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Topic Area: Optical Metrology

Displaying records 51 to 60 of 138 records.
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51. Metrologia
Topic: Optical Metrology
Published: 7/8/2011
Authors: Uwe Arp, Zhigang Li, Ping-Shine Shaw, Mathias Richter, Roman Klein, Wolfgang Paustian, Reiner Thornagel
Abstract: We report on a successful bilateral inter-comparison between the Physikalisch-Technische Bundesanstalt (PTB) and the National Institute of Standards and Technology (NIST). In both laboratories deuterium lamps were calibrated using the calculability o ...

52. Determination of the quantum yield of the ferrioxalate and KI/KIO3 actinometers and a method for the calibration of radiometer detectors
Topic: Optical Metrology
Published: 7/5/2011
Authors: J R Bolton, Michaela I. Stefan, Ping-Shine Shaw, Keith R Lykke
Abstract: Abstract: The quantum yields for two popular actinometers have been determined using the tunable laser light source at the National Institute for Standards and Technology in Gaithersburg, MD. The power of this light source has been calibrated agains ...

53. Absolute refractometry of dry gas to {+ or -}3 parts in 10^u9^
Topic: Optical Metrology
Published: 6/20/2011
Authors: Patrick F Egan, Jack A Stone Jr
Abstract: We present a method of measuring the refractive index of dry gases absolutely at 632.8 nm wavelength using a Fabry-Perot cavity with an expanded uncertainty of < 3 {multiply} 10^u-9^ (coverage factor {I}k{/I} = 2. The main contribution to this uncer ...

54. Statistical Methods for Analyzing Color Differences
Topic: Optical Metrology
Published: 6/2/2011
Authors: Maria E Nadal, Carl C Miller, Hugh Fairman
Abstract: Multi-valued measurands, such as spectral reflectance or transmission, tristimulus values, are usually analyzed by reducing the data to a single-valued parameter, such as color difference. The variations of sets of color differences are non-normal d ...

55. Effects of Roughness on Scatterometry Signatures
Topic: Optical Metrology
Published: 5/26/2011
Authors: Martin Foldyna, Thomas Avery Germer, Brent Bergner
Abstract: We used azimuthally-resolved spectroscopic Mueller matrix ellipsometry to study a periodic silicon line structure with and without artificially-generated line edge roughness (LER). Grating profiles were determined from multiple azimuthal configuratio ...

56. Progress toward redetermining the Boltzmann constant with a fixed-path-length cylindrical resonator
Topic: Optical Metrology
Published: 5/21/2011
Authors: Jintao Zhang, H. Lin, X.J. Feng, J.P. Sun, Keith A Gillis, Michael R Moldover, Y.Y. Duan
Abstract: We used a single, fixed-path-length cylindrical-cavity resonator to measure {I}c{/I}^d0^ = (307.8252 {+ or -} 0.0012) m{bullet}s^u−1^, the zero-density limit of the speed of sound in pure argon at the temperature of the triple point of water. ...

57. Binary amplitude holograms made from dyed photoresist
Topic: Optical Metrology
Published: 5/13/2011
Authors: Quandou Wang, Ulf Griesmann, John H Burnett
Abstract: A method for fabricating binary amplitude holograms from a dyed photoresist is described. It is of particular interest for holograms that are used as null lenses in the form metrology of aspheric surfaces and wavefronts. A pigment that stron ...

58. Mueller matrix bidirectional reflectance distribution function measurements and modeling of diffuse reflectance standards
Topic: Optical Metrology
Published: 4/20/2011
Authors: Thomas Avery Germer, Heather J Patrick
Abstract: We measure the Mueller matrix bidirectional reflectance distribution function (BRDF) of pressed and sintered powdered polytetrafluoroethylene (PTFE) reflectance standards for an incident angle of 75°. Rotationally averaged Mueller matrices from the m ...

59. Mueller matrix ellipsometry of artificial non-periodic line edge roughness in presence of finite numerical aperture
Topic: Optical Metrology
Published: 4/20/2011
Authors: Thomas Avery Germer, Martin Foldyna, Brent Bergner
Abstract: We used azimuthally-resolved spectroscopic Mueller matrix ellipsometry to study a periodic silicon line structure with and without artificially-generated line edge roughness (LER). The unperturbed, reference grating profile was determined from multip ...

60. TSOM Method for Semiconductor Metrology
Topic: Optical Metrology
Published: 4/18/2011
Authors: Ravikiran (Ravikiran) Attota, Ronald G Dixson, John A Kramar, James Edward Potzick, Andras Vladar, Benjamin D. Bunday, Erik Novak, Andrew C. Rudack
Abstract: Through-focus scanning optical microscopy (TSOM) is a new metrology method that achieves 3D nanoscale measurement resolution using conventional optical microscopes; measurement sensitivities are comparable to what is typical using Scatterometry, SEM ...

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