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You searched on: Topic Area: Characterization, Nanometrology, and Nanoscale Measurements Sorted by: date

Displaying records 91 to 100 of 154 records.
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91. Direct observation of nucleation and early stages of growth of GaN nanowires
Topic: Characterization, Nanometrology, and Nanoscale Measurements
Published: 2/15/2012
Authors: Rosa E. Diaz, Renu Sharma, Karalee Jarvis, Qinglei Zhang, Subhash Mahajan
Abstract: We report for the first time direct observations of the nucleation and early stages of growth of GaN nanowires. The nanowires were formed by exposing Au + Ga droplets to ammonia. The formation process was observed in situ, and controlled in real time ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=906318

92. CEINT/NIST PROTOCOL for the PREPARATION OF NANOSCALE TiO2 DISPERSIONS IN AN ENVIRONMENTAL MATRIX FOR ECO-TOXICOLOGICAL ASSESSMENT
Topic: Characterization, Nanometrology, and Nanoscale Measurements
Published: 2/2/2012
Authors: Julian S. Taurozzi, Vincent A Hackley, Mark R Wiesner
Abstract: Toxicity and fate assessment are key elements in the evaluation of the environmental, health and safety risks of engineered nanomaterials (ENMs). While significant effort and resources have been devoted to the toxicological evaluation of many ENMs, i ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=910395

93. Nanometrology Using Through-Focus Scanning Optical Microscopy Method
Topic: Characterization, Nanometrology, and Nanoscale Measurements
Published: 12/21/2011
Authors: Ravikiran Attota, Richard M Silver
Abstract: We present an initial review of a novel through-focus scanning optical microscopy (TSOM) imaging method that produces nanometer dimensional measurement sensitivity using a conventional bright-field optical microscope. In the TSOM method a target is ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=905395

94. Three-dimensional Nanometrology with TSOM Optical Method
Topic: Characterization, Nanometrology, and Nanoscale Measurements
Published: 12/10/2011
Author: Ravikiran Attota
Abstract: Through-focus scanning optical microscopy (TSOM) is a new metrology method that achieves 3D nanoscale measurement sensitivity using conventional optical microscopes; measurement sensitivities are comparable to what is typical when using scatterometry ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=910045

95. Characterization and Resistive Switching Properties of Solution-Processed HfO2, HfSiO4, and ZrSiO4 Thin Films on Rigid and Flexible Substrates
Topic: Characterization, Nanometrology, and Nanoscale Measurements
Published: 12/7/2011
Authors: Joseph Leo Tedesco, Walter Zheng, Oleg A Kirillov, Sujitra Jeanie Pookpanratana, Hyuk-Jae Jang, Premsagar Purushotham Kavuri, Nhan V Nguyen, Curt A Richter
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=910358

96. Report on the first international comparison of small force facilities: A pilot study at the micronewton level
Topic: Characterization, Nanometrology, and Nanoscale Measurements
Published: 11/28/2011
Authors: Jon Robert Pratt, Min-Seok Kim, Uwe Brand, Christopher Jones
Abstract: Measurements of forces less than a micronewton are critical when examining the mechanical behaviors of materials and devices at characteristic length scales below a micrometer. As a result, standards for nanomechanical tests and test equipment are be ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=908606

97. TSOM Method for Nanoelectronics Dimensional Metrology
Topic: Characterization, Nanometrology, and Nanoscale Measurements
Published: 11/18/2011
Author: Ravikiran Attota
Abstract: Through-focus scanning optical microscopy (TSOM) is a relatively new method that transforms conventional optical microscopes into truly three-dimensional metrology tools for nanoscale to microscale dimensional analysis. TSOM achieves this by acquirin ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=908623

98. Strategies for Nanoscale Contour Metrology using Critical Dimension Atomic Force Microscopy
Topic: Characterization, Nanometrology, and Nanoscale Measurements
Published: 9/30/2011
Authors: Ndubuisi George Orji, Ronald G Dixson, Andras Vladar, Michael T Postek
Abstract: Contour metrology is one of the techniques used to verify optical proximity correction (OPC) in lithography models. The use of these methods, which are known as resolution enhancement techniques (RET), are necessitated by the continued decrease in f ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=909559

99. Measuring agglomerate size distribution and dependence of localized surface plasmon resonance absorbance on gold nanoparticle agglomerate size using analytical ultracentrifugation
Topic: Characterization, Nanometrology, and Nanoscale Measurements
Published: 9/3/2011
Authors: Justin M Zook, Vinayak Rastogi, Robert I. MacCuspie, Athena M Keene, Jeffrey A Fagan
Abstract: Nanoparticles frequently agglomerate when dispersed into relevant biological and environmental media, with the resulting change to the effective size distribution dramatically affecting the potential nanotoxicity and the absorbance for biosensor ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=908878

100. Three dimensional aspects of droplet coalescence during dropwise condensation on superhydrophobic surfaces
Topic: Characterization, Nanometrology, and Nanoscale Measurements
Published: 8/24/2011
Authors: Konrad Rykaczewski, John Henry j Scott, Sukumar Rajauria, W Robert Ashurst, Jeff Chinn, Amy Chinn, Wanda Jones
Abstract: We report formation of nano-to-microscale satellite droplets in the geometrical shadow of high contact angle primary drops during dropwise water condensation on a nanostructured superhydrophobic surface. The primary drops contribute to the heat tran ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=908846



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