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You searched on: Topic Area: Characterization, Nanometrology, and Nanoscale Measurements Sorted by: title

Displaying records 91 to 100 of 132 records.
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91. Reliability of Low Temperature Grown Multi-Wall Carbon Nanotube Bundles Integrated as Vias in Monolithic Three-Dimensional Integrated Circuits
Topic: Characterization, Nanometrology, and Nanoscale Measurements
Published: 8/26/2014
Authors: Ann Chiaramonti Chiaramonti Debay, Sten Vollebregt, Aric Warner Sanders, Alexandra E Curtin, R. Ishihara, David Thomas Read
Abstract: In this extended abstract we present our recent results on the reliability testing of multi-wall carbon nanotube vertical interconnects (vias).
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=915382

92. Report on an Interlaboratory Study for the Measurement of BET-Specific Surface Area using an Industrially Relevant TiO2 Nanopowder
Topic: Characterization, Nanometrology, and Nanoscale Measurements
Published: 8/3/2011
Author: Vincent A Hackley
Abstract: This report summarizes the findings of an interlaboratory study (ILS) conducted in 2009-2010 under the auspices of the Versailles Project on Advanced Materials and Standards (VAMAS) Technical Working Area (TWA) 34 (Nanoparticle Populations). The stat ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=908638

93. Report on the first international comparison of small force facilities: A pilot study at the micronewton level
Topic: Characterization, Nanometrology, and Nanoscale Measurements
Published: 11/28/2011
Authors: Jon Robert Pratt, Min-Seok Kim, Uwe Brand, Christopher Jones
Abstract: Measurements of forces less than a micronewton are critical when examining the mechanical behaviors of materials and devices at characteristic length scales below a micrometer. As a result, standards for nanomechanical tests and test equipment are be ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=908606

94. Reporting Guidelines for the Preparation of Aqueous Nanoparticle Dispersions from Dry Materials
Series: Special Publication (NIST SP)
Report Number: 1200-1
Topic: Characterization, Nanometrology, and Nanoscale Measurements
Published: 6/19/2012
Authors: Julian S. Taurozzi, Vincent A Hackley, Mark R Wiesner
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=910681

95. Residual Layer Thickness Control and Metrology in Jet and Flash Imprint Lithography
Topic: Characterization, Nanometrology, and Nanoscale Measurements
Published: 4/10/2012
Authors: Ravikiran Attota, Shrawan Singhal, Sreenivasan S.V.
Abstract: Jet-and-Flash Imprint Lithography (J-FIL) has demonstrated capability of high-resolution patterning at low costs. For accurate pattern transfer using J-FIL, it is imperative to have control of the residual layer thickness (RLT) of cured resist undern ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=910872

96. Resolving three-dimensional shape of sub-50 nm wide lines with nanometer-scale sensitivity using conventional optical microscopes
Topic: Characterization, Nanometrology, and Nanoscale Measurements
Published: 7/29/2014
Authors: Ravikiran Attota, Ronald G Dixson
Abstract: We experimentally demonstrate that the three-dimensional (3-D) shape variations of nanometer-scale objects can be resolved and measured with sub-nanometer scale sensitivity using conventional optical microscopes by analyzing 3-D optical data using th ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=908543

97. Robust Elemental Mapping of Nanostructures at Ultrahigh Resolution using Event-Streamed Spectrum Imaging in an Aberration-Corrected Analytical Electron Microscope
Topic: Characterization, Nanometrology, and Nanoscale Measurements
Published: 4/1/2013
Authors: Andrew A Herzing, Ian M. Anderson
Abstract: We detail the application of X-ray energy dispersive spectroscopy (XEDS) event-streamed spectral imaging (ESSI) in an aberration-corrected analytical electron microscope (AEM) as a reliable method for the acquisition of ultra-high spatial resolution ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=910229

98. Scatterfield Microscopy of 22 nm Node Patterned Defects using Visible and DUV Light
Topic: Characterization, Nanometrology, and Nanoscale Measurements
Published: 4/4/2012
Authors: Bryan M Barnes, Martin Y Sohn, Francois R. Goasmat, Hui Zhou, Richard M Silver, Abraham Arceo
Abstract: Smaller patterning dimensions and novel architectures are fostering research into improved methods of defect detection in semiconductor device manufacturing. This initial experimental study, augmented with simulation, evaluates scatterfield microscop ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=910963

99. Scatterometry for in situ measurement of pattern reflow in nanoimprinted polymers
Topic: Characterization, Nanometrology, and Nanoscale Measurements
Published: 12/9/2008
Authors: Heather J Patrick, Thomas Avery Germer, Yifu Ding, Hyun Wook Ro, Lee J Richter, Christopher L Soles
Abstract: We use optical scatterometry to extract the time evolution of the profile of nanoimprinted lines in low and high molecular mass polymer gratings during reflow at the glass transition temperature. The data are obtained continuously during the anneal ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=900878

100. Self-Assembled Monolayers Impact Cobalt Interfacial Structure in Nanoelectronic Junctions
Topic: Characterization, Nanometrology, and Nanoscale Measurements
Published: 3/5/2015
Authors: Sujitra Jeanie Pookpanratana, Leigh Lydecker, Curt A Richter, Christina Ann Hacker
Abstract: The formation of molecular monolayers on template-stripped cobalt surfaces is reported. The quality of the alkane-based molecular structure was confirmed through spectroscopic measurements. We find that the self-assembly of bifunctional molecules has ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=914804



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