NIST logo

Publications Portal

You searched on: Topic Area: Characterization, Nanometrology, and Nanoscale Measurements

Displaying records 71 to 80 of 132 records.
Resort by: Date / Title


71. CEINT/NIST PROTOCOL for the PREPARATION OF NANOSCALE TiO2 DISPERSIONS IN AN ENVIRONMENTAL MATRIX FOR ECO-TOXICOLOGICAL ASSESSMENT
Topic: Characterization, Nanometrology, and Nanoscale Measurements
Published: 2/2/2012
Authors: Julian S. Taurozzi, Vincent A Hackley, Mark R Wiesner
Abstract: Toxicity and fate assessment are key elements in the evaluation of the environmental, health and safety risks of engineered nanomaterials (ENMs). While significant effort and resources have been devoted to the toxicological evaluation of many ENMs, i ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=910395

72. Nanometrology Using Through-Focus Scanning Optical Microscopy Method
Topic: Characterization, Nanometrology, and Nanoscale Measurements
Published: 12/21/2011
Authors: Ravikiran Attota, Richard M Silver
Abstract: We present an initial review of a novel through-focus scanning optical microscopy (TSOM) imaging method that produces nanometer dimensional measurement sensitivity using a conventional bright-field optical microscope. In the TSOM method a target is ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=905395

73. Three-dimensional Nanometrology with TSOM Optical Method
Topic: Characterization, Nanometrology, and Nanoscale Measurements
Published: 12/10/2011
Author: Ravikiran Attota
Abstract: Through-focus scanning optical microscopy (TSOM) is a new metrology method that achieves 3D nanoscale measurement sensitivity using conventional optical microscopes; measurement sensitivities are comparable to what is typical when using scatterometry ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=910045

74. Characterization and Resistive Switching Properties of Solution-Processed HfO2, HfSiO4, and ZrSiO4 Thin Films on Rigid and Flexible Substrates
Topic: Characterization, Nanometrology, and Nanoscale Measurements
Published: 12/7/2011
Authors: Joseph Leo Tedesco, Walter Zheng, Oleg A Kirillov, Sujitra Jeanie Pookpanratana, Hyuk-Jae Jang, Premsagar Purushotham Kavuri, Nhan V Nguyen, Curt A Richter
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=910358

75. Report on the first international comparison of small force facilities: A pilot study at the micronewton level
Topic: Characterization, Nanometrology, and Nanoscale Measurements
Published: 11/28/2011
Authors: Jon Robert Pratt, Min-Seok Kim, Uwe Brand, Christopher Jones
Abstract: Measurements of forces less than a micronewton are critical when examining the mechanical behaviors of materials and devices at characteristic length scales below a micrometer. As a result, standards for nanomechanical tests and test equipment are be ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=908606

76. TSOM Method for Nanoelectronics Dimensional Metrology
Topic: Characterization, Nanometrology, and Nanoscale Measurements
Published: 11/18/2011
Author: Ravikiran Attota
Abstract: Through-focus scanning optical microscopy (TSOM) is a relatively new method that transforms conventional optical microscopes into truly three-dimensional metrology tools for nanoscale to microscale dimensional analysis. TSOM achieves this by acquirin ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=908623

77. Strategies for Nanoscale Contour Metrology using Critical Dimension Atomic Force Microscopy
Topic: Characterization, Nanometrology, and Nanoscale Measurements
Published: 9/30/2011
Authors: Ndubuisi George Orji, Ronald G Dixson, Andras Vladar, Michael T Postek
Abstract: Contour metrology is one of the techniques used to verify optical proximity correction (OPC) in lithography models. The use of these methods, which are known as resolution enhancement techniques (RET), are necessitated by the continued decrease in f ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=909559

78. Measuring agglomerate size distribution and dependence of localized surface plasmon resonance absorbance on gold nanoparticle agglomerate size using analytical ultracentrifugation
Topic: Characterization, Nanometrology, and Nanoscale Measurements
Published: 9/3/2011
Authors: Justin M Zook, Vinayak Rastogi, Robert I. MacCuspie, Athena M Keene, Jeffrey A Fagan
Abstract: Nanoparticles frequently agglomerate when dispersed into relevant biological and environmental media, with the resulting change to the effective size distribution dramatically affecting the potential nanotoxicity and the absorbance for biosensor ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=908878

79. Three dimensional aspects of droplet coalescence during dropwise condensation on superhydrophobic surfaces
Topic: Characterization, Nanometrology, and Nanoscale Measurements
Published: 8/24/2011
Authors: Konrad Rykaczewski, John Henry j Scott, Sukumar Rajauria, W Robert Ashurst, Jeff Chinn, Amy Chinn, Wanda Jones
Abstract: We report formation of nano-to-microscale satellite droplets in the geometrical shadow of high contact angle primary drops during dropwise water condensation on a nanostructured superhydrophobic surface. The primary drops contribute to the heat tran ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=908846

80. Report on an Interlaboratory Study for the Measurement of BET-Specific Surface Area using an Industrially Relevant TiO2 Nanopowder
Topic: Characterization, Nanometrology, and Nanoscale Measurements
Published: 8/3/2011
Author: Vincent A Hackley
Abstract: This report summarizes the findings of an interlaboratory study (ILS) conducted in 2009-2010 under the auspices of the Versailles Project on Advanced Materials and Standards (VAMAS) Technical Working Area (TWA) 34 (Nanoparticle Populations). The stat ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=908638



Search NIST-wide:


(Search abstract and keywords)


Last Name:
First Name:







Special Publications:

Looking for a NIST Special Publication (NIST SP Series)? Place the series number and dash in the report number field (Example: 800-) and begin your search.

  • SP 250-XX: Calibration Services
  • SP 260-XX: Standard Reference Materials
  • SP 300-XX: Precision Measurement and Calibration
  • SP 400-XX: Semiconductor Measurement Technology
  • SP 480-XX: Law Enforcement Technology
  • SP 500-XX: Computer Systems Technology
  • SP 700-XX: Industrial Measurement Series
  • SP 800-XX: Computer Security Series
  • SP 823-XX: Integrated Services Digital Network Series