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Topic Area: Optical Metrology
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Displaying records 11 to 20 of 118 records.
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11. Use of TSOM for sub-11 nm node pattern defect detection and HAR features
Topic: Optical Metrology
Published: 4/30/2013
Authors: Ravikiran Attota, Abraham Arceo, Bunday Benjamin
Abstract: In-line metrologies currently used in the semiconductor industry are being challenged by the aggressive pace of device scaling and the adoption of novel device architectures. In defect inspection, conventional bright field techniques will not likely ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=913698

12. Enhancing 9 nm Node Dense Patterned Defect Optical Inspection using Polarization, Angle, and Focus
Topic: Optical Metrology
Published: 4/10/2013
Authors: Bryan M Barnes, Francois R. Goasmat, Martin Y Sohn, Hui Zhou, Abraham Arceo
Abstract: To measure the new SEMATECH 9 nm node Intentional Defect Array (IDA) and subsequent small, complex defects, a methodology has been used to exploit the rich information content generated when simulating or acquiring several images of sub-wavelength-si ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=913542

13. Intercomparison between optical and x-ray scatterometry measurements of FinFET structures
Topic: Optical Metrology
Published: 4/8/2013
Authors: Paul Lemaillet, Thomas Avery Germer, Regis J Kline, Daniel Franklin Sunday, Chengqing C. Wang, Wen-Li Wu
Abstract: In this paper, we present a comparison of profile measurements of vertical field effect transistor (FinFET) fin arrays by optical critical dimension (OCD) metrology and critical dimension small angle X-ray scattering (CD-SAXS) metrology. Spectroscopi ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=913230

14. 3-D Optical Metrology of Finite sub-20 nm Dense Arrays using Fourier Domain Normalization
Topic: Optical Metrology
Published: 3/25/2013
Authors: Jing Qin, Hui Zhou, Bryan M Barnes, Ronald G Dixson, Richard M Silver
Abstract: Reduced target dimensions requiring improved resolution and sensitivity have driven the need to use and analyze the phase and scattered frequency information available when using image-based scatterometry systems. One such system is scatterfield micr ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=912961

15. SCATTERFIELD MICROSCOPY, REVIEW OF TECHNIQUES THAT PUSH THE FUNDAMENTAL LIMITS OF OPTICAL DEFECT METROLOGY
Topic: Optical Metrology
Published: 3/25/2013
Authors: Richard M Silver, Bryan M Barnes, Francois R. Goasmat, Hui Zhou, Martin Y Sohn
Abstract: The semiconductor manufacturing industry is now facing serious challenges in achieving defect detection rates with acceptable throughput and accuracy. With conventional bright-field and dark- field inspection methods now at their limits, it has b ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=913246

16. Accurate, inexpensive testing of handheld lasers for safe use and operation
Topic: Optical Metrology
Published: 3/7/2013
Authors: Marla L Dowell, Joshua Aram Hadler
Abstract: An accurate, inexpensive test bed for measurements of optical power emitted from handheld lasers is described. Our test bed consists of a thermopile detector, bandpass optical filters, an adjustable iris, and self-centering holders for mounting of th ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=912781

17. Nanoscale Specific Heat Capacity Measurements Using Optoelectronic Bilayer Microcantilevers
Topic: Optical Metrology
Published: 12/12/2012
Authors: Brian G. (Brian Gregory) Burke, William A Osborn, Richard Swift Gates, David A LaVan
Abstract: We describe a new technique for optically and electrically detecting and heating bilayer microcantilevers (Pt−SiNx) to high temperatures at fast heating rates for nanoscale specific heat capacity measurements. The bilayer microcantilever acts s ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=912233

18. Weak value thermostat with 0.2 mK precision
Topic: Optical Metrology
Published: 12/1/2012
Authors: Patrick F Egan, Jack A Stone Jr
Abstract: A new laser-based thermostat sensitive to 0.2 mK at room temperature is reported. The method utilizes a fluid-filled prism and interferometric weak value amplification to sense nanoradian deviations of a laser beam: due to the high thermooptic coef ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=912232

19. Realisation of an accurate and repeatable wavelength scale for double subtractive monochromators
Topic: Optical Metrology
Published: 10/30/2012
Author: Malcolm Graham White
Abstract: We present the results and discussion of two methods for achieving a higher degree of wavelength accuracy of double grating monochromators. In particular, we assessed the benefits of using differential evolution curve fitting techniques to minimi ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=911386

20. Multiple-order Imaging for Optical Critical Dimension Metrology using Microscope Characterization
Topic: Optical Metrology
Published: 10/11/2012
Authors: Jing Qin, Hui Zhou, Bryan M Barnes, Francois R. Goasmat, Ronald G Dixson, Richard M Silver
Abstract: There has been much recent work in developing advanced optical metrology applications that use imaging optics for optical critical dimension (OCD) measurements, defect detection, and for potential use with in-die metrology applications. We have previ ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=912169



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