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Topic Area: Nanofabrication, Nanomanufacturing, and Nanoprocessing

Displaying records 31 to 40 of 101 records.
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31. Methodology for imaging of nano-to-microscale water condensation dynamics on complex nanostructures
Topic: Nanofabrication, Nanomanufacturing, and Nanoprocessing
Published: 6/11/2011
Authors: Konrad Rykaczewski, John Henry j Scott
Abstract: By transferring of a small part of a macroscale sample to a novel thermally insulated sample platform we are able to mitigate flooding and electron heating problems typically associated with Environmental Scanning Electron Microscopy imaging of water ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=908396

32. Fabrication and characterization of silicon-based molecular electronic devices
Topic: Nanofabrication, Nanomanufacturing, and Nanoprocessing
Published: 5/21/2011
Authors: Christina Ann Hacker, Michael A Walsh, Sujitra Jeanie Pookpanratana, Mariona Coll Bau, Curt A Richter
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=908433

33. Flip Chip Lamination to electrically contact organic single crystals on flexible substrates
Topic: Nanofabrication, Nanomanufacturing, and Nanoprocessing
Published: 4/20/2011
Authors: Oana Jurchescu, Brad Conrad, Christina Ann Hacker, David J Gundlach, Curt A Richter
Abstract: The fabrication of top metal contacts for organic electronics represents a challenge and has important consequences for electrical properties of such systems. We report a low cost and non-destructive printing process, Flip Chip Lamination (FCL), to f ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=907524

34. Effects of shape distortions and imperfections on mode frequencies and collective linewidths in nanomagnets
Topic: Nanofabrication, Nanomanufacturing, and Nanoprocessing
Published: 3/28/2011
Authors: Hans T. Nembach, Justin M Shaw, Thomas J Silva, Ward L Johnson, Sudook A Kim, Robert D McMichael, Pavel Kabos
Abstract: We used Brillouin light scattering to show that shape distortions in Ni80Fe20 nanoelements can have a dramatic effect on the measured linewidth of certain modes. By intentionally introducing an amount of ,egg-likeŠ shape distortion to an ideal ellip ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=907044

35. Modeling the transfer of line edge roughness from an EUV mask to the wafer
Topic: Nanofabrication, Nanomanufacturing, and Nanoprocessing
Published: 3/25/2011
Authors: Gregg M. Gallatin, Patrick Naulleau
Abstract: Contributions to line edge roughness (LER) from extreme ultraviolet (EUV) masks have recently been shown to be an issue of concern for both the accuracy of current resist evaluation tests as well the ultimate LER requirements for the 22 nm production ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=908144

36. Nanoelectronics Lithography
Topic: Nanofabrication, Nanomanufacturing, and Nanoprocessing
Published: 3/1/2011
Authors: Stephen Knight, Vivek M Prabhu, John H Burnett, James Alexander Liddle, Christopher L Soles, Alain C. Diebold
Abstract: This is a compiled chapter that will be included into the Handbook of Nanophysics.
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=901888

37. Fabrication of silicon-based Molecular Electronic Structures Using Flip Chip Lamination
Topic: Nanofabrication, Nanomanufacturing, and Nanoprocessing
Published: 1/19/2011
Authors: Christina Ann Hacker, Michael A Walsh, Mariona Coll Bau, Curt A Richter
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=908430

38. Nanofabrication Techniques for Controlled Drug Released Devices
Topic: Nanofabrication, Nanomanufacturing, and Nanoprocessing
Published: 1/1/2011
Authors: Lei Chen, Gerard Henein, Vincent K Luciani
Abstract: New drugs and delivery systems have undergone a rapid development in recent years for treating cancer, HIV aids, diseased organs, damaged nerves to relieve pain, prevent disease and restore health to human beings. The application of nanofabrication i ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=907280

39. Effect of resist on the transfer of line-edge roughness spatial metrics from mask to wafer
Topic: Nanofabrication, Nanomanufacturing, and Nanoprocessing
Published: 11/11/2010
Authors: Patrick P Naulleau, Gregg M. Gallatin
Abstract: Mask contributors to line-edge roughness (LER) have recently been shown to be an issue of concern for both the accuracy of current resist evaluation tests as well the ultimate LER requirements for the 22 nm production node. More recently, it has been ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=905544

40. The Forms and Functions of Complex Nanofluidic Surfaces
Topic: Nanofabrication, Nanomanufacturing, and Nanoprocessing
Published: 9/14/2010
Authors: Samuel M Stavis, Elizabeth A Strychalski, Jon C Geist, Laurie E Locascio, Michael Gaitan
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=907053



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