NIST logo

Publications Portal

You searched on: Topic Area: Manufacturing Sorted by: date

Your search results exceeded 1,000 records. Please refine your search and try again.
Displaying records 961 to 970 of 1000 records.
Resort by: Date / Title

961. NIST Virtual/Physical Random Profile Roughness Calibration Standards
Topic: Manufacturing
Published: 10/1/1998
Authors: Jun-Feng Song, Christopher J. Evans, Michael L McGlauflin, Eric Paul Whitenton, Theodore Vincent Vorburger, Y B Yuan
Abstract: The NIST (National Institute of Standards and Technology) virtual/physical surface roughness calibration standard consists of physical specimens whose surfaces are manufactured by a numerically controlled diamond-turning process using digitized profi ...

962. National Institute of Standards and Technology - Texas Instruments Industrial Collaboratory Testbed
Topic: Manufacturing
Published: 10/1/1998
Authors: Michael T Postek, Marylyn H. Bennett, N J Zaluzec, Thomas E Wheatley, Samuel N Jones
Abstract: A portion of the mission of the NIST Manufacturing Engineering Laboratory (MEL) is to improve and advance length metrology in aid of U.S. Industry. This responsibility is found within the Precision Engineering Division (PED). The successful developme ...

963. Accuracy Differences Among Photomask Metrology Tools--and Why They Matter
Topic: Manufacturing
Published: 9/1/1998
Author: James Edward Potzick
Abstract: A variety of different kinds of photomask critical dimension (CD) metrology tools are available today to help meet current and future metrology challenges. These tools are based on different operating principles, and have differing cost, throughput, ...

964. Case Against Optical Gauge Block Metrology
Topic: Manufacturing
Published: 9/1/1998
Authors: Theodore D Doiron, Dennis S Everett, Bryon S. Faust, Eric S Stanfield, John Richard Stoup
Abstract: The current definition of length of a gage block is a very clever attempt to evade the systematic errors associated with the wringing layer thickness and optical phase corrections. In practice, there are very large systematic operator and surface eff ...

965. Minimizing Error Sources in Gage Block Mechanical Comparison Measurements
Topic: Manufacturing
Published: 9/1/1998
Authors: Bryon S. Faust, John Richard Stoup, Debra K Stanfield
Abstract: Error sources in gage block mechanical comparisons can range from classical textbook examples (thermal gradients, correct temperature value, and correct master value) to a completely counter-intuitive example of diamond probe tip wear at low applied ...

966. Minimizing Errors in Phase Change Correction Measurements for Gage Blocks Using a Spherical Contact Techniques
Topic: Manufacturing
Published: 9/1/1998
Authors: John Richard Stoup, Bryon S. Faust, Theodore D Doiron
Abstract: One of the most elusive measurement elements in gage block interferometry is the correction for the phase change on reflection. Techniques used to quantify this correction have improved over the years, but the measurement uncertainty has remained rel ...

967. Patterning on Passivated Semiconductor Surfaces
Topic: Manufacturing
Published: 8/7/1998
Authors: John A Dagata, E Snow
Abstract: Abstract unavailable.

968. NIST Calibration Services for Gas Flow Meters: Piston Prover and Bell Prover Gas Flow Facilities
Series: Special Publication (NIST SP)
Report Number: 250-49
Topic: Manufacturing
Published: 8/1/1998
Authors: John D Wright, G E. Mattingly
Abstract: This document provides a description of the small and medium range gas flow calibration facilities at the National Institute of Standards and Technology (NIST), Fluid Flow Group, as reported in NIST Special Publication 250 for Test Nos. 18010C-18040C ...

969. Accuracy and Traceability in Dimensional Measurements
Topic: Manufacturing
Published: 6/1/1998
Author: James Edward Potzick
Abstract: Dimensional measurements of importance to microlithography include feature sizes and feature placement on photomasks and wafers, overlay eccentricities, defect and particle sizes on masks and wafers, and many others. A common element is that the obje ...

970. Characterization of On-Wafer Diode Noise Sources
Topic: Manufacturing
Published: 6/1/1998
Authors: James Paul Randa, David K Walker, Lawrence P. Dunleavy, Robert L Billinger, Joseph Paul Rice
Abstract: A set of wafer probeable diode noise source transfer standards are characterized using on-wafer noise temperature methods developed recently at the National Institute of Standards and Technology (NIST). This paper reviews the methods for accurate on ...

Search NIST-wide:

(Search abstract and keywords)

Last Name:
First Name:

Special Publications:

Looking for a NIST Special Publication (NIST SP Series)? Place the series number and dash in the report number field (Example: 800-) and begin your search.

  • SP 250-XX: Calibration Services
  • SP 260-XX: Standard Reference Materials
  • SP 300-XX: Precision Measurement and Calibration
  • SP 400-XX: Semiconductor Measurement Technology
  • SP 480-XX: Law Enforcement Technology
  • SP 500-XX: Computer Systems Technology
  • SP 700-XX: Industrial Measurement Series
  • SP 800-XX: Computer Security Series
  • SP 823-XX: Integrated Services Digital Network Series