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Topic Area: Characterization, Nanometrology, and Nanoscale Measurements
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Displaying records 31 to 40 of 188 records.
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31. Contour Metrology using Critical Dimension Atomic Force Microscopy
Topic: Characterization, Nanometrology, and Nanoscale Measurements
Published: 4/9/2012
Authors: Ndubuisi George Orji, Ronald G Dixson, Andras Vladar, Bin Ming, Michael T Postek
Abstract: The critical dimension atomic force microscope (CD-AFM), which is used as a reference instrument in lithography metrology, has been proposed as a supplemental instrument for contour measurement and verification. However, although data from CD-AFM is ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=910915

32. Critical dimension metrology by through-focus scanning optical microscopy beyond the 22 nm node
Topic: Characterization, Nanometrology, and Nanoscale Measurements
Published: 6/7/2013
Authors: Ravikiran Attota, Benjamin D. Bunday, Victor Vertanian
Abstract: We present results using simulations and experiments to demonstrate metrological applications of the through-focus scanning optical microscopy (TSOM) down to features at and well below the International Technology Roadmap for Semiconductors' 22  ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=913353

33. Determining Nanoparticle Purity and the Presence of Nanoparticle Surface Coatings through Microscale TGA - Presentation at HiTemp2011
Topic: Characterization, Nanometrology, and Nanoscale Measurements
Published: 3/1/2012
Author: Elisabeth Mansfield
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=910862

34. Development of a conceptual framework for evaluation of nanomaterials release from nanocomposites: environmental and toxicological implications
Topic: Characterization, Nanometrology, and Nanoscale Measurements
Published: 1/2/2014
Authors: Jame Ging, Raul Tejerina-Anton, Girish Ramakrishnan, Mark Nielsen, Kyle Murphy, Justin M Gorham, Tinh Nguyen, Alexander Orlov
Abstract: Despite the fact that nanomaterials are considered potentially hazardous in a freely dispersed form, they are often considered safe when encapsulated into a polymer matrix. However, systematic research to confirm the abovementioned paradigm is lackin ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=914575

35. Development of quantitative electric force microscopy for surface and subsurface characterization of nanostructures in polymeric coatings
Topic: Characterization, Nanometrology, and Nanoscale Measurements
Published: 4/1/2009
Author: Minhua Zhao
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=902060

36. Dielectric Spectroscopy Investigation of Relaxation in C60-Polyisoprene Nanocomposites
Topic: Characterization, Nanometrology, and Nanoscale Measurements
Published: 3/23/2009
Authors: Yifu Ding, Sebastian Pawlus, Alexei Sokolov, Jack F Douglas, Alamgir Karim, Christopher L Soles
Abstract: We investigate the influence of adding C60 nanoparticles on the dielectric relaxation spectra of both unentangled and entangled polyisoprene (PIP). Relaxation modes corresponding to both segmental and chain relaxation were analyzed over a broad tempe ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=900194

37. Differentiation and characterization of isotopically modified silver nanoparticles in aqueous media using asymmetric-flow field flow fractionation coupled to optical detection and mass spectrometry
Topic: Characterization, Nanometrology, and Nanoscale Measurements
Published: 12/10/2012
Authors: Julien C. Gigault, Vincent A Hackley
Abstract: The principal objective of this work was to develop and demonstrate a new methodology for silver nanoparticle (AgNP) detection and characterization based on asymmetric-flow field flow fractionation (A4F) coupled to multiple detectors and using stable ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=912174

38. Dimensional Analysis of Through Silicon Vias Using the TSOM Method
Topic: Characterization, Nanometrology, and Nanoscale Measurements
Published: 7/12/2011
Authors: Ravikiran Attota, Andrew Rudack
Abstract: There is a great need for accurate, truly-3D metrology solutions that can be used for analysis of high aspect ratio features such as through-silicon-vias (TSVs). Through-focus scanning optical microscopy (TSOM) is an optical metrology method that pr ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=909226

39. Direct Measurement of Cantilever Spring Constants and Correction of Cantilever Irregularities Using an Instrumented Indenter
Topic: Characterization, Nanometrology, and Nanoscale Measurements
Published: 1/22/2007
Authors: Z C. Ying, Mark Reitsma, Richard Swift Gates
Abstract: A method is presented that allows direct measurement of a wide range of spring constants of cantilevers using an indentation instrument with an integrated optical microscope. An accuracy of better than 10% can be achieved for spring constants from 0 ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=850970

40. Direct observation of nucleation and early stages of growth of GaN nanowires
Topic: Characterization, Nanometrology, and Nanoscale Measurements
Published: 2/15/2012
Authors: Rosa E. Diaz, Renu Sharma, Karalee Jarvis, Qinglei Zhang, Subhash Mahajan
Abstract: We report for the first time direct observations of the nucleation and early stages of growth of GaN nanowires. The nanowires were formed by exposing Au + Ga droplets to ammonia. The formation process was observed in situ, and controlled in real time ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=906318



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