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21. Magnetic Depth Profiling Co/Cu Multilayers to Investigate Magnetoresistance
John Unguris, D Tulchinsky, Michael H Kelley, Julie A. Borchers, Joseph A. Dura, Charles F. Majkrzak, S. Y. Hsu, R Loloee, W Pratt, J Bass
The magnetic microstructure responsible for the metastable high resistance state of weakly coupled, as-prepared [Co(6nm)/Cu(6nm)]^d20 ^multilayer was analyzed using polarized neutron reflectivity (PNR) and scanning electron microscopy with polarizati ...