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Topic Area: Nanofabrication, Nanomanufacturing, and Nanoprocessing
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Displaying records 31 to 40 of 96 records.
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31. Laser Focused Atomic Deposition
Topic: Nanofabrication, Nanomanufacturing, and Nanoprocessing
Published: 11/5/1993
Authors: Jabez J McClelland, R E. Scholten, E C Palm, Robert Celotta
Abstract: The ability to fabricate nanometer-sized structures that are stable in air has the potential to contribute significantly to the advancement of new nanotechnologies and our understanding of nanoscale systems. Laser light can be used to control the mot ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=620427

32. Laser Focused Atomic Deposition
Topic: Nanofabrication, Nanomanufacturing, and Nanoprocessing
Published: 1/1/1994
Authors: Jabez J McClelland, R E. Scholten, R Gupta, Robert Celotta
Abstract: We demonstrate the use of a standing-wave laser beam to focus chromium atoms as they deposit onto a silicon surface. A permanent array of Cr lines has been fabricated with line width 65 nm, spacing 213 nm, and height 34 nm. The array covers an area ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=620438

33. Laser Focusing of Atoms for Nanostructure Fabrication
Topic: Nanofabrication, Nanomanufacturing, and Nanoprocessing
Published: 1/1/1996
Authors: Jabez J McClelland, R Gupta, Zeina Jabbour Kubarych, Robert Celotta
Abstract: Laser-focusing of atoms has emerged as a viable form of nanofabrication. Structures are formed by focusing chromium atoms as they deposit onto a surface. The focusing occurs in a standing-wave laser field in one or two dimensions, resulting in arrays ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=620463

34. Laser Focusing of Atoms: A Particle Optics Approach
Topic: Nanofabrication, Nanomanufacturing, and Nanoprocessing
Published: 1/1/1990
Authors: Jabez J McClelland, M Scheinfein
Abstract: The use of TEM*^d01^ ("donut") mode laser beam has been proposed as a means of focusing an atomic beam to nanometer scale spot diameters. We have analyzed the classical trajectories of atoms through a donut mode laser beam using methods developed fo ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=620357

35. Laser Focusing of Atoms: A Particle Optics Approach
Topic: Nanofabrication, Nanomanufacturing, and Nanoprocessing
Published: 9/1/1991
Authors: Jabez J McClelland, M Scheinfein
Abstract: The use of a TEM^d01^^u*^-mode laser beam has been proposed as a means of focusing an atomic beam to nanometer-scale spot diameters. We have analyzed the classibal trajectories of atoms through a TEM^d01^^u*^-mode laser beam using methods developed ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=620379

36. Laser Focusing of Chromium Atoms for Nanostructures Fabrication
Topic: Nanofabrication, Nanomanufacturing, and Nanoprocessing
Published: 1/1/1996
Authors: Jabez J McClelland, R Gupta, Robert Celotta
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=620482

37. Laser Manipulation of an Atomic Cr Beam for Controlled Deposition Studies
Topic: Nanofabrication, Nanomanufacturing, and Nanoprocessing
Published: 1/1/1993
Authors: Jabez J McClelland, R E. Scholten, Robert Celotta
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=620411

38. Laser-Focused Atomic Deposition - Nanofabrication via Atom Optics
Topic: Nanofabrication, Nanomanufacturing, and Nanoprocessing
Published: 5/15/2000
Authors: Jabez J McClelland, Robert Celotta
Abstract: In conventional molecular-beam epitaxy, atoms from a diffuse source randomly impinge upon a surface, accumulating in atomic layers or islands. We have recently demonstrated an enhancement of this process, in which the trajectories of the atoms are co ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=620525

39. Laser-Focused Nanofabrication: Beating of Two Atomic Resonances
Topic: Nanofabrication, Nanomanufacturing, and Nanoprocessing
Published: 6/10/2002
Authors: E Jurdik, K van, J Hohlfeld, T Rasing, Jabez J McClelland
Abstract: We deposit a laser-collimated chromium beam onto a substrate through a laser standing-wave (SW) tuned above the atomic resonance at either of the two ^u52^Cr transitions ^u7^S^d3^{rarr}^u7^P{degree}^d3^ at 427.600 nm or ^u7^S^d3^{rarr}^u7^P{degree}^d ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=620543

40. Lithography and Chemical Modeling of Acid Amplfiers for Use in EUV Photoresists
Topic: Nanofabrication, Nanomanufacturing, and Nanoprocessing
Published: 7/28/2011
Authors: Kirstin Kruger, craig higgins, Gregg M. Gallatin, Robert Brainard
Abstract: We postulate that the best way to simultaneously improve resolution, line edge roughness (LER), and sensitivity all in EUV resists is to increase the number of acid molecules generated per absorbed photon. In previous work, we showed that acid ampli ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=908397



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