NIST logo

Publications Portal

You searched on:
Topic Area: Characterization, Nanometrology, and Nanoscale Measurements
Sorted by: title

Displaying records 31 to 40 of 211 records.
Resort by: Date / Title


31. Charge Puddles and Edge Effect in a Graphene Device as Studied by a Scanning Gate Microscope
Topic: Characterization, Nanometrology, and Nanoscale Measurements
Published: 3/1/2011
Authors: Joseph A Stroscio, H.J. Yang, Jungseok Chae, H. Baek, Jeonghoon Ha, Young Kuk, Suyong S. Jung, Young J. Song, Nikolai B Zhitenev, S.J. Woo, Young-Woo Son
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=908985

32. Charge-Based Capacitance Measurements Circuits for Interface With Atomic Force Microscope Probes
Topic: Characterization, Nanometrology, and Nanoscale Measurements
Published: 3/25/2013
Authors: Joseph J Kopanski, Muhammad Yaqub Afridi, Chong Jiang, Michael Lorek, Timothy Kohler, Curt A Richter
Abstract: The charge based capacitance measurement (CBCM) technique is highly sensitive to small capacitances and capable integration of onto an AFM tip, thereby reducing stray and wire capacitance to the bare minimum. The CBCM technique has previous been appl ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=913172

33. Comparison of NIST SI Force Scale to NPL SI Mass Scale
Topic: Characterization, Nanometrology, and Nanoscale Measurements
Published: 10/19/2008
Authors: Christopher W. Jones, John A Kramar, Stuart Davidson, Richard Leach, Jon Robert Pratt
Abstract: Small masses in the 1.0 mg to 0.1 mg range were developed and calibrated at NPL with traceability to the IPK. These masses were transported to NIST at Gaithersburg and used as deadweights on the NIST electrostatic force balance, to facilitate a mass- ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=824727

34. Conduction and Loss Mechanisms in Flexible Oxide-Based Memristors
Topic: Characterization, Nanometrology, and Nanoscale Measurements
Published: 3/21/2011
Authors: Joseph Leo Tedesco, Nadine Gergel-Hackett, Laurie Stephey, Andrew A Herzing, Madelaine Herminia Hernandez, Christina Ann Hacker, Jan Obrzut, Lee J Richter, Curt A Richter
Abstract: In order to study the conduction and loss mechanisms behind their operation, flexible sol-gel based memristors were fabricated with differing oxide film thicknesses and device sizes. XPS, TEM, EELS, and VASE measurements indicated the oxide was amor ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=908435

35. Contact Resistance of Flexible, Transparent Carbon Nanotube Films with Metals
Topic: Characterization, Nanometrology, and Nanoscale Measurements
Published: 10/7/2010
Authors: Hua Xu, Lei Chen, Liangbing Hu, Nikolai B Zhitenev
Abstract: We studied the contact properties of different metals to flexible optically-transparent single-walled carbon nanotube (SWCNTs) films. The SWCNT films are deposited on flexible polyethylene terephthalate (PET) substrate and patterned in test structure ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=905854

36. Contour Metrology using Critical Dimension Atomic Force Microscopy
Topic: Characterization, Nanometrology, and Nanoscale Measurements
Published: 4/9/2012
Authors: Ndubuisi George Orji, Ronald G Dixson, Andras Vladar, Bin Ming, Michael T Postek
Abstract: The critical dimension atomic force microscope (CD-AFM), which is used as a reference instrument in lithography metrology, has been proposed as a supplemental instrument for contour measurement and verification. However, although data from CD-AFM is ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=910915

37. Controlled Formation and Characterization of Dithiothreitol-Conjugated Gold Nanoparticle Clusters
Topic: Characterization, Nanometrology, and Nanoscale Measurements
Published: 3/5/2014
Authors: De-Hao D. Tsai, Tae Joon Cho, Frank W DelRio, Justin M Gorham, Jiwen Zheng, Jiaojie Tan, Michael Russel Zachariah, Vincent A Hackley
Abstract: We report a systematic study of the controlled formation of discrete-size gold nanoparticle clusters (GNCs) by interaction with the reducing agent dithiothreitol (DTT). Asymmetric-flow field flow fractionation and electrospray differential mobility a ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=915014

38. Critical dimension metrology by through-focus scanning optical microscopy beyond the 22 nm node
Topic: Characterization, Nanometrology, and Nanoscale Measurements
Published: 6/7/2013
Authors: Ravikiran Attota, Benjamin D. Bunday, Victor Vertanian
Abstract: We present results using simulations and experiments to demonstrate metrological applications of the through-focus scanning optical microscopy (TSOM) down to features at and well below the International Technology Roadmap for Semiconductors' 22  ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=913353

39. Determination of nanoparticle surface coatings and nanoparticle Purity using microscale thermogravimetric analysis analysis
Topic: Characterization, Nanometrology, and Nanoscale Measurements
Published: 1/8/2014
Authors: Elisabeth Mansfield, Christopher Michael Poling, Jenifer L. (Jenifer) Blacklock, Katherine M Tyner
Abstract: The use of nanoparticles in some applications (i.e., nanomedical, nanofiltration or nanoelectronic) requires small-scale samples with well-known purities and composition. In addition, when nanoparticles are introduced into complex environments ( ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=914528

40. Determining Nanoparticle Purity and the Presence of Nanoparticle Surface Coatings through Microscale TGA - Presentation at HiTemp2011
Topic: Characterization, Nanometrology, and Nanoscale Measurements
Published: 3/1/2012
Author: Elisabeth Mansfield
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=910862



Search NIST-wide:


(Search abstract and keywords)


Last Name:
First Name:







Special Publications:

Looking for a NIST Special Publication (NIST SP Series)? Place the series number and dash in the report number field (Example: 800-) and begin your search.

  • SP 250-XX: Calibration Services
  • SP 260-XX: Standard Reference Materials
  • SP 300-XX: Precision Measurement and Calibration
  • SP 400-XX: Semiconductor Measurement Technology
  • SP 480-XX: Law Enforcement Technology
  • SP 500-XX: Computer Systems Technology
  • SP 700-XX: Industrial Measurement Series
  • SP 800-XX: Computer Security Series
  • SP 823-XX: Integrated Services Digital Network Series