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Displaying records 951 to 960 of 1000 records.
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951. Measurement of a CD and Sidewall Angle Artifact with Two Dimensional CD AFM Metrology
Topic: Manufacturing
Published: 5/1/1996
Authors: Ronald G Dixson, N. Sullivan, J Schneir, T Mcwaid, V W. Tsai, J Prochazka, M. Young
Abstract: Despite the widespread acceptance of SEM metrology in semiconductor manufacturing, there is no SEM CD standard currently available. Producing such a standard is challenging because SEM CD measurements are not only a function of the linewidth, but als ...

952. New Algorithm for the Measurement of Pitch in Metrology Instruments
Topic: Manufacturing
Published: 5/1/1996
Authors: Nien F Zhang, Michael T Postek, Robert D. Larrabee, L Carroll, William J. Keery
Abstract: Traditionally, the measurement of pitch in metrology instruments is thought to be a benign self-compensating function. However, as the measurement uncertainty of metrology instruments is pushed to the nanometer level, evaluation of the performance of ...

953. SEM Performance Evaluation Using the Sharpness Criterion
Topic: Manufacturing
Published: 5/1/1996
Authors: Michael T Postek, Andras Vladar
Abstract: Fully automated or semi-automated scanning electron microscopes (SEM) are now commonly used in semiconductor production and other forms of manufacturing. The industry requires that an automated instrument must be routinely capable of 5 nm resolution ...

954. Toward Accurate Linewidth Metrology Using Atomic Force Microscopy and Tip Characterization
Topic: Manufacturing
Published: 5/1/1996
Authors: Ronald G Dixson, J Schneir, T Mcwaid, N. Sullivan, V W. Tsai, S Zaidi, S Brueck
Abstract: As the critical dimensions of integrated circuit features decrease toward 0.18 um, feature width measurements with nanometer level accuracy will become increasingly important to the semiconductor processing industry. Atomic force microscopy (AFM) off ...

955. Models for Relating Scanning Electron Microscopy Images to Measured Artifacts
Topic: Manufacturing
Published: 4/1/1996
Authors: Michael T Postek, Andras Vladar, J R. Lowney
Abstract: A specific example of a technique we developed to enhance the information obtained from SEM images is the extraction of an approximate profile corresponding to an electron beam with zero beam diameter from one with a finite beam diameter. Results wer ...

956. Scanned Probe Microscope Tip Characterization Without Calibrated Tip Characterizers
Topic: Manufacturing
Published: 3/1/1996
Author: John S Villarrubia
Abstract: In scanned probe microscopy the image is a combination of information from the sample and the tip. In order to reconstruct the true surface geometry, it is necessary to know the actual tip shape. It has been proposed that this shape may be reconstruc ...

957. Test Optics Error Removal
Topic: Manufacturing
Published: 3/1/1996
Authors: Christopher J. Evans, R Kestner
Abstract: Wave-front or surface errors may be divided into rotationally symmetric and nonrotationally symmetric terms. It is shown that if either the test part or the reference surface in an interferometric test is rotated to N equally spaced positions about t ...

958. Chemical Aspects of Tool Wear in Single Point Diamond Turning
Topic: Manufacturing
Published: 1/1/1996
Authors: E W Paul, Christopher J. Evans, A Mangamelli, Michael L McGlauflin, Robert S. Polvani
Abstract: A hypothesis is proposed that ascribes chemical wear of diamond tools to the presence of unpaired d electrons in the sample being machined. This hypothesis is used to explain a range of results for metals, alloys, and other materials including electr ...

959. Digital Imaging for Scanning Electron Microscopy
Topic: Manufacturing
Published: 1/1/1996
Authors: Michael T Postek, Andras Vladar
Abstract: The development and application of digital imaging technology has been one of the major advancements in scanning electron microscopy (SEM) during the past several years. This digital revolution has been brought about by significant progress in semico ...

960. Dynamic Measurement of Shear Band Formation in Precision Hard-Turning
Topic: Manufacturing
Published: 1/1/1996
Authors: Matthew A. Davies, Steven Earl Fick, Christopher J. Evans
Abstract: Abstract not available.

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