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You searched on: Topic Area: Characterization, Nanometrology, and Nanoscale Measurements Sorted by: title

Displaying records 141 to 150 of 158 records.
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141. TSOM Method for Semiconductor Metrology
Topic: Characterization, Nanometrology, and Nanoscale Measurements
Published: 4/18/2011
Authors: Ravikiran Attota, Ronald G Dixson, John A Kramar, James Edward Potzick, Andras Vladar, Benjamin D. Bunday, Erik Novak, Andrew C. Rudack
Abstract: Through-focus scanning optical microscopy (TSOM) is a new metrology method that achieves 3D nanoscale measurement resolution using conventional optical microscopes; measurement sensitivities are comparable to what is typical using Scatterometry, SEM ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=908177

142. TSV REVEAL HEIGHT AND BUMP DIMENSION METROLOGY BY THE TSOM METHOD: FROM NANOMETER TO MICROMETER SCALE
Topic: Characterization, Nanometrology, and Nanoscale Measurements
Published: 1/23/2013
Authors: Ravikiran Attota, Victor Vertanian, Steve Olson, Robert Edgeworth, Iqbal Ali, Craig Huffman, Pate Moschak, Harry Lazier, Elizabeth Lorenzini
Abstract: The exceptional z-height resolution of TSOM, as well as very fast measurement time, is particularly important for high volume manufacturing. These two attributes make TSOM advantageous for 3D-stacked IC measurements of TSV reveal structures, and C4 ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=912923

143. TSV Reveal height and bump dimension metrology by the TSOM method
Topic: Characterization, Nanometrology, and Nanoscale Measurements
Published: 4/30/2013
Authors: Ravikiran Attota, Haesung Park, Victor H Vartanian, Ndubuisi George Orji, Richard A Allen
Abstract: Through-focus scanning optical microscopy (TSOM) transforms conventional optical microscopes into truly 3D metrology tools for nanoscale- to- microscale dimensional analysis with nanometer-scale sensitivity. Although not a resolution enhancement meth ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=913667

144. Temperature-Programmed Electrospray-Differential Mobility Analysis for Characterization of Ligated Nanoparticles in Complex Media
Topic: Characterization, Nanometrology, and Nanoscale Measurements
Published: 8/12/2013
Authors: De-Hao D. Tsai, Frank W DelRio, John M Pettibone, Pin Ann Lin, Jiaojie Tan, Michael Russel Zachariah, Vincent A Hackley
Abstract: In this study, an electrospray-differential mobility analyzer (ES-DMA) was operated with an aerosol flow-mode, temperature-programmed approach to enhance its ability to characterize the particle size distributions (PSDs) of nanoscale particles (NPs) ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=913860

145. Temperature-dependent mechanical-resonance frequencies and damping in ensembles of gallium nitride nanowires
Topic: Characterization, Nanometrology, and Nanoscale Measurements
Published: 10/22/2012
Authors: Kristine A Bertness, Norman A Sanford, J. R. Montague, H.S. Park, Victor M. Bright, C. T. Rogers
Abstract: We have measured singly clamped cantilever mechanical-resonances in ensembles of as-grown gallium nitridenanowires (GaN NWs), from 12 K to 320 K. Resonance frequencies are approximately linearly dependent on temperature near 300 K ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=910038

146. The effect of systematic errors on the hybridization of optical critical dimension measurements
Topic: Characterization, Nanometrology, and Nanoscale Measurements
Published: 6/21/2015
Authors: Mark Alexander Henn, Richard M Silver, Nien F Zhang, Hui Zhou, Bryan M Barnes
Abstract: In hybrid metrology two or more measurements of the same measurand are combined to provide a more reliable result that ideally incorporates the individual strengths of each of the measurement methods. While these multiple measurements may come from d ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=918395

147. Three dimensional aspects of droplet coalescence during dropwise condensation on superhydrophobic surfaces
Topic: Characterization, Nanometrology, and Nanoscale Measurements
Published: 8/24/2011
Authors: Konrad Rykaczewski, John Henry j Scott, Sukumar Rajauria, W Robert Ashurst, Jeff Chinn, Amy Chinn, Wanda Jones
Abstract: We report formation of nano-to-microscale satellite droplets in the geometrical shadow of high contact angle primary drops during dropwise water condensation on a nanostructured superhydrophobic surface. The primary drops contribute to the heat tran ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=908846

148. Three-dimensional Nanometrology with TSOM Optical Method
Topic: Characterization, Nanometrology, and Nanoscale Measurements
Published: 12/10/2011
Author: Ravikiran Attota
Abstract: Through-focus scanning optical microscopy (TSOM) is a new metrology method that achieves 3D nanoscale measurement sensitivity using conventional optical microscopes; measurement sensitivities are comparable to what is typical when using scatterometry ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=910045

149. Through-focus Scanning and Scatterfield Optical Methods for Advanced Overlay Target Analysis
Topic: Characterization, Nanometrology, and Nanoscale Measurements
Published: 9/1/2008
Authors: Ravikiran Attota, Michael T. Stocker, Richard M Silver, Nathanael A Heckert, Hui Zhou, Richard J Kasica, Lei Chen, Ronald G Dixson, Ndubuisi George Orji, Bryan M Barnes, Peter Lipscomb
Abstract: In this paper we present overlay measurement techniques that use small overlay targets for advanced semiconductor applications. We employ two different optical methods to measure overlay using modified conventional optical microscope platforms. They ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=902294

150. Transmission Electron Diffraction from nanoparticles, nanowires and thin films in an SEM using conventional EBSD equipment
Topic: Characterization, Nanometrology, and Nanoscale Measurements
Published: 1/1/2010
Authors: Roy H. Geiss, Robert R Keller, David Thomas Read
Abstract: We describe a new scanning electron microscope (SEM) method for obtaining and analyzing the crystallographic structure and orientation in nanoparticles and ultrathin films using conventional electron backscatter diffraction (EBSD) equipment.
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=905080



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