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Topic Area: Nanofabrication, Nanomanufacturing, and Nanoprocessing

Displaying records 31 to 40 of 98 records.
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31. Effects of shape distortions and imperfections on mode frequencies and collective linewidths in nanomagnets
Topic: Nanofabrication, Nanomanufacturing, and Nanoprocessing
Published: 3/28/2011
Authors: Hans Toya Nembach, Justin M Shaw, Thomas J Silva, Ward L Johnson, Sudook A Kim, Robert D McMichael, Pavel Kabos
Abstract: We used Brillouin light scattering to show that shape distortions in Ni80Fe20 nanoelements can have a dramatic effect on the measured linewidth of certain modes. By intentionally introducing an amount of ,egg-likeŠ shape distortion to an ideal ellip ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=907044

32. Modeling the transfer of line edge roughness from an EUV mask to the wafer
Topic: Nanofabrication, Nanomanufacturing, and Nanoprocessing
Published: 3/25/2011
Authors: Gregg M. Gallatin, Patrick Naulleau
Abstract: Contributions to line edge roughness (LER) from extreme ultraviolet (EUV) masks have recently been shown to be an issue of concern for both the accuracy of current resist evaluation tests as well the ultimate LER requirements for the 22 nm production ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=908144

33. Nanoelectronics Lithography
Topic: Nanofabrication, Nanomanufacturing, and Nanoprocessing
Published: 3/1/2011
Authors: Stephen Knight, Vivek M Prabhu, John H Burnett, James Alexander Liddle, Christopher L Soles, Alain C. Diebold
Abstract: This is a compiled chapter that will be included into the Handbook of Nanophysics.
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=901888

34. Fabrication of silicon-based Molecular Electronic Structures Using Flip Chip Lamination
Topic: Nanofabrication, Nanomanufacturing, and Nanoprocessing
Published: 1/19/2011
Authors: Christina Ann Hacker, Michael A Walsh, Mariona Coll Bau, Curt A Richter
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=908430

35. Nanofabrication Techniques for Controlled Drug Released Devices
Topic: Nanofabrication, Nanomanufacturing, and Nanoprocessing
Published: 1/1/2011
Authors: Lei Chen, Gerard Henein, Vincent K Luciani
Abstract: New drugs and delivery systems have undergone a rapid development in recent years for treating cancer, HIV aids, diseased organs, damaged nerves to relieve pain, prevent disease and restore health to human beings. The application of nanofabrication i ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=907280

36. Effect of resist on the transfer of line-edge roughness spatial metrics from mask to wafer
Topic: Nanofabrication, Nanomanufacturing, and Nanoprocessing
Published: 11/11/2010
Authors: Patrick P Naulleau, Gregg M. Gallatin
Abstract: Mask contributors to line-edge roughness (LER) have recently been shown to be an issue of concern for both the accuracy of current resist evaluation tests as well the ultimate LER requirements for the 22 nm production node. More recently, it has been ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=905544

37. The Forms and Functions of Complex Nanofluidic Surfaces
Topic: Nanofabrication, Nanomanufacturing, and Nanoprocessing
Published: 9/14/2010
Authors: Samuel M Stavis, Elizabeth A Strychalski, Jon C Geist, Laurie E Locascio, Michael Gaitan
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=907053

38. Nanoparticle Separation and Metrology by Three-Dimensional Nanofluidic Size Exclusion
Topic: Nanofabrication, Nanomanufacturing, and Nanoprocessing
Published: 9/13/2010
Authors: Samuel M Stavis, Jon C Geist, Michael Gaitan
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=907080

39. Quantum Dots Precisely Placed by Controlled Flow
Topic: Nanofabrication, Nanomanufacturing, and Nanoprocessing
Published: 8/24/2010
Author: James Alexander Liddle
Abstract: Ropp et al. report on the use of controlled flow to achieve nanometer precision placement of single quantum dots.
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=906621

40. Separation and Metrology of Nanoparticles by Nanofluidic Size Exclusion
Topic: Nanofabrication, Nanomanufacturing, and Nanoprocessing
Published: 8/11/2010
Authors: Samuel M Stavis, Jon C Geist, Michael Gaitan
Abstract: A nanofluidic approach to the separation and metrology of nanoparticles is demonstrated. Advantages of this approach include nanometer-scale resolution, nanometer-scale to submicrometer-scale range, mitigation of hydrodynamic and diffusional limitat ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=904215



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