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Topic Area: Nanofabrication, Nanomanufacturing, and Nanoprocessing
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Displaying records 11 to 20 of 94 records.
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11.
Design of an on-chip microscale nanoassembly system
Topic: Nanofabrication, Nanomanufacturing, and Nanoprocessing
Published: 2/10/2009
Authors: Jason John Gorman, Yong Sik Kim, Andras Vladar, Nicholas G Dagalakis
Abstract: A microscale nanoassembly system has been designed for the fabrication of nanodevices and in situ electromechanical characterisation of nanostructures. This system consists of four Microelectromechanical Systems(MEMS)-based nanomanipulators positione
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http://www.nist.gov/manuscript-publication-search.cfm?pub_id=901179
12.
Design, fabrication and characterization of a single-layer out-of-plane electrothermal actuator for SOI-MEMS Applications
Topic: Nanofabrication, Nanomanufacturing, and Nanoprocessing
Published: 5/3/2012
Authors: Yong Sik Kim, Nicholas G Dagalakis, Satyandra K. Gupta
Abstract: This paper presents the design, fabrication and characterization of a single-layer out-of-plane electrothermal actuator based on MEMS (Micro-Electro-Mechanical System). The proposed electrothermal actuator is designed to generate motions along the ou
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http://www.nist.gov/manuscript-publication-search.cfm?pub_id=910830
13.
Developments in nano-oscillators based upon spin-transfer point-contact devices
Topic: Nanofabrication, Nanomanufacturing, and Nanoprocessing
Published: 12/31/2007
Authors: Thomas J Silva, William H Rippard
Abstract: We review the current status of research on microwave nano-oscillators that utilize spin transfer devices with point-contact geometry, with an emphasis on the open questions that still prevent our full understanding of device properties. In particula
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http://www.nist.gov/manuscript-publication-search.cfm?pub_id=32791
14.
Effect of resist on the transfer of line-edge roughness spatial metrics from mask to wafer
Topic: Nanofabrication, Nanomanufacturing, and Nanoprocessing
Published: 11/11/2010
Authors: Patrick P Naulleau, Gregg M. Gallatin
Abstract: Mask contributors to line-edge roughness (LER) have recently been shown to be an issue of concern for both the accuracy of current resist evaluation tests as well the ultimate LER requirements for the 22 nm production node. More recently, it has been
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http://www.nist.gov/manuscript-publication-search.cfm?pub_id=905544
15.
Effects of shape distortions and imperfections on mode frequencies and collective linewidths in nanomagnets
Topic: Nanofabrication, Nanomanufacturing, and Nanoprocessing
Published: 3/28/2011
Authors: Hans Toya Nembach, Justin M Shaw, Thomas J Silva, Ward L Johnson, Sudook A Kim, Robert D McMichael, Pavel Kabos
Abstract: We used Brillouin light scattering to show that shape distortions in Ni80Fe20 nanoelements can have a dramatic effect on the measured linewidth of certain modes. By intentionally introducing an amount of “egg-like” shape distortion to an ideal ellip
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http://www.nist.gov/manuscript-publication-search.cfm?pub_id=907044
16.
Engineered Microfluidic and Nanofluidic Device Metrology
Topic: Nanofabrication, Nanomanufacturing, and Nanoprocessing
Published: 3/22/2010
Author: Samuel M Stavis
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=907060
17.
Fabricating Nanostructures Using Optical Forces on Atoms
Topic: Nanofabrication, Nanomanufacturing, and Nanoprocessing
Published: 1/1/1994
Authors: R Gupta, R E. Scholten, Jabez J McClelland, Robert Celotta
Abstract: We have demonstrated the use of the optical dipole force in a standing wave to focus chromium atoms into narrow lines as they deposit onto a silicon substrate. An array of chromium lines has been fabricated, with width of 65 nm and spacing of 213 nm
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http://www.nist.gov/manuscript-publication-search.cfm?pub_id=620440
18.
Fabrication and characterization of silicon-based molecular electronic devices
Topic: Nanofabrication, Nanomanufacturing, and Nanoprocessing
Published: 5/21/2011
Authors: Christina Ann Hacker, Michael A Walsh, Sujitra Jeanie Pookpanratana, Mariona Coll Bau, Curt A Richter
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=908433
19.
Fabrication of silicon-based Molecular Electronic Structures Using Flip Chip Lamination
Topic: Nanofabrication, Nanomanufacturing, and Nanoprocessing
Published: 1/19/2011
Authors: Christina Ann Hacker, Michael A Walsh, Mariona Coll Bau, Curt A Richter
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=908430
20.
Fabrication with Flip-Chip Lamination
Topic: Nanofabrication, Nanomanufacturing, and Nanoprocessing
Published: 11/15/2009
Authors: Mariona Coll Bau, Curt A Richter, Christina Ann Hacker
Abstract: Fabrication with Flip-Chip Lamination , Mariona Coll, DR Hines, CA Richter, CA Hacker, Nanotechnology colloquium, Wake Forest University, 11-09.
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=907071