determination of Power Spectral Densities of Different Si Wafer Surfaces
Topic: Manufacturing
Published: 3/1/1998
Authors: Egon Marx, I J Malik, Y Strausser, T Bristow, N Poduje, J C Stover
Abstract: Power spectral densities (PSDs) were used to characterize a set of surfaces over a wide range of lateral as well as perpendicular dimensions. Twelve 200-mm-diameter Si wafers were prepared and the surface finishes ranged from as-ground wafers to epit ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820901

965. Tip Characterization for Scanned Probe Microscope Width Metrology
Topic: Manufacturing
Published: 3/1/1998
Authors: Samuel Dongmo, John S Villarrubia, Samuel N Jones, Thomas B Renegar, Michael T Postek, Jun-Feng Song
Abstract: Determination of the tip shape is an important prerequisite for converting the various scanning probe microscopies form imaging tools into dimensional metrology tools with sufficient accuracy to meet the critical dimension measurement requirements of ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=823092

966. Uncertainty Analysis for Angle Calibrations Using Circle Closure
Series: Journal of Research (NIST JRES)
Topic: Manufacturing
Published: 3/1/1998
Author: William Tyler Estler
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=823098

967. Uncertainty Analysis for Angle Calibrations Using Circle Closure
Topic: Manufacturing
Published: 3/1/1998
Author: William Tyler Estler
Abstract: We analyze two types of full-circle angle calibrations: a simple closure in which a single set of unknown angular segments is sequentially compared with an unknown reference angle, and a dual closure in which two divided circles are simultaneously ca ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820892

968. Growth and Analysis of Near Ideal Thin Films and Multilayers
Topic: Manufacturing
Published: 2/18/1998
Authors: J Pedulla, R Deslattes, S Owens
Abstract: As thin film technology moves into the truly nano-scale region [<10 nm], many conventional methods of growth and analysis of thin films and multilayers break down due to large levels of interfacial roughness and diffusion, or incompatibility of the a ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=822528

969. Performing Measurement of Surface Structures With the Calibrated Atomic Force Microscope
Topic: Manufacturing
Published: 2/1/1998
Author: R Koning
Abstract: The use of the atomic force microscope (AFM) to characterize surface structures for industrial applications is rapidly increasing. To compare the results obtained by different instruments and to achieve high accuracy, the scales of an AFM must be cal ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820897

970. Metal-based Room-temperature Operating Single Electron Devices Using Scanning Probe Oxidation
Topic: Manufacturing
Published: 1/30/1998
Authors: K Matsumoto, Y Gotoh, T Maeda, John A. Dagata, J S Harris
Abstract: Coulomb oscillation was clearly observed at room temperature in the single electron transistor fabricated by atomic force microscopy (AFM) nano-oxidation process. In order to obtain a clear Coulomb oscillation at room temperature, new and improved fa ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=821784



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