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Topic Area: Manufacturing

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Displaying records 921 to 930 of 1000 records.
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921. Diode Lasers in Length Metrology: Application to Absolute Distance Interferometry
Topic: Manufacturing
Published: 1/1/1999
Authors: Jack A Stone Jr, Lowell P. Howard, Alois Stejskal
Abstract: Diode lasers are becoming increasingly important in length metrology. In particular, the tunability of diode lasers makes them attractive for applications such as absolute distance interferometry (ADI). In this paper we describe the current status of ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820953

922. Measurement Uncertainty and Noise in Nanometrology
Topic: Manufacturing
Published: 1/1/1999
Author: James Edward Potzick
Abstract: The measurement of feature sizes on integrated circuit photomasks and wafers is an economically important and technically challenging application of nanometrology. The displacement measuring laser heterodyne interferometer is a popular tool in such ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820946

923. Measurement Uncertainty and Uncorrected Bias
Topic: Manufacturing
Published: 1/1/1999
Authors: Steven David Phillips, K Eberhardt, William Tyler Estler
Abstract: This paper discusses the distinction between measurement uncertainty, measurement errors and their role in the calibration process. The issue of including uncorrected bias is addressed and a method to extend the current ISO Guide to the Expression of ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820942

924. Modified Field Studies for CSCW Systems
Topic: Manufacturing
Published: 1/1/1999
Authors: Michelle Potts Steves, Jean C. Scholtz
Abstract: We, at the National Institute of Standards and Technology (NIST), are in the process of instituting and assessing collaboration technologies for manufacturing applications. This position paper for the Computer Supported Cooperative Work (CSCW) Evalu ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=821522

925. Noise averaging and measurement resolution (or a "little noise is a good thing")
Topic: Manufacturing
Published: 1/1/1999
Author: James Edward Potzick
Abstract: When a continuous quantity is measured with a digital instrument or digitized for further processing, a measurement uncertainty component is incurred from quantization of the continuous variable. This uncertainty can be reduced by oversampling and av ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820947

926. Radiationless Resonant Raman Scattering at the Ar K Edge
Topic: Manufacturing
Published: 1/1/1999
Authors: Thomas W LeBrun, S H Southworth, G B Armen, M A MacDonald, Y Azuma
Abstract: Partial cross sections for Ar K-LZL3(1 D2)np, n=4 and 5 spectator Auger states excited by x-ray absorption across the K-edge were measured and compared with calculations based on the theory or radiationless resonant Raman scattering. Core relaxation ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820935

927. Self-Calibration and Error Compensation Using Reference Position Markers
Topic: Manufacturing
Published: 1/1/1999
Author: H Zou
Abstract: In this paper, reference position markers are proposed for self-calibration and error compensation. Self-calibration of x-y motion guides is discussed with a focus on the orthogonality calibration. An algorithm is developed using a closure method and ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820956

928. Sources of Error in Absolute Distance Interferometry
Topic: Manufacturing
Published: 1/1/1999
Authors: Jack A Stone Jr, Alois Stejskal, Lowell P. Howard
Abstract: In this paper we describe the status of our research on the use of diode lasers for absolute distance interferometry, and we discuss the major sources of uncertainty that limit the accuracy of this technique for distance measurement. We have primaril ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820951

929. Telepresence:  A New Paradigm for Solving Contamination Problems
Topic: Manufacturing
Published: 1/1/1999
Authors: Michael T Postek, Marylyn H. Bennett, N J Zaluzec
Abstract: When a contamination event occurs in a semiconductor fab, a process engineer must act quickly to find the cause. It is cost-prohibitive to maintain a full complement of analytical tools in a fab that would be necessary to identify very small particle ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=823117

930. Telepresence: A New Paradigm for Solving Contamination Problems
Topic: Manufacturing
Published: 1/1/1999
Authors: Michael T Postek, Marylyn H. Bennett, N J Zaluzec
Abstract: When a contamination event occurs in a semiconductor fab, a process engineer must act quickly to find the cause. It is cost-prohibitive to maintain a full compliment of analytical tools in a fab that would be necessary to identify very small particle ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820944



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