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Topic Area: Characterization, Nanometrology, and Nanoscale Measurements

Displaying records 81 to 90 of 206 records.
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81. Patterned Defect & CD Metrology by TSOM Beyond the 22 nm Node
Topic: Characterization, Nanometrology, and Nanoscale Measurements
Published: 4/10/2012
Authors: Ravikiran (Ravikiran) Attota, Abraham Arceo, Benjamin Bunday, Victor Vertanian
Abstract: Through-focus scanning optical microscopy (TSOM) is a novel method [1-8] that allows conventional optical microscopes to collect dimensional information down to the nanometer level by combining two-dimensional optical images captured at several throu ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=910910

82. Residual Layer Thickness Control and Metrology in Jet and Flash Imprint Lithography
Topic: Characterization, Nanometrology, and Nanoscale Measurements
Published: 4/10/2012
Authors: Ravikiran (Ravikiran) Attota, Shrawan Singhal, Sreenivasan S.V.
Abstract: Jet-and-Flash Imprint Lithography (J-FIL) has demonstrated capability of high-resolution patterning at low costs. For accurate pattern transfer using J-FIL, it is imperative to have control of the residual layer thickness (RLT) of cured resist undern ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=910872

83. Contour Metrology using Critical Dimension Atomic Force Microscopy
Topic: Characterization, Nanometrology, and Nanoscale Measurements
Published: 4/9/2012
Authors: Ndubuisi George Orji, Ronald G Dixson, Andras Vladar, Bin Ming, Michael T Postek
Abstract: The critical dimension atomic force microscope (CD-AFM), which is used as a reference instrument in lithography metrology, has been proposed as a supplemental instrument for contour measurement and verification. However, although data from CD-AFM is ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=910915

84. Scatterfield Microscopy of 22 nm Node Patterned Defects using Visible and DUV Light
Topic: Characterization, Nanometrology, and Nanoscale Measurements
Published: 4/4/2012
Authors: Bryan M Barnes, Martin Y Sohn, Francois R. Goasmat, Hui H. Zhou, Richard M Silver, Abraham Arceo
Abstract: Smaller patterning dimensions and novel architectures are fostering research into improved methods of defect detection in semiconductor device manufacturing. This initial experimental study, augmented with simulation, evaluates scatterfield microscop ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=910963

85. Tumor Necrosis Factor Interaction with Gold Nanoparticles
Topic: Characterization, Nanometrology, and Nanoscale Measurements
Published: 3/14/2012
Authors: De-Hao D. Tsai, Sherrie R. Elzey, Frank W DelRio, Robert I. MacCuspie, Suvajyoti S. Guha, Michael Russel Zachariah, Athena M Keene, Jeffrey D Clogston, Vincent A Hackley
Abstract: We report on a systematic investigation of molecular conjugation of tumor necrosis factor protein-α (TNF) onto gold nanoparticles (AuNPs) and the subsequent binding behavior to its antibody (anti-TNF). We employ a combination of physical and spe ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=909899

86. Electrospray ‹ Differential Mobility Analysis as an Orthogonal Tool to Size Exclusion Chromatography for Characterization of Protein Aggregates
Topic: Characterization, Nanometrology, and Nanoscale Measurements
Published: 3/12/2012
Authors: Suvajyoti S. Guha, Joshua R. Wayment, Michael J Tarlov, Michael Russel Zachariah
Abstract: The biopharmaceutical industry characterizes and quantifies aggregation of protein therapeutics using multiple analytical techniques to cross validate results. Here we demonstrate the use of electrospray-differential mobility analysis (ES-DMA), a gas ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=909715

87. Optical microscope angular illumination analysis
Topic: Characterization, Nanometrology, and Nanoscale Measurements
Published: 3/7/2012
Author: Ravikiran (Ravikiran) Attota
Abstract: For high precision applications of optical microscopes, it is critical to achieve symmetrical angular illumination intensity at the sample plane, in addition to uniform spatial intensity achieved by Köhler illumination. In this paper, first we dem ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=910145

88. Determining Nanoparticle Purity and the Presence of Nanoparticle Surface Coatings through Microscale TGA - Presentation at HiTemp2011
Topic: Characterization, Nanometrology, and Nanoscale Measurements
Published: 3/1/2012
Author: Elisabeth Mansfield
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=910862

89. Direct observation of nucleation and early stages of growth of GaN nanowires
Topic: Characterization, Nanometrology, and Nanoscale Measurements
Published: 2/15/2012
Authors: Rosa E. Diaz, Renu Sharma, Karalee Jarvis, Qinglei Zhang, Subhash Mahajan
Abstract: We report for the first time direct observations of the nucleation and early stages of growth of GaN nanowires. The nanowires were formed by exposing Au + Ga droplets to ammonia. The formation process was observed in situ, and controlled in real time ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=906318

90. CEINT/NIST PROTOCOL for the PREPARATION OF NANOSCALE TiO2 DISPERSIONS IN AN ENVIRONMENTAL MATRIX FOR ECO-TOXICOLOGICAL ASSESSMENT
Topic: Characterization, Nanometrology, and Nanoscale Measurements
Published: 2/2/2012
Authors: Julian S. Taurozzi, Vincent A Hackley, Mark R Wiesner
Abstract: Toxicity and fate assessment are key elements in the evaluation of the environmental, health and safety risks of engineered nanomaterials (ENMs). While significant effort and resources have been devoted to the toxicological evaluation of many ENMs, i ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=910395



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