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Displaying records 921 to 930 of 1000 records.
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921. Digital Imaging for Scanning Electron Microscopy
Topic: Manufacturing
Published: 1/1/1996
Authors: Michael T Postek, Andras Vladar
Abstract: The development and application of digital imaging technology has been one of the major advancements in scanning electron microscopy (SEM) during the past several years. This digital revolution has been brought about by significant progress in semico ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820807

922. Dynamic Measurement of Shear Band Formation in Precision Hard-Turning
Topic: Manufacturing
Published: 1/1/1996
Authors: Matthew A. Davies, Steven Earl Fick, Christopher J. Evans
Abstract: Abstract not available.
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820787

923. Fabry-Perot Interferometers for Small Displacement Measurements
Topic: Manufacturing
Published: 1/1/1996
Authors: Lowell P. Howard, Fredric Scire, Jack A Stone Jr.
Abstract: A description of a Fabry-Perot interferometer for measuring small displacements is given. The instruments consists of a fiber-optic-coupled actuator and mirror guiding mechanisms, a tunable diode laser for tracking the changes in cavity length and a ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820794

924. Height Calibration of Atomic Force Microscopes Using Silicon Atomic Step Artifacts
Topic: Manufacturing
Published: 1/1/1996
Authors: V W. Tsai, Theodore Vincent Vorburger, P Sullivan, Ronald G Dixson, Richard M Silver, Edwin Ross Williams, J Schneir
Abstract: The decreasing feature dimensions required in the semiconductor manufacturing industry are placing ever increasing demands upon metrology instruments. Atomic force microscopes (AFMs), which can have ~1 nm lateral resolution and sub-angstrom vertical ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820827

925. Integral Equation for Scattering by a Rough Surface
Topic: Manufacturing
Published: 1/1/1996
Author: Egon Marx
Abstract: An equation for an unknown surface field that represents scattering by a rough patch on a flat dielectric surface is presented. The geometrical considerations for this particular problem are discussed, especially in relation to a surface divergence f ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820796

926. Laser Trackers: Traceability, Uncertainty and Standardization - A Report to the CMSC
Series: NIST Interagency/Internal Report (NISTIR)
Report Number: 6061
Topic: Manufacturing
Published: 1/1/1996
Author: Gregory W Caskey
Abstract: During the 1996 CMSC conference, undoubtedly one of the hottest topics was how to achieve traceability for the laser tracker. This paper reviews the concepts of traceability and measurement uncertainty from NIST''s perspective, and explain ho ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820833

927. New NIST-Certified Length Microscale
Topic: Manufacturing
Published: 1/1/1996
Author: James Edward Potzick
Abstract: The National Institute of Standards and Technology is developing a simple one-dimension certified pitch standard (or scale) covering the range 1 um to 10 mm, intended for the calibration of microscope magnification and dimensional metrology instrumen ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820812

928. Novel Methods for Length Measurement Employing Diode Lasers
Topic: Manufacturing
Published: 1/1/1996
Authors: Jack A Stone Jr., Lowell P. Howard, Alois Stejskal, M Stephens, C Oates, L Hollberg
Abstract: Diode lasers have several unique capabilities for length-measurement applications, arising from properties of the diodes that are much different from those of the venerable helium-neon laser presently used for most interferometric measurements. For e ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820823

929. Optical Overlay Metrology at NIST
Topic: Manufacturing
Published: 1/1/1996
Authors: Richard M Silver, Amy Singer, L Carroll, S Berg-cross, James Edward Potzick
Abstract: Many of the significant challenges in making accurate overlay registration measurements are discussed. An understanding of the causes of the errors affecting these measurements is a prerequisite to improving accuracy and also for the design of standa ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820818

930. Progress Towards Accurate Metrology Using Atomic Force Microscopy
Topic: Manufacturing
Published: 1/1/1996
Authors: T Mcwaid, J Schneir, John S Villarrubia, Ronald G Dixson, V W. Tsai
Abstract: Accurate metrology using atomic force microscopy (AFM) requires accurate control of the tip position, an estimate of the tip geometry, and an understanding of the tip-surface interaction forces. We describe recent progress at NIST towards accurate AF ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820798



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