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951. Calibration and Fabrication Facilities for Optical Surfaces
Topic: Manufacturing
Published: 1/1/1997
Authors: Theodore Vincent Vorburger, Christopher J. Evans, C Asmail
Abstract: NIST has calibration facilities and research services available for characterization of optical surfaces and optical figuring and finishing. The calibration facilities are for measurement of optical scatter, figure, and surface finish, and the fabric ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820883

952. Characterization of Multi-phase and Multi-component Polymers using the Atomic Force Microscope
Topic: Manufacturing
Published: 1/1/1997
Authors: Mark R VanLandingham, John S Villarrubia, G Meyers, M Dineen
Abstract: Abstract not available.
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=821592

953. Ductile-Regime Grinding of Brittle Materials
Topic: Manufacturing
Published: 1/1/1997
Authors: Kenneth Blaedel, John S Taylor, Christopher J. Evans
Abstract: Under appropriate conditions, brittle materials may be ground to produce surfaces with no observable fracture damage. This chapter reviews the techniques for producing such surfaces and the mechanisms of material removal involved.
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820832

954. Establishing a Common Rockwell Hardness Scale Using Geometrically Calibrated Standard Diamond Indenters
Topic: Manufacturing
Published: 1/1/1997
Author: Jun-Feng Song
Abstract: Recently developed microform measurement techniques have reduced the measurement uncertainties in the geometry of Rockwell diamond indenters. In this paper, we describe several intercomparisons to determine if tightly controlled indenter geometry ca ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820874

955. Establishing a Worldwide Unified Rockwell Hardness Scale With Metrology Traceability
Topic: Manufacturing
Published: 1/1/1997
Authors: Jun-Feng Song, Samuel Rea Low III, David J Pitchure, A Germak, S Desogus, T Polzin, H Yang, H Ishida, G Barbato
Abstract: Recently developed microform measurement techniques have reduced the measurement uncertainties in the geometry of Rockwell diamond indenters. It is now possible to establish standard grade Rockwell diamond indenters characterized by high geometry un ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820876

956. Experimental Results of Blind Reconstruction of STM Tips
Topic: Manufacturing
Published: 1/1/1997
Authors: Carsten P. Jensen, Richard M Silver, John S Villarrubia
Abstract: Abstract not available.
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820896

957. Fabrication of Calibration Standards by Nanostructuring Procedures Using Scanning Tunneling Microscope (STM)
Topic: Manufacturing
Published: 1/1/1997
Authors: R Koning, L Koenders
Abstract: To improve the achievable uncertainty of high resolution microscopes (Scanning Probe or Scanning Electron) attempts have been made to manufacture calibration standard on the basis of a new principle. It has been intended to couple nanostructures prod ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820848

958. Finish and Figure Metrology for Soft X-ray Optics
Topic: Manufacturing
Published: 1/1/1997
Author: T Mcwaid
Abstract: The performance of high quality optics relies heavily on their geometrical properties of surface finish and figure. The surface finish consists of the short spatial-wavelength departures from perfect smoothness and leads to scattering of the incident ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820854

959. Finish and Figure Metrology for Soft X­ray Optics
Topic: Manufacturing
Published: 1/1/1997
Authors: Theodore Vincent Vorburger, Christopher J. Evans, V W. Tsai, Joseph Fu, E. C. Williams, Ronald G Dixson, P Sullivan, T. McWaid
Abstract: Abstract not available.
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=901981

960. Hybrid Optical-Electrical Overlay Test Structure
Topic: Manufacturing
Published: 1/1/1997
Authors: Michael W Cresswell, Robert Allen, L Linholm, William F Guthrie, William B. Penzes, A Gurnell
Abstract: This paper describes the exploratory use of electrical test structures to enable the calibration of optical overlay instruments of the type used to monitor semiconductor-device fabrication processes. Such optical instruments are known to be vulnerabl ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820834