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Topic Area: Optical Metrology

Displaying records 1 to 10 of 118 records.
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1. Resolving three-dimensional shape of sub-50 nm wide lines with nanometer-scale sensitivity using conventional optical microscopes
Topic: Optical Metrology
Published: 7/29/2014
Authors: Ravikiran (Ravikiran) Attota, Ronald G Dixson
Abstract: We experimentally demonstrate that the three-dimensional (3-D) shape variations of nanometer-scale objects can be resolved and measured with sub-nanometer scale sensitivity using conventional optical microscopes by analyzing 3-D optical data using th ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=908543

2. Single molecule confocal fluorescence lifetime correlation spectroscopy for accurate nanoparticle size determination
Topic: Optical Metrology
Published: 5/15/2014
Authors: Bonghwan Chon, Kimberly A Briggman, Jeeseong Hwang
Abstract: We report on an experimental procedure in confocal single molecule fluorescence lifetime correlation spectroscopy (FLCS) to determine the range of excitation power and molecule concentration in solution under which the application of an unmodified ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=914381

3. Precise Measurement of Lunar Spectral Irradiance at Visible Wavelengths
Series: Journal of Research (NIST JRES)
Report Number: 118.020
Topic: Optical Metrology
Published: 11/12/2013
Authors: Keith R Lykke, John Taylor Woodward IV, Allan W. Smith
Abstract: We report a measurement of lunar spectral irradiance with an uncertainty below 1 % from 420 nm to 1000 nm. This measurement uncertainty meets the stability requirement for many climate data records derived from satellite images, including those f ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=913841

4. Assessing consistency of a Mueller matrix measurement by rotation of the sample under test
Topic: Optical Metrology
Published: 9/27/2013
Author: Thomas Avery Germer
Abstract: We present a method for checking the consistency of a Mueller matrix measurement. The method is based upon the rotational properties of a Mueller matrix. The sample is placed in the polarimeter in a precision rotation stage. The Mueller matrix is th ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=914354

5. Fourier Domain Optical Tool Normalization for Quantitative Parametric Image Reconstruction
Topic: Optical Metrology
Published: 9/5/2013
Authors: Jing Qin, Richard M Silver, Bryan M Barnes, Hui Zhou, Francois R. Goasmat
Abstract: There has been much recent work in developing advanced optical metrology methods that use imaging optics for critical dimension measurements and defect detection. Sensitivity to nanometer scale changes has been observed when measuring critical dimens ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=913587

6. Optical constants and spatial uniformity of thermally grown oxide layer of custom, induced-junction, silicon photodiodes for a predictable quantum efficient detector
Topic: Optical Metrology
Published: 6/28/2013
Author: Malcolm Graham White
Abstract: We have investigated the optical properties of self-induced inversion-layer silicon photodiodes using spectroscopic ellipsometric measurement techniques. We report a self-consistent data set and dispersion relation for the optical constants of th ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=911553

7. 3-D Optical Metrology of Finite sub-20nm Dense Arrays With sub-nanometer Parametric Uncertainties
Topic: Optical Metrology
Published: 6/23/2013
Authors: Jing Qin, Hui Zhou, Bryan M Barnes, Ronald G Dixson, Richard M Silver
Abstract: A new approach that involves parametric fitting of 3-D scattered field with electromagnetic simulation, Fourier domain normalization, and uncertainties analysis is presented to rigorously analyze 3-D through-focus optical images of targets that scatt ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=913511

8. Spectral responsivity based calibration of photometer and colorimeter standards
Topic: Optical Metrology
Published: 6/19/2013
Author: George P Eppeldauer
Abstract: Several new generation transfer- and working-standard illuminance meters and tristimulus colorimeters have been developed at the National Institute of Standards and Technology (NIST) to measure all kinds of light sources with low uncertainty. The spe ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=913528

9. Critical dimension metrology by through-focus scanning optical microscopy beyond the 22 nm node
Topic: Optical Metrology
Published: 6/7/2013
Authors: Ravikiran (Ravikiran) Attota, Benjamin D. Bunday, Victor Vertanian
Abstract: We present results using simulations and experiments to demonstrate metrological applications of the through-focus scanning optical microscopy (TSOM) down to features at and well below the International Technology Roadmap for Semiconductors' 22  ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=913353

10. TSV Reveal height and bump dimension metrology by the TSOM method
Topic: Optical Metrology
Published: 4/30/2013
Authors: Ravikiran (Ravikiran) Attota, Haesung Park, Victor Vartanian, Ndubuisi G. (Ndubuisi George) Orji, Richard A Allen
Abstract: Through-focus scanning optical microscopy (TSOM) transforms conventional optical microscopes into truly 3D metrology tools for nanoscale- to- microscale dimensional analysis with nanometer-scale sensitivity. Although not a resolution enhancement meth ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=913667



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