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You searched on: Topic Area: Optical Metrology Sorted by: date

Displaying records 1 to 10 of 48 records.
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1. Single molecule confocal fluorescence lifetime correlation spectroscopy for accurate nanoparticle size determination
Topic: Optical Metrology
Published: 5/15/2014
Authors: Bonghwan B. Chon, Kimberly A Briggman, Jeeseong Hwang
Abstract: We report on an experimental procedure in confocal single molecule fluorescence lifetime correlation spectroscopy (FLCS) to determine the range of excitation power and molecule concentration in solution under which the application of an unmodified ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=914381

2. Practical Use and Calculation of CCT and Duv
Topic: Optical Metrology
Published: 10/18/2013
Author: Yoshihiro Ohno
Abstract: The Correlated Color Temperature (CCT) is often used to represent chromaticity of white light sources, but chromaticity is two-dimensional, and another dimension, the distance from the Planckian locus, is often missing. Duv is defined in ANSI C78.377 ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=912622

3. Fourier Domain Optical Tool Normalization for Quantitative Parametric Image Reconstruction
Topic: Optical Metrology
Published: 9/5/2013
Authors: Jing Qin, Richard M Silver, Bryan M Barnes, Hui H. Zhou, Francois R. Goasmat
Abstract: There has been much recent work in developing advanced optical metrology methods that use imaging optics for critical dimension measurements and defect detection. Sensitivity to nanometer scale changes has been observed when measuring critical dimens ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=913587

4. Spectral responsivity based calibration of photometer and colorimeter standards
Topic: Optical Metrology
Published: 6/19/2013
Author: George P Eppeldauer
Abstract: Several new generation transfer- and working-standard illuminance meters and tristimulus colorimeters have been developed at the National Institute of Standards and Technology (NIST) to measure all kinds of light sources with low uncertainty. The spe ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=913528

5. Use of TSOM for sub-11 nm node pattern defect detection and HAR features
Topic: Optical Metrology
Published: 4/30/2013
Authors: Ravikiran Attota, Abraham Arceo, Bunday Benjamin
Abstract: In-line metrologies currently used in the semiconductor industry are being challenged by the aggressive pace of device scaling and the adoption of novel device architectures. In defect inspection, conventional bright field techniques will not likely ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=913698

6. Enhancing 9 nm Node Dense Patterned Defect Optical Inspection using Polarization, Angle, and Focus
Topic: Optical Metrology
Published: 4/10/2013
Authors: Bryan M Barnes, Francois R. Goasmat, Martin Y Sohn, Hui H. Zhou, Abraham Arceo
Abstract: To measure the new SEMATECH 9 nm node Intentional Defect Array (IDA) and subsequent small, complex defects, a methodology has been used to exploit the rich information content generated when simulating or acquiring several images of sub-wavelength-si ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=913542

7. Intercomparison between optical and x-ray scatterometry measurements of FinFET structures
Topic: Optical Metrology
Published: 4/8/2013
Authors: Paul Lemaillet, Thomas Avery Germer, Regis J Kline, Daniel Franklin Sunday, Chengqing C. Wang, Wen-Li Wu
Abstract: In this paper, we present a comparison of profile measurements of vertical field effect transistor (FinFET) fin arrays by optical critical dimension (OCD) metrology and critical dimension small angle X-ray scattering (CD-SAXS) metrology. Spectroscopi ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=913230

8. 3-D Optical Metrology of Finite sub-20 nm Dense Arrays using Fourier Domain Normalization
Topic: Optical Metrology
Published: 3/25/2013
Authors: Jing Qin, Hui H. Zhou, Bryan M Barnes, Ronald G Dixson, Richard M Silver
Abstract: Reduced target dimensions requiring improved resolution and sensitivity have driven the need to use and analyze the phase and scattered frequency information available when using image-based scatterometry systems. One such system is scatterfield micr ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=912961

9. SCATTERFIELD MICROSCOPY, REVIEW OF TECHNIQUES THAT PUSH THE FUNDAMENTAL LIMITS OF OPTICAL DEFECT METROLOGY
Topic: Optical Metrology
Published: 3/25/2013
Authors: Richard M Silver, Bryan M Barnes, Francois R. Goasmat, Hui H. Zhou, Martin Y Sohn
Abstract: The semiconductor manufacturing industry is now facing serious challenges in achieving defect detection rates with acceptable throughput and accuracy. With conventional bright-field and dark- field inspection methods now at their limits, it has b ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=913246

10. Accurate, inexpensive testing of handheld lasers for safe use and operation
Topic: Optical Metrology
Published: 3/7/2013
Authors: Marla L Dowell, Joshua Aram Hadler
Abstract: An accurate, inexpensive test bed for measurements of optical power emitted from handheld lasers is described. Our test bed consists of a thermopile detector, bandpass optical filters, an adjustable iris, and self-centering holders for mounting of th ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=912781



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