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Topic Area: Manufacturing

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Displaying records 921 to 930 of 1000 records.
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921. Noise averaging and measurement resolution (or a "little noise is a good thing")
Topic: Manufacturing
Published: 1/1/1999
Author: James Edward Potzick
Abstract: When a continuous quantity is measured with a digital instrument or digitized for further processing, a measurement uncertainty component is incurred from quantization of the continuous variable. This uncertainty can be reduced by oversampling and av ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820947

922. Radiationless Resonant Raman Scattering at the Ar K Edge
Topic: Manufacturing
Published: 1/1/1999
Authors: Thomas W LeBrun, S H Southworth, G B Armen, M A MacDonald, Y Azuma
Abstract: Partial cross sections for Ar K-LZL3(1 D2)np, n=4 and 5 spectator Auger states excited by x-ray absorption across the K-edge were measured and compared with calculations based on the theory or radiationless resonant Raman scattering. Core relaxation ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820935

923. Self-Calibration and Error Compensation Using Reference Position Markers
Topic: Manufacturing
Published: 1/1/1999
Author: H Zou
Abstract: In this paper, reference position markers are proposed for self-calibration and error compensation. Self-calibration of x-y motion guides is discussed with a focus on the orthogonality calibration. An algorithm is developed using a closure method and ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820956

924. Sources of Error in Absolute Distance Interferometry
Topic: Manufacturing
Published: 1/1/1999
Authors: Jack A Stone Jr, Alois Stejskal, Lowell P. Howard
Abstract: In this paper we describe the status of our research on the use of diode lasers for absolute distance interferometry, and we discuss the major sources of uncertainty that limit the accuracy of this technique for distance measurement. We have primaril ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820951

925. Telepresence:  A New Paradigm for Solving Contamination Problems
Topic: Manufacturing
Published: 1/1/1999
Authors: Michael T Postek, Marylyn H. Bennett, N J Zaluzec
Abstract: When a contamination event occurs in a semiconductor fab, a process engineer must act quickly to find the cause. It is cost-prohibitive to maintain a full complement of analytical tools in a fab that would be necessary to identify very small particle ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=823117

926. Telepresence: A New Paradigm for Solving Contamination Problems
Topic: Manufacturing
Published: 1/1/1999
Authors: Michael T Postek, Marylyn H. Bennett, N J Zaluzec
Abstract: When a contamination event occurs in a semiconductor fab, a process engineer must act quickly to find the cause. It is cost-prohibitive to maintain a full compliment of analytical tools in a fab that would be necessary to identify very small particle ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820944

927. Tip Characterization for Dimensional Nanometrology
Topic: Manufacturing
Published: 1/1/1999
Author: John S Villarrubia
Abstract: Technological trends are increasingly requiring dimensional metrology at size scales below a micrometer. Scanning probe microscopy has unique advantages in this size regime, but width and roughness measurements must be corrected for imaging artifacts ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=822459

928. Accuracy Differences Among Photomask Metrology Tools and Why They Matter
Topic: Manufacturing
Published: 12/1/1998
Author: James Edward Potzick
Abstract: A variety of different kinds of photomask critical dimensions (CD) metrology tools are available today to help meet current and future metrology challenges. These tools are based on different operating principles, and have different cost, throughput, ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820908

929. Characterization and Applications of On-Wafer Diode Noise Sources
Topic: Manufacturing
Published: 12/1/1998
Authors: Lawrence P. Dunleavy, James Paul Randa, David K Walker, Robert L Billinger, Joseph Paul Rice
Abstract: A set of wafer-probeable diode noise source transfer standards are characterized using on-wafer noise-temperature methods developed at the National Institute of Standards and Technology (NIST), Boulder, CO.
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=5598

930. Calculation of Measurement Uncertainty Using Prior Information
Topic: Manufacturing
Published: 11/1/1998
Authors: Steven David Phillips, William Tyler Estler
Abstract: We describe the use of Bayesian inference to include prior information about the value of the measurand in the calculation of measurement uncertainty. Typical examples show this can, in effect, reduce the expanded uncertainty by up to 85 %. The ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820904



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