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You searched on: Topic Area: Characterization, Nanometrology, and Nanoscale Measurements Sorted by: title

Displaying records 141 to 150 of 162 records.
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141. Subsurface Characterization of Carbon Nanotubes in Polymer Composites via Quantitative Electric Force Microscopy
Topic: Characterization, Nanometrology, and Nanoscale Measurements
Published: 2/3/2010
Authors: Minhua Zhao, Xiaohong Gu, Sharon E. Lowther, Cheol Park, Jerry Jean, Tinh Nguyen
Abstract: In this study, quantitative Electric Force Microscopy (EFM) characterization of CNTs dispersed in free-standing polymer composite films is pursued. The effect of experimental parameters including humidity conditions, EFM probe geometry, tip-sample ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=904262

142. Subsurface Imaging of Ungrounded Metal Lines Embedded in Dielectric with the Scanning Microwave Microscope
Topic: Characterization, Nanometrology, and Nanoscale Measurements
Published: 12/17/2015
Authors: Lin You, Jungjoon Ahn, Yaw S Obeng, Joseph J Kopanski
Abstract: We demonstrate the ability of the scanning microwave microscope (SMM) to measure the subsurface location of ungrounded. 1.2-μm wide metal lines embedded in a dielectric film. The SMM was used to image Al-Si-Cu metal lines in a test chip that ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=916157

143. Surface Chemical Transformations of UV irradiated Silica-Epoxy Nanocomposites
Topic: Characterization, Nanometrology, and Nanoscale Measurements
Published: 5/15/2013
Authors: Justin M Gorham, Tinh Nguyen, Deborah L Stanley, Coralie Bernard, Richard D Holbrook
Abstract: Silica nanoparticles (SiNPs) incorporated into a polymeric matrix, or silica nanocomposites (SiNCs), are used in a wide variety of commercially available products in numerous natural and artificial environments. Environmental factors, such as light, ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=913534

144. TSOM Method for Nanoelectronics Dimensional Metrology
Topic: Characterization, Nanometrology, and Nanoscale Measurements
Published: 11/18/2011
Author: Ravikiran Attota
Abstract: Through-focus scanning optical microscopy (TSOM) is a relatively new method that transforms conventional optical microscopes into truly three-dimensional metrology tools for nanoscale to microscale dimensional analysis. TSOM achieves this by acquirin ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=908623

145. TSOM Method for Semiconductor Metrology
Topic: Characterization, Nanometrology, and Nanoscale Measurements
Published: 4/18/2011
Authors: Ravikiran Attota, Ronald G Dixson, John A Kramar, James Edward Potzick, Andras Vladar, Benjamin D. Bunday, Erik Novak, Andrew C. Rudack
Abstract: Through-focus scanning optical microscopy (TSOM) is a new metrology method that achieves 3D nanoscale measurement resolution using conventional optical microscopes; measurement sensitivities are comparable to what is typical using Scatterometry, SEM ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=908177

146. TSV REVEAL HEIGHT AND BUMP DIMENSION METROLOGY BY THE TSOM METHOD: FROM NANOMETER TO MICROMETER SCALE
Topic: Characterization, Nanometrology, and Nanoscale Measurements
Published: 1/23/2013
Authors: Ravikiran Attota, Victor Vertanian, Steve Olson, Robert Edgeworth, Iqbal Ali, Craig Huffman, Pate Moschak, Harry Lazier, Elizabeth Lorenzini
Abstract: The exceptional z-height resolution of TSOM, as well as very fast measurement time, is particularly important for high volume manufacturing. These two attributes make TSOM advantageous for 3D-stacked IC measurements of TSV reveal structures, and C4 ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=912923

147. TSV Reveal height and bump dimension metrology by the TSOM method
Topic: Characterization, Nanometrology, and Nanoscale Measurements
Published: 4/30/2013
Authors: Ravikiran Attota, Haesung Park, Victor H Vartanian, Ndubuisi George Orji, Richard A Allen
Abstract: Through-focus scanning optical microscopy (TSOM) transforms conventional optical microscopes into truly 3D metrology tools for nanoscale- to- microscale dimensional analysis with nanometer-scale sensitivity. Although not a resolution enhancement meth ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=913667

148. Temperature-Programmed Electrospray-Differential Mobility Analysis for Characterization of Ligated Nanoparticles in Complex Media
Topic: Characterization, Nanometrology, and Nanoscale Measurements
Published: 8/12/2013
Authors: De-Hao D. Tsai, Frank W DelRio, John M Pettibone, Pin Ann Lin, Jiaojie Tan, Michael Russel Zachariah, Vincent A Hackley
Abstract: In this study, an electrospray-differential mobility analyzer (ES-DMA) was operated with an aerosol flow-mode, temperature-programmed approach to enhance its ability to characterize the particle size distributions (PSDs) of nanoscale particles (NPs) ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=913860

149. Temperature-dependent mechanical-resonance frequencies and damping in ensembles of gallium nitride nanowires
Topic: Characterization, Nanometrology, and Nanoscale Measurements
Published: 10/22/2012
Authors: Kristine A Bertness, Norman A Sanford, J. R. Montague, H.S. Park, Victor M. Bright, C. T. Rogers
Abstract: We have measured singly clamped cantilever mechanical-resonances in ensembles of as-grown gallium nitridenanowires (GaN NWs), from 12 K to 320 K. Resonance frequencies are approximately linearly dependent on temperature near 300 K ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=910038

150. The effect of systematic errors on the hybridization of optical critical dimension measurements
Topic: Characterization, Nanometrology, and Nanoscale Measurements
Published: 6/21/2015
Authors: Mark Alexander Henn, Richard M Silver, Nien F Zhang, Hui Zhou, Bryan M Barnes
Abstract: In hybrid metrology two or more measurements of the same measurand are combined to provide a more reliable result that ideally incorporates the individual strengths of each of the measurement methods. While these multiple measurements may come from d ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=918395



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