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Topic Area: Characterization, Nanometrology, and Nanoscale Measurements

Displaying records 81 to 90 of 211 records.
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81. Preparation of Nanoscale TiO2 Dispersions in an Environmental Matrix for Eco-Toxicological Assessment
Series: Special Publication (NIST SP)
Report Number: 1200-5
Topic: Characterization, Nanometrology, and Nanoscale Measurements
Published: 6/19/2012
Authors: Julian S. Taurozzi, Vincent A Hackley, Mark R Wiesner
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=910684

82. Preparation of a Nanoscale TiO2 Aqueous Dispersion for Toxicological or Environmental Testing
Series: Special Publication (NIST SP)
Report Number: 1200-3
Topic: Characterization, Nanometrology, and Nanoscale Measurements
Published: 6/19/2012
Authors: Julian S. Taurozzi, Vincent A Hackley, Mark R Wiesner
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=910682

83. Reporting Guidelines for the Preparation of Aqueous Nanoparticle Dispersions from Dry Materials
Series: Special Publication (NIST SP)
Report Number: 1200-1
Topic: Characterization, Nanometrology, and Nanoscale Measurements
Published: 6/19/2012
Authors: Julian S. Taurozzi, Vincent A Hackley, Mark R Wiesner
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=910681

84. Nanoparticle Size and Shape Evaluation Using the TSOM Method
Topic: Characterization, Nanometrology, and Nanoscale Measurements
Published: 6/1/2012
Authors: Bradley N Damazo, Ravikiran Attota, Premsagar Purushotham Kavuri, Andras Vladar
Abstract: A novel through-focus scanning optical microscopy (TSOM) method that yields nanoscale information from optical images obtained at multiple focal planes will be used here for nanoparticle dimensional analysis. The TSOM method can distinguish not only ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=911138

85. Quantitative Viscoelastic Mapping of Polyolefin Blends with Contact Resonance Atomic Force Microscopy
Topic: Characterization, Nanometrology, and Nanoscale Measurements
Published: 5/9/2012
Authors: Dalia Yablon, Anil Gannepalli, Roger Proksch, Jason Philip Killgore, Donna C. Hurley, Andy Tsou
Abstract: The storage modulus (E') and loss modulus (E") of polyolefin blends have been mapped on the nanoscale with contact resonance force microscopy (CR-FM), a dynamic contact mode of atomic force microscopy (AFM). CR-FM maps for a blend of polyethylene, po ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=909881

86. Patterned Defect & CD Metrology by TSOM Beyond the 22 nm Node
Topic: Characterization, Nanometrology, and Nanoscale Measurements
Published: 4/10/2012
Authors: Ravikiran Attota, Abraham Arceo, Benjamin Bunday, Victor Vertanian
Abstract: Through-focus scanning optical microscopy (TSOM) is a novel method [1-8] that allows conventional optical microscopes to collect dimensional information down to the nanometer level by combining two-dimensional optical images captured at several throu ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=910910

87. Residual Layer Thickness Control and Metrology in Jet and Flash Imprint Lithography
Topic: Characterization, Nanometrology, and Nanoscale Measurements
Published: 4/10/2012
Authors: Ravikiran Attota, Shrawan Singhal, Sreenivasan S.V.
Abstract: Jet-and-Flash Imprint Lithography (J-FIL) has demonstrated capability of high-resolution patterning at low costs. For accurate pattern transfer using J-FIL, it is imperative to have control of the residual layer thickness (RLT) of cured resist undern ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=910872

88. Contour Metrology using Critical Dimension Atomic Force Microscopy
Topic: Characterization, Nanometrology, and Nanoscale Measurements
Published: 4/9/2012
Authors: Ndubuisi George Orji, Ronald G Dixson, Andras Vladar, Bin Ming, Michael T Postek
Abstract: The critical dimension atomic force microscope (CD-AFM), which is used as a reference instrument in lithography metrology, has been proposed as a supplemental instrument for contour measurement and verification. However, although data from CD-AFM is ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=910915

89. Scatterfield Microscopy of 22 nm Node Patterned Defects using Visible and DUV Light
Topic: Characterization, Nanometrology, and Nanoscale Measurements
Published: 4/4/2012
Authors: Bryan M Barnes, Martin Y Sohn, Francois R. Goasmat, Hui H. Zhou, Richard M Silver, Abraham Arceo
Abstract: Smaller patterning dimensions and novel architectures are fostering research into improved methods of defect detection in semiconductor device manufacturing. This initial experimental study, augmented with simulation, evaluates scatterfield microscop ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=910963

90. Tumor Necrosis Factor Interaction with Gold Nanoparticles
Topic: Characterization, Nanometrology, and Nanoscale Measurements
Published: 3/14/2012
Authors: De-Hao D. Tsai, Sherrie R. Elzey, Frank W DelRio, Robert I. MacCuspie, Suvajyoti S. Guha, Michael Russel Zachariah, Athena M Keene, Jeffrey D Clogston, Vincent A Hackley
Abstract: We report on a systematic investigation of molecular conjugation of tumor necrosis factor protein-α (TNF) onto gold nanoparticles (AuNPs) and the subsequent binding behavior to its antibody (anti-TNF). We employ a combination of physical and spe ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=909899



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