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Topic Area: Optical Metrology
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Displaying records 81 to 90 of 100 records.
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81. SCATTERFIELD MICROSCOPY, REVIEW OF TECHNIQUES THAT PUSH THE FUNDAMENTAL LIMITS OF OPTICAL DEFECT METROLOGY
Topic: Optical Metrology
Published: 3/25/2013
Authors: Richard M Silver, Bryan M Barnes, Francois Romain Francis Goasmat, Hui Zhou, Martin Yeungjoon Sohn
Abstract: The semiconductor manufacturing industry is now facing serious challenges in achieving defect detection rates with acceptable throughput and accuracy. With conventional bright-field and dark- field inspection methods now at their limits, it has b ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=913246

82. Scalable multiplexed detector system for high-rate telecom-bandsingle-photon detection
Topic: Optical Metrology
Published: 11/25/2009
Authors: Sergey V Polyakov, Alan L Migdall, Giorgio Brida, Ivo P Degiovanni, Fabrizio Piacentini, V Schettini
Abstract: We present a photon-counting detection system at telecom wavelengths that overcomes the difficulties of photon-counting at high rates. Our detection system uses active multiplexing, an array of N detectors, and a 1-by-N optical switch with a control ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=902508

83. Spectrophotometer Linearity Testing Using the Double-Aperture Method
Topic: Optical Metrology
Published: 10/1/1972
Authors: Klaus Mielenz, K Eckerle
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=620035

84. Standardization of Broadband UV Measurements for 365 nm LED Sources
Series: Journal of Research (NIST JRES)
Report Number: 117.004
Topic: Optical Metrology
Published: 2/2/2012
Author: George P Eppeldauer
Abstract: Broadband UV measurements are analyzed when UV-A irradiance meters measure optical radiation from 365-nm sources. The CIE standardized rectangular-shape UV-A function can be realized only with large spectral mismatch errors. The spectral power-di ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=909003

85. Supercontinuum fiber laser source for reflectance calibrations in remote sensing
Topic: Optical Metrology
Published: 8/1/2010
Authors: Clarence Joseph Zarobila, Heather J Patrick
Abstract: The Optical Technology Division of the NIST provides reference measurements of specular and diffuse reflectance of materials, including measurements that provide traceability for diffuser plaques that are used as onboard calibration standards in remo ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=906175

86. Synchrotron Radiation Based Irradiance Calibration From 200 nm to 400 nm at SURF III
Topic: Optical Metrology
Published: 1/1/2007
Authors: Uwe Arp, Charles E Gibson, Keith R Lykke, Albert C. Parr, Robert D. Saunders, D J Shin, Ping-Shine Shaw, Zhigang Li, Howard W Yoon
Abstract: A new facility for measuring source irradiance was commissioned recently at the National Institute of Standards and Technology (NIST). The facility uses the calculable radiation from the Synchrotron Ultraviolet Radiation Facility (SURF III) as the pr ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=841022

87. THz Spectroscopic Study of Rust Layer on Aged Steel-Reinforced Structural Components
Topic: Optical Metrology
Published: 9/26/2011
Authors: David F Plusquellic, Virgil Provenzano, Shin G Chou
Abstract: In this study, we use THz-based spectroscopy as a non-destructive diagnostic tool to characterize the corrosion by-products (rust) on aged iron structural components. Even though previous Mossbauer spectroscopic findings suggested the presence of an ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=907023

88. TSOM Method for Nanoelectronics Dimensional Metrology
Topic: Optical Metrology
Published: 11/18/2011
Author: Ravikiran Attota
Abstract: Through-focus scanning optical microscopy (TSOM) is a relatively new method that transforms conventional optical microscopes into truly three-dimensional metrology tools for nanoscale to microscale dimensional analysis. TSOM achieves this by acquirin ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=908623

89. TSOM Method for Semiconductor Metrology
Topic: Optical Metrology
Published: 4/18/2011
Authors: Ravikiran Attota, Ronald G Dixson, John A Kramar, James Edward Potzick, Andras Vladar, Benjamin D. Bunday, Erik Novak, Andrew C. Rudack
Abstract: Through-focus scanning optical microscopy (TSOM) is a new metrology method that achieves 3D nanoscale measurement resolution using conventional optical microscopes; measurement sensitivities are comparable to what is typical using Scatterometry, SEM ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=908177

90. TSV Reveal height and bump dimension metrology by the TSOM method
Topic: Optical Metrology
Published: 4/30/2013
Authors: Ravikiran Attota, Haesung Park, Victor Vartanian, Ndubuisi George Orji, Richard A Allen
Abstract: Through-focus scanning optical microscopy (TSOM) transforms conventional optical microscopes into truly 3D metrology tools for nanoscale- to- microscale dimensional analysis with nanometer-scale sensitivity. Although not a resolution enhancement meth ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=913667