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You searched on: Topic Area: Optical Metrology Sorted by: title

Displaying records 61 to 70.
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61. Spectral responsivity based calibration of photometer and colorimeter standards
Topic: Optical Metrology
Published: 6/19/2013
Author: George P Eppeldauer
Abstract: Several new generation transfer- and working-standard illuminance meters and tristimulus colorimeters have been developed at the National Institute of Standards and Technology (NIST) to measure all kinds of light sources with low uncertainty. The spe ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=913528

62. Standardization of Broadband UV Measurements
Topic: Optical Metrology
Published: 1/1/2013
Author: George P Eppeldauer
Abstract: The CIE standardized rectangular-shape UV response functions can be realized only with large spectral mismatch errors. The spectral power-distribution of UV sources is not standardized. Accordingly, the readings of different types of UV meters, even ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=913173

63. Superconducting nanowire single photon detectors fabricated from an amorphous Mo0.75Ge0.25 thin-film
Topic: Optical Metrology
Published: 7/15/2014
Authors: Varun Boehm Verma, Adriana E Lita, Michael R Vissers, Francesco Marsili, David P Pappas, Richard P Mirin, Sae Woo Nam
Abstract: We present the characteristics of superconducting nanowire single photon detectors (SNSPDs) fabricated from amorphous Mo0.75Ge0.25 thin -films. Fabricated devices show a saturation of the internal detection efficiency at temperatures below 1 K, w ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=915243

64. Synchrotron Radiation Based Irradiance Calibration From 200 nm to 400 nm at SURF III
Topic: Optical Metrology
Published: 1/1/2007
Authors: Uwe Arp, Charles E Gibson, Keith R. Lykke, Albert C Parr, Robert D. Saunders, D J Shin, Ping-Shine Shaw, Zhigang Li, Howard W Yoon
Abstract: A new facility for measuring source irradiance was commissioned recently at the National Institute of Standards and Technology (NIST). The facility uses the calculable radiation from the Synchrotron Ultraviolet Radiation Facility (SURF III) as the pr ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=841022

65. THz Spectroscopic Study of Iron Oxide Layers within Steel-Reinforced Structural Components
Topic: Optical Metrology
Published: 9/26/2011
Authors: Virgil Provenzano, Shin G. Chou
Abstract: In this study, we use THz-based spectroscopy as a non-destructive diagnostic tool to characterize the corrosion by-products (rust) on aged iron structural components. Even though previous Mossbauer spectroscopic findings suggested the presence of an ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=907023

66. TSOM Method for Semiconductor Metrology
Topic: Optical Metrology
Published: 4/18/2011
Authors: Ravikiran Attota, Ronald G Dixson, John A Kramar, James Edward Potzick, Andras Vladar, Benjamin D. Bunday, Erik Novak, Andrew C. Rudack
Abstract: Through-focus scanning optical microscopy (TSOM) is a new metrology method that achieves 3D nanoscale measurement resolution using conventional optical microscopes; measurement sensitivities are comparable to what is typical using Scatterometry, SEM ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=908177

67. Time and Frequency-Domain Spectroscopy with Dual Frequency Combs
Topic: Optical Metrology
Published: 5/28/2009
Authors: Nathan Reynolds Newbury, Ian R Coddington, William C Swann
Abstract: High-resolution spectroscopic measurements of the amplitude and phase spectra from a gas sample can be acquired by use of dual frequency combs. Here we discuss the corresponding gas signature in the time domain.
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=901109

68. Use of TSOM for sub-11 nm node pattern defect detection and HAR features
Topic: Optical Metrology
Published: 4/30/2013
Authors: Ravikiran Attota, Abraham Arceo, Bunday Benjamin
Abstract: In-line metrologies currently used in the semiconductor industry are being challenged by the aggressive pace of device scaling and the adoption of novel device architectures. In defect inspection, conventional bright field techniques will not likely ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=913698

69. Wavelength References for Optical Interferometry
Topic: Optical Metrology
Published: 6/12/2005
Authors: Richard W Fox, Leo W. Hollberg
Abstract: We are exploring air wavelength references useful for interferometry. Femtosecond comb frequency measurements determine mode wavelengths of a stable optical cavity in vacuum, and subsequently a tunable laser is locked to the modes in air.
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=30063

70. Weak value thermostat with 0.2 mK precision
Topic: Optical Metrology
Published: 12/1/2012
Authors: Patrick F Egan, Jack A Stone Jr.
Abstract: A new laser-based thermostat sensitive to 0.2 mK at room temperature is reported. The method utilizes a fluid-filled prism and interferometric weak value amplification to sense nanoradian deviations of a laser beam: due to the high thermooptic coef ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=912232



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