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Topic Area: Characterization, Nanometrology, and Nanoscale Measurements

Displaying records 61 to 70 of 188 records.
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61. Nanoparticle Size and Shape Evaluation Using the TSOM Method
Topic: Characterization, Nanometrology, and Nanoscale Measurements
Published: 6/1/2012
Authors: Bradley N Damazo, Ravikiran Attota, Premsagar Purushotham Kavuri, Andras Vladar
Abstract: A novel through-focus scanning optical microscopy (TSOM) method that yields nanoscale information from optical images obtained at multiple focal planes will be used here for nanoparticle dimensional analysis. The TSOM method can distinguish not only ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=911138

62. Quantitative Viscoelastic Mapping of Polyolefin Blends with Contact Resonance Atomic Force Microscopy
Topic: Characterization, Nanometrology, and Nanoscale Measurements
Published: 5/9/2012
Authors: Dalia Yablon, Anil Gannepalli, Roger Proksch, Jason Philip Killgore, Donna C. Hurley, Andy Tsou
Abstract: The storage modulus (E') and loss modulus (E") of polyolefin blends have been mapped on the nanoscale with contact resonance force microscopy (CR-FM), a dynamic contact mode of atomic force microscopy (AFM). CR-FM maps for a blend of polyethylene, po ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=909881

63. Patterned Defect & CD Metrology by TSOM Beyond the 22 nm Node
Topic: Characterization, Nanometrology, and Nanoscale Measurements
Published: 4/10/2012
Authors: Ravikiran Attota, Abraham Arceo, Benjamin Bunday, Victor Vertanian
Abstract: Through-focus scanning optical microscopy (TSOM) is a novel method [1-8] that allows conventional optical microscopes to collect dimensional information down to the nanometer level by combining two-dimensional optical images captured at several throu ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=910910

64. Residual Layer Thickness Control and Metrology in Jet and Flash Imprint Lithography
Topic: Characterization, Nanometrology, and Nanoscale Measurements
Published: 4/10/2012
Authors: Ravikiran Attota, Shrawan Singhal, Sreenivasan S.V.
Abstract: Jet-and-Flash Imprint Lithography (J-FIL) has demonstrated capability of high-resolution patterning at low costs. For accurate pattern transfer using J-FIL, it is imperative to have control of the residual layer thickness (RLT) of cured resist undern ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=910872

65. Contour Metrology using Critical Dimension Atomic Force Microscopy
Topic: Characterization, Nanometrology, and Nanoscale Measurements
Published: 4/9/2012
Authors: Ndubuisi George Orji, Ronald G Dixson, Andras Vladar, Bin Ming, Michael T Postek
Abstract: The critical dimension atomic force microscope (CD-AFM), which is used as a reference instrument in lithography metrology, has been proposed as a supplemental instrument for contour measurement and verification. However, although data from CD-AFM is ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=910915

66. Scatterfield Microscopy of 22 nm Node Patterned Defects using Visible and DUV Light
Topic: Characterization, Nanometrology, and Nanoscale Measurements
Published: 4/4/2012
Authors: Bryan M Barnes, Martin Y Sohn, Francois R. (Francois) Goasmat, Hui Zhou, Richard M Silver, Abraham Arceo
Abstract: Smaller patterning dimensions and novel architectures are fostering research into improved methods of defect detection in semiconductor device manufacturing. This initial experimental study, augmented with simulation, evaluates scatterfield microscop ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=910963

67. Tumor Necrosis Factor Interaction with Gold Nanoparticles
Topic: Characterization, Nanometrology, and Nanoscale Measurements
Published: 3/14/2012
Authors: De-Hao D. Tsai, Sherrie R. Elzey, Frank W DelRio, Robert I. MacCuspie, Suvajyoti S. Guha, Michael Russel Zachariah, Athena M Keene, Jeffrey D Clogston, Vincent A Hackley
Abstract: We report on a systematic investigation of molecular conjugation of tumor necrosis factor protein-α (TNF) onto gold nanoparticles (AuNPs) and the subsequent binding behavior to its antibody (anti-TNF). We employ a combination of physical and spe ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=909899

68. Electrospray ‹ Differential Mobility Analysis as an Orthogonal Tool to Size Exclusion Chromatography for Characterization of Protein Aggregates
Topic: Characterization, Nanometrology, and Nanoscale Measurements
Published: 3/12/2012
Authors: Suvajyoti S. Guha, Joshua R. Wayment, Michael J Tarlov, Michael Russel Zachariah
Abstract: The biopharmaceutical industry characterizes and quantifies aggregation of protein therapeutics using multiple analytical techniques to cross validate results. Here we demonstrate the use of electrospray-differential mobility analysis (ES-DMA), a gas ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=909715

69. Optical microscope angular illumination analysis
Topic: Characterization, Nanometrology, and Nanoscale Measurements
Published: 3/7/2012
Author: Ravikiran Attota
Abstract: For high precision applications of optical microscopes, it is critical to achieve symmetrical angular illumination intensity at the sample plane, in addition to uniform spatial intensity achieved by Köhler illumination. In this paper, first we dem ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=910145

70. Determining Nanoparticle Purity and the Presence of Nanoparticle Surface Coatings through Microscale TGA - Presentation at HiTemp2011
Topic: Characterization, Nanometrology, and Nanoscale Measurements
Published: 3/1/2012
Author: Elisabeth Mansfield
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=910862



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