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You searched on: Topic Area: Manufacturing

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Displaying records 921 to 930 of 1000 records.
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921. Glass and Dimensional Metrology
Topic: Manufacturing
Published: 4/1/1997
Author: Theodore D Doiron
Abstract: Ordinary glass, even good optical quality glass, will shrink up to 20 micrometers/meter over the first few years after its manufacture. Gages made of glass are therefore not suitable as high accuracy artifacts unless they are calibrated often. Better ...

922. High-Speed Grinding - Fundamentals and State of the Art in Europe, Japan, and the USA
Topic: Manufacturing
Published: 4/1/1997
Authors: F Klocke, E Brinksmeier, Christopher J. Evans, T Howes, I Inasaki, E Minke, H Tonshoff, J A Webster, D Stuff
Abstract: This paper describes the technological basis and the current state of the art in the field of high speed grinding. The technological fundamentals of high speed grinding are first of all presented on the basis of the kinematics of the chip-forming pr ...

923. Performance Analysis Tool for Scanning Electron Microscopes Used in Semiconductor Metrology
Topic: Manufacturing
Published: 4/1/1997
Authors: Michael T Postek, Andras Vladar, M P Davidson
Abstract: Scanning electron microscopes (SEM) are being utilized extensively in the production environment, and these instruments are approaching full automation. Once a human operator is no longer monitoring the instrument''s performance and multiple instrume ...

924. Discussion of Statistical Issues in Geometric Feature Inspection Using Coordinate Measuring Machines
Topic: Manufacturing
Published: 2/1/1997
Authors: Steven David Phillips, K Eberhardt
Abstract: A coordinate measuring machine (CMM) is a computer controlled device that uses a probe to obtain measurements on a manufactured part''s surface, usually one point at a time. Probe movements may be programmed or determined manually by operatio ...

925. Photomask Metrology in the Era of Neolithography
Topic: Manufacturing
Published: 2/1/1997
Author: James Edward Potzick
Abstract: The appearance of smaller photomask feature sizes, high density patterns, and optical enhancements such as phase shifters and OPC features, and the increasing importance of subresolution mask characteristics, can render traditional mask metrology tec ...

926. A Differential Wavelength Meter for Laser Tuning
Topic: Manufacturing
Published: 1/1/1997
Authors: Lowell P. Howard, Jack A Stone Jr.
Abstract: A simple interferometer for matching the wavelengths of tunable lasers is described. Our interferometer uses the angular dispersion of a diffraction grating at the Littrow angle to produce a tilted wavefront with respect to a reference mirror in an o ...

927. Antireflecting-Chromium Linewidth Standard, SRM 473, for Calibration of Optical Microscope Linewidth Measuring System
Series: Technical Note (NIST TN)
Report Number: 260
Topic: Manufacturing
Published: 1/1/1997
Author: James Edward Potzick
Abstract: This document describes the physical characteristics of Standard Reference Material SRM 473, provides instructions for its use in calibrating optical photomask linewidth measuring systems, and gives information and precautions concerning its care and ...

928. Benchmarking the Length Measurement Capabilities of the National Institute of Standards and Technology
Series: NIST Interagency/Internal Report (NISTIR)
Report Number: 6036
Topic: Manufacturing
Published: 1/1/1997
Authors: Richard M Silver, J Land, Jack A Stone Jr., Ronald G Dixson, Bryon S. Faust, James Edward Potzick, Michael T Postek, et al
Abstract: A cross-section of measurements from the Precision Engineering Division within the National Institute of Standards and Technology is benchmarked against other leading National Measurement Institutes. We present a variety of length-related calibration ...

929. Calibration and Fabrication Facilities for Optical Surfaces
Topic: Manufacturing
Published: 1/1/1997
Authors: Theodore Vincent Vorburger, Christopher J. Evans, C Asmail
Abstract: NIST has calibration facilities and research services available for characterization of optical surfaces and optical figuring and finishing. The calibration facilities are for measurement of optical scatter, figure, and surface finish, and the fabric ...

930. Characterization of Multi-phase and Multi-component Polymers using the Atomic Force Microscope
Topic: Manufacturing
Published: 1/1/1997
Authors: Mark R VanLandingham, John S Villarrubia, G Meyers, M Dineen
Abstract: Abstract not available.

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