NIST logo

Publications Portal

You searched on:
Topic Area: Characterization, Nanometrology, and Nanoscale Measurements
Sorted by: title

Displaying records 181 to 190 of 203 records.
Resort by: Date / Title


181. Switching in Flexible Titanium Oxide Memristors
Topic: Characterization, Nanometrology, and Nanoscale Measurements
Published: 6/25/2010
Authors: Joseph Leo Tedesco, Nadine Emily Gergel-Hackett, Laurie A. Stephey, Christina Ann Hacker, Curt A Richter
Abstract: In this study, memristors were fabricated on flexible polyethylene terephthalate (PET) substrates with aluminum contacts and a titanium dioxide film formed with a sol-gel of titanium isopropoxide and ethanol. To study the electric field dependence of ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=906392

182. TSOM Method for Nanoelectronics Dimensional Metrology
Topic: Characterization, Nanometrology, and Nanoscale Measurements
Published: 11/18/2011
Author: Ravikiran (Ravikiran) Attota
Abstract: Through-focus scanning optical microscopy (TSOM) is a relatively new method that transforms conventional optical microscopes into truly three-dimensional metrology tools for nanoscale to microscale dimensional analysis. TSOM achieves this by acquirin ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=908623

183. TSOM Method for Semiconductor Metrology
Topic: Characterization, Nanometrology, and Nanoscale Measurements
Published: 4/18/2011
Authors: Ravikiran (Ravikiran) Attota, Ronald G Dixson, John A Kramar, James Edward Potzick, Andras Vladar, Benjamin D. Bunday, Erik Novak, Andrew C. Rudack
Abstract: Through-focus scanning optical microscopy (TSOM) is a new metrology method that achieves 3D nanoscale measurement resolution using conventional optical microscopes; measurement sensitivities are comparable to what is typical using Scatterometry, SEM ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=908177

184. TSV Reveal height and bump dimension metrology by the TSOM method
Topic: Characterization, Nanometrology, and Nanoscale Measurements
Published: 4/30/2013
Authors: Ravikiran (Ravikiran) Attota, Haesung Park, Victor Vartanian, Ndubuisi George Orji, Richard A Allen
Abstract: Through-focus scanning optical microscopy (TSOM) transforms conventional optical microscopes into truly 3D metrology tools for nanoscale- to- microscale dimensional analysis with nanometer-scale sensitivity. Although not a resolution enhancement meth ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=913667

185. Temperature-Programmed Electrospray-Differential Mobility Analysis for Characterization of Ligated Nanoparticles in Complex Media
Topic: Characterization, Nanometrology, and Nanoscale Measurements
Published: 8/12/2013
Authors: De-Hao D. Tsai, Frank W DelRio, John M Pettibone, Pin Ann Lin, Jiaojie Tan, Michael Russel Zachariah, Vincent A Hackley
Abstract: In this study, an electrospray-differential mobility analyzer (ES-DMA) was operated with an aerosol flow-mode, temperature-programmed approach to enhance its ability to characterize the particle size distributions (PSDs) of nanoscale particles (NPs) ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=913860

186. Temperature-dependent mechanical-resonance frequencies and damping in ensembles of gallium nitride nanowires
Topic: Characterization, Nanometrology, and Nanoscale Measurements
Published: 10/22/2012
Authors: Kristine A Bertness, Norman A Sanford, J. R. Montague, H.S. Park, Victor M. Bright, C. T. Rogers
Abstract: We have measured singly clamped cantilever mechanical-resonances in ensembles of as-grown gallium nitridenanowires (GaN NWs), from 12 K to 320 K. Resonance frequencies are approximately linearly dependent on temperature near 300 K ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=910038

187. The Limits and Extensibility of Optical Patterned Defect Inspection
Topic: Characterization, Nanometrology, and Nanoscale Measurements
Published: 4/1/2010
Authors: Richard M Silver, Bryan M Barnes, Martin Y Sohn, Richard Quintanilha, Hui Zhou, Chris Deeb, Mark Johnson, Milton Goodwin, Dilip Patel
Abstract: New techniques recently developed at the National Institute of Standards and Technology using bright field optical tools are applied to signal-based defect analysis of features with dimensions well below the measurement wavelength. A key to this app ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=905318

188. The Stability and Surface Coverage of Polymer Stabilized Gold Nanoparticles
Topic: Characterization, Nanometrology, and Nanoscale Measurements
Published: 10/2/2010
Authors: Karl B Sebby, Elisabeth Mansfield
Abstract: NA
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=906334

189. Thermoelectric imaging of structural disorder in epitaxial graphene
Topic: Characterization, Nanometrology, and Nanoscale Measurements
Published: 7/14/2013
Authors: Sanghee Cho, Stephen Dongmin Kang, Wondong Kim, Eui-Sup Lee, Sung-Jae Woo, Ki-Jeong Kong, Ilyou Kim, Hyeong-Do Kim, Tong Zhang, Joseph A Stroscio, Yong-Hyun Kim, Ho-Ki Lyeo
Abstract: Many structural defects and strain fields develop during the preparation of thin films and nanostructures, with their origins being at the atomic level1,2. Sensitively detecting these subtle features with high sensitivity and resolution, and their in ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=912752

190. Thermogravimetric analysis of NIST's single-wall carbon nanotube reference material
Topic: Characterization, Nanometrology, and Nanoscale Measurements
Published: 1/25/2011
Authors: Elisabeth Mansfield, Stephanie A Hooker
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=907746



Search NIST-wide:


(Search abstract and keywords)


Last Name:
First Name:







Special Publications:

Looking for a NIST Special Publication (NIST SP Series)? Place the series number and dash in the report number field (Example: 800-) and begin your search.

  • SP 250-XX: Calibration Services
  • SP 260-XX: Standard Reference Materials
  • SP 300-XX: Precision Measurement and Calibration
  • SP 400-XX: Semiconductor Measurement Technology
  • SP 480-XX: Law Enforcement Technology
  • SP 500-XX: Computer Systems Technology
  • SP 700-XX: Industrial Measurement Series
  • SP 800-XX: Computer Security Series
  • SP 823-XX: Integrated Services Digital Network Series