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Topic Area: Optical Metrology

Displaying records 41 to 50 of 118 records.
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41. Absolute refractometry of dry gas to {+ or -}3 parts in 10^u9^
Topic: Optical Metrology
Published: 6/20/2011
Authors: Patrick F Egan, Jack A Stone Jr
Abstract: We present a method of measuring the refractive index of dry gases absolutely at 632.8 nm wavelength using a Fabry-Perot cavity with an expanded uncertainty of < 3 {multiply} 10^u-9^ (coverage factor {I}k{/I} = 2. The main contribution to this uncer ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=907731

42. Effects of Roughness on Scatterometry Signatures
Topic: Optical Metrology
Published: 5/26/2011
Authors: Martin Foldyna, Thomas Avery Germer, Brent Bergner
Abstract: We used azimuthally-resolved spectroscopic Mueller matrix ellipsometry to study a periodic silicon line structure with and without artificially-generated line edge roughness (LER). Grating profiles were determined from multiple azimuthal configuratio ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=908805

43. Progress toward redetermining the Boltzmann constant with a fixed-path-length cylindrical resonator
Topic: Optical Metrology
Published: 5/21/2011
Authors: Jintao Zhang, H. Lin, X.J. Feng, J.P. Sun, Keith A Gillis, Michael R Moldover, Y.Y. Duan
Abstract: We used a single, fixed-path-length cylindrical-cavity resonator to measure {I}c{/I}^d0^ = (307.8252 {+ or -} 0.0012) m{bullet}s^u−1^, the zero-density limit of the speed of sound in pure argon at the temperature of the triple point of water. ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=907610

44. Binary amplitude holograms made from dyed photoresist
Topic: Optical Metrology
Published: 5/13/2011
Authors: Quandou Wang, Ulf Griesmann, John H Burnett
Abstract: A method for fabricating binary amplitude holograms from a dyed photoresist is described. It is of particular interest for holograms that are used as null lenses in the form metrology of aspheric surfaces and wavefronts. A pigment that stron ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=907217

45. Mueller matrix bidirectional reflectance distribution function measurements and modeling of diffuse reflectance standards
Topic: Optical Metrology
Published: 4/20/2011
Authors: Thomas Avery Germer, Heather J Patrick
Abstract: We measure the Mueller matrix bidirectional reflectance distribution function (BRDF) of pressed and sintered powdered polytetrafluoroethylene (PTFE) reflectance standards for an incident angle of 75°. Rotationally averaged Mueller matrices from the m ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=909321

46. Mueller matrix ellipsometry of artificial non-periodic line edge roughness in presence of finite numerical aperture
Topic: Optical Metrology
Published: 4/20/2011
Authors: Thomas Avery Germer, Martin Foldyna, Brent Bergner
Abstract: We used azimuthally-resolved spectroscopic Mueller matrix ellipsometry to study a periodic silicon line structure with and without artificially-generated line edge roughness (LER). The unperturbed, reference grating profile was determined from multip ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=908372

47. TSOM Method for Semiconductor Metrology
Topic: Optical Metrology
Published: 4/18/2011
Authors: Ravikiran Attota, Ronald G Dixson, John A Kramar, James Edward Potzick, Andras Vladar, Benjamin D. Bunday, Erik Novak, Andrew C. Rudack
Abstract: Through-focus scanning optical microscopy (TSOM) is a new metrology method that achieves 3D nanoscale measurement resolution using conventional optical microscopes; measurement sensitivities are comparable to what is typical using Scatterometry, SEM ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=908177

48. Introduction to special issue on single-photon technologies
Topic: Optical Metrology
Published: 3/10/2011
Authors: Alan L Migdall, Sergey V Polyakov, Jingyun Fan, Ivo Pietro Degiovanni, Jessica Cheung
Abstract: This special issue accompanies the 4th international conference on single-photon technologies held at the National Institute of Standards and Technology (NIST) Boulder in November 2009. This community has met every two years at national metrology ins ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=907536

49. Experimental realization of a low-noise heralded single photon source
Topic: Optical Metrology
Published: 1/17/2011
Authors: Alan L Migdall, Sergey V Polyakov, Marco Genovese, Fabrizio Piacentini, I. Ruo Berchera, Ivo P Degiovanni, Giorgio Brida
Abstract: We present a heralded single-photon source with a much lower level of unwanted background photons in the output channel by using the herald photon to control a shutter in the heralded channel. The shutter is implemented using a simple field program ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=906225

50. Far Infrared Absorption Measurements of Single Walled Carbon Nanotubes
Topic: Optical Metrology
Published: 1/17/2011
Authors: Shin G. Chou, Zeeshan Ahmed, Georgy Samsonidze, Jing Kong, Mildred Dresselhaus, David F Plusquellic
Abstract: Variable temperature high resolution far infrared absorption measurements were carried out for single walled carbon nanotubes samples with different diameter distributions. At a temperature where kBT is significantly lower than the phonon energy, th ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=906962



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