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Displaying records 91 to 100 of 747 records.
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91. Lithography and Chemical Modeling of Acid Amplfiers for Use in EUV Photoresists
Topic: Electronics & Telecommunications
Published: 7/28/2011
Authors: Kirstin Kruger, craig higgins, Gregg M. Gallatin, Robert Brainard
Abstract: We postulate that the best way to simultaneously improve resolution, line edge roughness (LER), and sensitivity all in EUV resists is to increase the number of acid molecules generated per absorbed photon. In previous work, we showed that acid ampli ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=908397

92. O2 A-band line parameters to support atmospheric remote sensing. Part II: The rare isotopologues
Topic: Electronics & Telecommunications
Published: 7/21/2011
Authors: Joseph Terence Hodges, David A Long, Daniel K Havey, S. S. Yu, M Okumura, Charles E Miller
Abstract: Frequency-stabilized cavity ring-down spectroscopy (FS-CRDS) was employed to measure over 100 transitions in the R-branch of the b1Σg+←X3Σg-(0,0) band for the rare O2 isotopologues. The use of 17O- and 18O-enriched mixtures allowed fo ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=907932

93. Characterization of the non-uniform reaction in chemically-amplified calix[4]resorcinarene molecular resist thin films
Topic: Electronics & Telecommunications
Published: 7/19/2011
Authors: Vivek M Prabhu, Shuhui Kang, Regis J Kline, Dean M DeLongchamp, Daniel A Fischer, Wen-Li Wu, Sushil K. Satija, Jing Sha, Christopher K. Ober, Peter V. Bonnesen
Abstract: The ccc stereoisomer-purified tert-butoxycarbonyloxy (t-Boc) protected calix[4]resorcinarene molecular resists blended with photoacid generator exhibit a non-uniform photoacid catalyzed reaction in thin films. The surface displays a reduced reaction ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=908683

94. In Situ Gas Phase Measurements During Metal Alkylamide Atomic Layer Deposition
Topic: Electronics & Telecommunications
Published: 7/12/2011
Authors: James E Maslar, William Andrew Kimes, Brent A Sperling
Abstract: Metal alkylamide compounds, such as tetrakis(ethylmethylamido) hafnium (TEMAH), represent a technologically important class of metalorganic precursors for the deposition of metal oxides and metal nitrides via atomic layer deposition (ALD) or chemical ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=908672

95. Small fluctuations in epitaxial growth via conservative noise
Topic: Electronics & Telecommunications
Published: 7/7/2011
Authors: Paul N. Patrone, Rongrong Wang, Dionisios Margetis
Abstract: We study the combined effect of growth (material deposition from above) and nearest-neighbor entropic and force-dipole interactions in a stochastically perturbed system of N line defects (steps) on a vicinal crystal surface in 1+1 dimensions. Firs ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=908523

96. Stable isotope-labeling of DNA repair proteins, and their purification and characterization
Topic: Electronics & Telecommunications
Published: 7/1/2011
Authors: M Miral Dizdar, Pawel Jaruga, Prasad T Reddy, Bryant C Nelson, Mark S Lowenthal
Abstract: Reduced DNA repair capacity is associated with increased risk for a variety of disease processes including carcinogenesis. Thus, DNA repair proteins have the potential to be used as important predictive, prognostic and therapeutic biomarkers in cance ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=907266

97. Guided three-dimensional catalyst folding during Metal assisted Chemical Etching of Silicon
Topic: Electronics & Telecommunications
Published: 6/28/2011
Authors: Konrad Rykaczewski, Owen J. Hildreth, Ching P. Wong, Andrei G. Fedorov, John Henry j Scott
Abstract: In order to fabricate truly complex three-dimensional (3D) silicon nanostructures fabrication methods which expand beyond the concept of creation of straight 3D structures by direct extension of two dimensional (2D) patterns need to be developed. In ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=908006

98. Hydrodynamic Fractionation of Finite Size Nano Gold Clusters
Topic: Electronics & Telecommunications
Published: 6/15/2011
Authors: De-Hao D. Tsai, Tae Joon Cho, Frank W DelRio, Julian S. Taurozzi, Michael Russel Zachariah, Vincent A Hackley
Abstract: We demonstrate a high resolution in situ experimental method for performing simultaneous size-classification and characterization of functional nanoscale gold clusters (NGCs) based on asymmetric-flow field flow fractionation (AFFF). Field emission sc ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=908232

99. Methodology for imaging of nano-to-microscale water condensation dynamics on complex nanostructures
Topic: Electronics & Telecommunications
Published: 6/11/2011
Authors: Konrad Rykaczewski, John Henry j Scott
Abstract: By transferring of a small part of a macroscale sample to a novel thermally insulated sample platform we are able to mitigate flooding and electron heating problems typically associated with Environmental Scanning Electron Microscopy imaging of water ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=908396

100. Fluid interactions with metafilm/metasurfaces for tuning, sensing, and microwave assisted chemical processes
Topic: Electronics & Telecommunications
Published: 5/25/2011
Authors: Joshua A Gordon, Christopher L Holloway, James C Booth, James R. Baker-Jarvis, David R Novotny, Sung Kim, Yu Y. Wang
Abstract: In this paper we demonstrate tunability of a metafilm, which is the two-dimensional equivalent of a metamaterial, also referred to as a metasurface, by changing the permittivity in a micro-fluidic channel that interacts with the metafilm. Numerical s ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=907703



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