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Topic Area: Nanofabrication, Nanomanufacturing, and Nanoprocessing

Displaying records 1 to 10 of 93 records.
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1. Block-copolymer healing of simple defects in a chemoepitaxial template
Topic: Nanofabrication, Nanomanufacturing, and Nanoprocessing
Published: 4/11/2013
Authors: Paul Nathan Patrone, Gregg M. Gallatin
Abstract: Using a phase-field model of block copolymers (BCPs), we characterize how a chemoepitaxial template with parallel lines of arbitrary width affects the BCP microdomain shape. The model, which is an extension of the Leibler-Ohta-Kawasaki theory, accoun ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=913545

2. Creating large out-of-plane displacement electrothermal motion stage by incorporating beams with step features
Topic: Nanofabrication, Nanomanufacturing, and Nanoprocessing
Published: 3/26/2013
Authors: Yong Sik Kim, Nicholas G Dagalakis, Satyandra K. Gupta
Abstract: Realizing out-of-plane actuation in micro-electro-mechanical systems (MEMS) is still a challenging task. In this paper, the design, fabrication methods and experimental results for a MEMS-based out-of-plane motion stage is presented based on bulk mic ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=913234

3. Quantum Dot-DNA Origami Binding : A Single Particle, 3D, Real-Time Tracking Study
Topic: Nanofabrication, Nanomanufacturing, and Nanoprocessing
Published: 1/2/2013
Authors: Kan K. Du, Seung-Hyeon Ko, Gregg M. Gallatin, Heayoung Yoon, James Alexander Liddle, Andrew J. Berglund
Abstract: The binding process of quantum dots and DNA origami was monitored using a 3D, real-time, single-particle tracking system. Single-molecule binding events were directly observed and precise measurements of the diffusion coefficient and second-order pho ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=912604

4. Design and Fabrication of a Three-DoF MEMS Stage Based on Nested Structures
Topic: Nanofabrication, Nanomanufacturing, and Nanoprocessing
Published: 8/15/2012
Authors: Yong Sik Kim, Nicholas G Dagalakis, Satyandra K. Gupta
Abstract: This paper presents the design, fabrication and testing of a Micro Electro Mechanical Systems (MEMS) based positioning stage which is capable of generating translational motions along X, Y and Z axes, respectively. For this purpose, two existing 1 De ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=911431

5. Robust Auto-Alignment Technique for Orientation-Dependent Etching of Nanostructures
Topic: Nanofabrication, Nanomanufacturing, and Nanoprocessing
Published: 5/29/2012
Authors: Craig Dyer McGray, Richard J Kasica, Ndubuisi George Orji, Ronald G Dixson, Michael W Cresswell, Richard A Allen, Jon C Geist
Abstract: A robust technique is presented for auto-aligning nanostructures to slow-etching crystallographic planes in materials with diamond cubic structure. Lithographic mask patterns are modified from the intended dimensions of the nanostructures to compen ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=908076

6. Design, fabrication and characterization of a single-layer out-of-plane electrothermal actuator for SOI-MEMS Applications
Topic: Nanofabrication, Nanomanufacturing, and Nanoprocessing
Published: 5/3/2012
Authors: Yong Sik Kim, Nicholas G Dagalakis, Satyandra K. Gupta
Abstract: This paper presents the design, fabrication and characterization of a single-layer out-of-plane electrothermal actuator based on MEMS (Micro-Electro-Mechanical System). The proposed electrothermal actuator is designed to generate motions along the ou ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=910830

7. Patterned Defect & CD Metrology by TSOM Beyond the 22 nm Node
Topic: Nanofabrication, Nanomanufacturing, and Nanoprocessing
Published: 4/10/2012
Authors: Ravikiran Attota, Abraham Arceo, Benjamin Bunday, Victor Vertanian
Abstract: Through-focus scanning optical microscopy (TSOM) is a novel method [1-8] that allows conventional optical microscopes to collect dimensional information down to the nanometer level by combining two-dimensional optical images captured at several throu ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=910910

8. Residual Layer Thickness Control and Metrology in Jet and Flash Imprint Lithography
Topic: Nanofabrication, Nanomanufacturing, and Nanoprocessing
Published: 4/10/2012
Authors: Ravikiran Attota, Shrawan Singhal, Sreenivasan S.V.
Abstract: Jet-and-Flash Imprint Lithography (J-FIL) has demonstrated capability of high-resolution patterning at low costs. For accurate pattern transfer using J-FIL, it is imperative to have control of the residual layer thickness (RLT) of cured resist undern ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=910872

9. On CD-AFM bias related to probe bending
Topic: Nanofabrication, Nanomanufacturing, and Nanoprocessing
Published: 4/9/2012
Authors: Vladimir A Ukraintsev, Ndubuisi George Orji, Theodore Vincent Vorburger, Ronald G Dixson, Joseph Fu, Richard M Silver
Abstract: Critical Dimension AFM (CD-AFM) is a widely used reference metrology. To characterize modern semiconductor devices, very small and flexible probes, often 15 nm to 20 nm in diameter, are now frequently used. Several recent publications have reported ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=910903

10. Modeling the effects of acid amplifiers on photoresist stochastics
Topic: Nanofabrication, Nanomanufacturing, and Nanoprocessing
Published: 3/23/2012
Authors: Gregg M. Gallatin, Patrick Naulleau, Robert Brainard
Abstract: The tradeoff between Resolution, Line Edge Roughness (LER) and Sensitivity, the so called RLS tradeoff, continues to be a difficult challenge, especially for EUV lithography. Acid amplifiers have recently been proposed as a method to improve upon t ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=910777