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You searched on: Topic Area: Characterization, Nanometrology, and Nanoscale Measurements Sorted by: title

Displaying records 111 to 120 of 163 records.
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111. Quantitative Viscoelastic Mapping of Polyolefin Blends with Contact Resonance Atomic Force Microscopy
Topic: Characterization, Nanometrology, and Nanoscale Measurements
Published: 5/9/2012
Authors: Dalia Yablon, Anil Gannepalli, Roger Proksch, Jason Philip Killgore, Donna C. Hurley, Andy Tsou
Abstract: The storage modulus (E') and loss modulus (E") of polyolefin blends have been mapped on the nanoscale with contact resonance force microscopy (CR-FM), a dynamic contact mode of atomic force microscopy (AFM). CR-FM maps for a blend of polyethylene, po ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=909881

112. Quantitative tool characterization of a 193 nm scatterfield microscope
Topic: Characterization, Nanometrology, and Nanoscale Measurements
Published: 9/9/2015
Authors: Martin Y Sohn, Bryan M Barnes, Hui Zhou, Richard M Silver
Abstract: Optical microscope tool characterization has been investigated for the quantitative measurements of deep sub-wavelength features using a Fourier plane normalization method. The NIST 193 nm scatterfield microscope operating with an ArF Excimer laser, ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=919267

113. Radiative damping in wave guide based FMR measured via analysis of perpendicular standing spin waves in sputtered Permalloy films
Topic: Characterization, Nanometrology, and Nanoscale Measurements
Published: 11/17/2015
Authors: Thomas J Silva, Justin M Shaw, Hans Toya Nembach, Mathias Weiler, Martin Schoen
Abstract: The damping α of the spinwave resonances in 75 nm, 120 nm, and 200 nm -thick Permalloy films is measured via vector-network- analyzer ferromagnetic-resonance (VNA-FMR). Inductive coupling between the sample and the waveguide leads to an addi ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=919208

114. Radio-microanalytical particle measurements method and application to Fukushima aerosols collected in Japan
Topic: Characterization, Nanometrology, and Nanoscale Measurements
Published: 8/26/2012
Authors: Cynthia J Zeissler, Lawrence Forsley, Richard Mark Lindstrom, Sean Newsome, Adrean Kirk, P.A. Mosier-Boss
Abstract: A nondestructive analytical method based on autoradiography and gamma spectrometry was developed to perform activity distribution analysis for particulate samples. This was applied to aerosols collected in Fukushima Japan, 40 km north of the Daiich ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=911065

115. Raman spectroscopy based measurements of carrier concentration in n-type GaN nanowires grown by plasma-assisted molecular beam epitaxy
Topic: Characterization, Nanometrology, and Nanoscale Measurements
Published: Date unknown
Authors: Lawrence H Robins, Elizabeth Horneber, Norman A Sanford, Kristine A Bertness, John B. Schlager
Abstract: The carrier concentration in ensembles of n-type GaN nanowires (NWs) grown by plasma-assisted molecular beam epitaxy was determined by curve-fitting analysis of Raman spectra, based on modeling of the carrier concentration dependence of the longitudi ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=915090

116. Reliability of Low Temperature Grown Multi-Wall Carbon Nanotube Bundles Integrated as Vias in Monolithic Three-Dimensional Integrated Circuits
Topic: Characterization, Nanometrology, and Nanoscale Measurements
Published: 8/26/2014
Authors: Ann Chiaramonti Chiaramonti Debay, Sten Vollebregt, Aric Warner Sanders, Alexandra E Curtin, R. Ishihara, David Thomas Read
Abstract: In this extended abstract we present our recent results on the reliability testing of multi-wall carbon nanotube vertical interconnects (vias).
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=915382

117. Report on an Interlaboratory Study for the Measurement of BET-Specific Surface Area using an Industrially Relevant TiO2 Nanopowder
Topic: Characterization, Nanometrology, and Nanoscale Measurements
Published: 8/3/2011
Author: Vincent A Hackley
Abstract: This report summarizes the findings of an interlaboratory study (ILS) conducted in 2009-2010 under the auspices of the Versailles Project on Advanced Materials and Standards (VAMAS) Technical Working Area (TWA) 34 (Nanoparticle Populations). The stat ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=908638

118. Report on the first international comparison of small force facilities: A pilot study at the micronewton level
Topic: Characterization, Nanometrology, and Nanoscale Measurements
Published: 11/28/2011
Authors: Jon Robert Pratt, Min-Seok Kim, Uwe Brand, Christopher Jones
Abstract: Measurements of forces less than a micronewton are critical when examining the mechanical behaviors of materials and devices at characteristic length scales below a micrometer. As a result, standards for nanomechanical tests and test equipment are be ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=908606

119. Reporting Guidelines for the Preparation of Aqueous Nanoparticle Dispersions from Dry Materials
Series: Special Publication (NIST SP)
Report Number: 1200-1
Topic: Characterization, Nanometrology, and Nanoscale Measurements
Published: 6/19/2012
Authors: Julian S. Taurozzi, Vincent A Hackley, Mark R Wiesner
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=910681

120. Residual Layer Thickness Control and Metrology in Jet and Flash Imprint Lithography
Topic: Characterization, Nanometrology, and Nanoscale Measurements
Published: 4/10/2012
Authors: Ravikiran Attota, Shrawan Singhal, Sreenivasan S.V.
Abstract: Jet-and-Flash Imprint Lithography (J-FIL) has demonstrated capability of high-resolution patterning at low costs. For accurate pattern transfer using J-FIL, it is imperative to have control of the residual layer thickness (RLT) of cured resist undern ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=910872



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