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You searched on: Topic Area: Nanofabrication, Nanomanufacturing, and Nanoprocessing

Displaying records 1 to 10 of 38 records.
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1. Challenges, Strategies and Opportunities for Measuring Carbon Nanotubes within a Polymer Composites by X-ray Photoelectron Spectroscopy
Series: Special Publication (NIST SP)
Report Number: 1200-10
Topic: Nanofabrication, Nanomanufacturing, and Nanoprocessing
Published: 3/14/2015
Authors: Justin M Gorham, Jeremiah Wallace Woodcock, Keana C K Scott
Abstract: FOREWORD This NIST Special Publication (SP) is one in a series of NIST SPs that address research needs articulated in the National Nanotechnology Initiative (NNI) Environmental, Health, and Safety Research Strategy published in 2011 [1]. This ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=917794

2. Preparation of silver nanoparticle loaded cotton threads to facilitate measurement development for textile applications
Series: Special Publication (NIST SP)
Report Number: 1200-8
Topic: Nanofabrication, Nanomanufacturing, and Nanoprocessing
Published: 1/26/2015
Authors: Justin M Gorham, Karen E Murphy, Jingyu Liu, Dimitri Tselenchuk, Gheorghe Stan, Thao Minh Nguyen, Richard D Holbrook, Michael R Winchester, Robert Francis Cook, Robert MacCuspie, Vincent A Hackley
Abstract: FOREWORD This NIST special publication (SP) is one in a series of NIST SPs that address research needs articulated in the National Nanotechnology Initiative (NNI) Environmental, Health, and Safety Research Strategy published in 2011 [1]. This ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=916567

3. Pattern Transfer of Hydrogen Depassivation Lithography Patterns into Silicon with Atomically Traceable Placement and Size Control
Topic: Nanofabrication, Nanomanufacturing, and Nanoprocessing
Published: 7/17/2014
Authors: Josh Ballard, Stephen McDonnell, Don Dick, Maia Bischof, Joseph Fu, D Jaeger, James Owen , w Owen, Justin Alexander, Udi Fuchs, Pradeep Narayanan Namboodiri, Kai Li, John Randall, Robert Wallace, Yves Chabal, Richard Reidy, Richard M Silver
Abstract: Reducing the scale of etched nanostructures below the 10 nm range eventually will require an atomic scale understanding of the masks being used in order to maintain exquisite control over both feature size and feature density. Here, we demonstrate a ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=915583

4. Optical volumetric inspection of sub-20 nm patterned defects with wafer noise
Topic: Nanofabrication, Nanomanufacturing, and Nanoprocessing
Published: 4/2/2014
Authors: Bryan M Barnes, Francois R. Goasmat, Martin Y Sohn, Hui H. Zhou, Richard M Silver, Andras Vladar, Abraham Arceo
Abstract: We have previously introduced a new data analysis method that more thoroughly utilizes scattered optical intensity data collected during defect inspection using bright-field microscopy. This volumetric approach allows conversion of focus resolved 2-D ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=915807

5. Controlled Formation and Characterization of Dithiothreitol-Conjugated Gold Nanoparticle Clusters
Topic: Nanofabrication, Nanomanufacturing, and Nanoprocessing
Published: 3/5/2014
Authors: De-Hao D. Tsai, Tae Joon Cho, Frank W DelRio, Justin M Gorham, Jiwen Zheng, Jiaojie Tan, Michael Russel Zachariah, Vincent A Hackley
Abstract: We report a systematic study of the controlled formation of discrete-size gold nanoparticle clusters (GNCs) by interaction with the reducing agent dithiothreitol (DTT). Asymmetric-flow field flow fractionation and electrospray differential mobility a ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=915014

6. Strong Casimir force reduction by metallic surface nanostructuring
Topic: Nanofabrication, Nanomanufacturing, and Nanoprocessing
Published: 9/27/2013
Authors: Francesco Intravaia, Stefan T. Koev, Il Woong Jung, Albert A. Talin, Paul S Davids, Ricardo Decca, Vladimir A Aksyuk, Diego A. R. Dalvit, Daniel Lopez
Abstract: The Casimir force is a quantum-mechanical interaction arising from vacuum fluctuations of the electromagnetic (EM) field and is technologically significant in micro- and nanomechanical systems. Despite rapid progress in nanophotonics, the goal of e ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=910133

7. Block-copolymer healing of simple defects in a chemoepitaxial template
Topic: Nanofabrication, Nanomanufacturing, and Nanoprocessing
Published: 4/11/2013
Authors: Paul N. Patrone, Gregg M. Gallatin
Abstract: Using a phase-field model of block copolymers (BCPs), we characterize how a chemoepitaxial template with parallel lines of arbitrary width affects the BCP microdomain shape. The model, which is an extension of the Leibler-Ohta-Kawasaki theory, accoun ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=913545

8. The evaluation of photo/e-beam complementary grayscale lithography for high topography 3D structure
Topic: Nanofabrication, Nanomanufacturing, and Nanoprocessing
Published: 3/29/2013
Authors: Liya Yu, Richard J Kasica, Robert Dennis Newby, Lei Chen, Vincent K Luciani
Abstract: This article demonstrates and evaluates photo/e-beam grayscale complementary lithography processes for the fabrication of large area, high topography grayscale structure. The combination of these two techniques capitalizes on the capability of photol ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=913677

9. Temperature-dependent mechanical-resonance frequencies and damping in ensembles of gallium nitride nanowires
Topic: Nanofabrication, Nanomanufacturing, and Nanoprocessing
Published: 10/22/2012
Authors: Kristine A Bertness, Norman A Sanford, J. R. Montague, H.S. Park, Victor M. Bright, C. T. Rogers
Abstract: We have measured singly clamped cantilever mechanical-resonances in ensembles of as-grown gallium nitridenanowires (GaN NWs), from 12 K to 320 K. Resonance frequencies are approximately linearly dependent on temperature near 300 K ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=910038

10. On CD-AFM bias related to probe bending
Topic: Nanofabrication, Nanomanufacturing, and Nanoprocessing
Published: 4/9/2012
Authors: Vladimir A Ukraintsev, Ndubuisi George Orji, Theodore Vincent Vorburger, Ronald G Dixson, Joseph Fu, Richard M Silver
Abstract: Critical Dimension AFM (CD-AFM) is a widely used reference metrology. To characterize modern semiconductor devices, very small and flexible probes, often 15 nm to 20 nm in diameter, are now frequently used. Several recent publications have reported ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=910903



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