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Displaying records 961 to 970 of 1000 records.
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961. NIST SRM 9983 High Rigidity Ball-Bar Stand User Manual
Series: NIST Interagency/Internal Report (NISTIR)
Report Number: 5659
Topic: Manufacturing
Published: 6/1/1995
Authors: Daniel S Sawyer, Steven David Phillips, Gregory W Caskey, Bruce R. Borchardt, David E Ward, P Snoots
Abstract: This document is the user manual for the NIST SRM 9983 High Rigidity Ball Bar Stand. The manual contains a list of the components that are included as part of the unit. Complete instructions for setting up and assembling the stand to support a ball b ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820762

962. The Gage Block Handbook
Series: Monograph (NIST MN)
Report Number: 180
Topic: Manufacturing
Published: 6/1/1995
Authors: Theodore D Doiron, John S Beers
Abstract: Gage blocks are the primary method used by industry to standardize the measurement of dimension. This work discusses every aspect of gage block calibration, including definitions, characteristics of gage blocks, calibration by interferometry and mech ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820735

963. Performance of the Prototype NIST SRM 2090A SEM Magnification Standard in a Low-Acclerating Voltage SEM
Topic: Manufacturing
Published: 5/22/1995
Authors: B Newell, Michael T Postek, J VanDerZiel
Abstract: A new NIST SEM magnification calibration standard has been fabricated and characterized in production prototype form. The SRM 2090A samples contain structures ranging in pitch from 3000 um to 0.2 um and are useful at both high and low accelerating vo ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820751

964. Delineation of pn Junctions by Scanning Tunneling Microscopy/Spectroscopy in Air and Ultrahigh Vacuum
Topic: Manufacturing
Published: 5/1/1995
Authors: Richard M Silver, John A Dagata, H. W. Tseng
Abstract: Lateral dopant profiling of cleaved, passivated abrupt GaAs pn junctions using scanning tunneling microscopy/spectroscopy is demonstrated both in ultrahigh vacuum and air. A combination of forward-and reverse-bias imaging and position-dependent tunn ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820764

965. Metrology with the Ultraviolet Scanning Transmission Microscope
Topic: Manufacturing
Published: 5/1/1995
Authors: Richard M Silver, James Edward Potzick, Y Hu
Abstract: A novel design for an ultraviolet critical dimension measurement transmission microscope utilizing the Stewart platform as the rigid main structure has been implemented. This new design shows improved vibration characteristics and is able to accommod ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820765

966. Overlay Measurements and Standards
Topic: Manufacturing
Published: 5/1/1995
Authors: Richard M Silver, James Edward Potzick, Robert D. Larrabee
Abstract: The relative misalignment of features produced by different mask levels (i.e., overlay error) is projected to become an increasingly important problem to the semiconductor industry as the size of the critical features continues to decrease. In respon ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820766

967. Progress on Accurate Metrology of Pitch, Height, Roughness, and Width Artifacts Using an Atomic Force Microscope
Topic: Manufacturing
Published: 5/1/1995
Authors: J Schneir, T Mcwaid, Ronald G Dixson, V W. Tsai, John S Villarrubia, Edwin Ross Williams, E Fu
Abstract: NIST personnel visited 23 IC manufacturing companies and equipment suppliers during 1994 to determine semiconductor industry needs for scanned probe metrology. NIST has initiated projects addressing some of the needs identified. When complete, these ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820763

968. Re-Evaluation of the Accuracy of NIST Photomask Linewidth Standards
Topic: Manufacturing
Published: 5/1/1995
Author: James Edward Potzick
Abstract: Every artifact measurement standard has some uncertainty associated with its calibration, and the NIST Photomask Linewidth Standards are no exception. This uncertainty is caused by a combination of those factors which influence the calibration measur ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820758

969. Light Scattered by Sinusoidal Surfaces: Illumination Windows and Harmonics in Standards
Topic: Manufacturing
Published: 3/1/1995
Authors: Egon Marx, T Lettieri, Theodore Vincent Vorburger
Abstract: Sinusoidal surfaces can be used as material standards to help calibrate instruments that measure the angular distribution of the intensity of light scattered by arbitrary surfaces, because the power in the diffraction peaks varies over several orders ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820747

970. A Method for the Spatial Calibration of a Commercial Phase Measuring Interferometer
Topic: Manufacturing
Published: 2/1/1995
Authors: P Sullivan, Christopher J. Evans
Abstract: In a phase measuring interferometer (PMI), the interference pattern is focused on a charge coupled device (CCD) detector array and data points are sampled at the corresponding locations. In most commercially available systems, a zoom lens forms part ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820778



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