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You searched on: Topic Area: Characterization, Nanometrology, and Nanoscale Measurements

Displaying records 61 to 70 of 124 records.
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61. Scatterfield Microscopy of 22 nm Node Patterned Defects using Visible and DUV Light
Topic: Characterization, Nanometrology, and Nanoscale Measurements
Published: 4/4/2012
Authors: Bryan M Barnes, Martin Y Sohn, Francois R. Goasmat, Hui H. Zhou, Richard M Silver, Abraham Arceo
Abstract: Smaller patterning dimensions and novel architectures are fostering research into improved methods of defect detection in semiconductor device manufacturing. This initial experimental study, augmented with simulation, evaluates scatterfield microscop ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=910963

62. Tumor Necrosis Factor Interaction with Gold Nanoparticles
Topic: Characterization, Nanometrology, and Nanoscale Measurements
Published: 3/14/2012
Authors: De-Hao D. Tsai, Sherrie R. Elzey, Frank W DelRio, Robert I. MacCuspie, Suvajyoti S. Guha, Michael Russel Zachariah, Athena M Keene, Jeffrey D Clogston, Vincent A Hackley
Abstract: We report on a systematic investigation of molecular conjugation of tumor necrosis factor protein-α (TNF) onto gold nanoparticles (AuNPs) and the subsequent binding behavior to its antibody (anti-TNF). We employ a combination of physical and spe ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=909899

63. Direct observation of nucleation and early stages of growth of GaN nanowires
Topic: Characterization, Nanometrology, and Nanoscale Measurements
Published: 2/15/2012
Authors: Rosa E. Diaz, Renu Sharma, Karalee Jarvis, Qinglei Zhang, Subhash Mahajan
Abstract: We report for the first time direct observations of the nucleation and early stages of growth of GaN nanowires. The nanowires were formed by exposing Au + Ga droplets to ammonia. The formation process was observed in situ, and controlled in real time ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=906318

64. CEINT/NIST PROTOCOL for the PREPARATION OF NANOSCALE TiO2 DISPERSIONS IN AN ENVIRONMENTAL MATRIX FOR ECO-TOXICOLOGICAL ASSESSMENT
Topic: Characterization, Nanometrology, and Nanoscale Measurements
Published: 2/2/2012
Authors: Julian S. Taurozzi, Vincent A Hackley, Mark R Wiesner
Abstract: Toxicity and fate assessment are key elements in the evaluation of the environmental, health and safety risks of engineered nanomaterials (ENMs). While significant effort and resources have been devoted to the toxicological evaluation of many ENMs, i ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=910395

65. Nanometrology Using Through-Focus Scanning Optical Microscopy Method
Topic: Characterization, Nanometrology, and Nanoscale Measurements
Published: 12/21/2011
Authors: Ravikiran Attota, Richard M Silver
Abstract: We present an initial review of a novel through-focus scanning optical microscopy (TSOM) imaging method that produces nanometer dimensional measurement sensitivity using a conventional bright-field optical microscope. In the TSOM method a target is ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=905395

66. Three-dimensional Nanometrology with TSOM Optical Method
Topic: Characterization, Nanometrology, and Nanoscale Measurements
Published: 12/10/2011
Author: Ravikiran Attota
Abstract: Through-focus scanning optical microscopy (TSOM) is a new metrology method that achieves 3D nanoscale measurement sensitivity using conventional optical microscopes; measurement sensitivities are comparable to what is typical when using scatterometry ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=910045

67. Characterization and Resistive Switching Properties of Solution-Processed HfO2, HfSiO4, and ZrSiO4 Thin Films on Rigid and Flexible Substrates
Topic: Characterization, Nanometrology, and Nanoscale Measurements
Published: 12/7/2011
Authors: Joseph Leo Tedesco, Walter Zheng, Oleg A Kirillov, Sujitra Jeanie Pookpanratana, Hyuk-Jae Jang, Premsagar Purushotham Kavuri, Nhan V Nguyen, Curt A Richter
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=910358

68. TSOM Method for Nanoelectronics Dimensional Metrology
Topic: Characterization, Nanometrology, and Nanoscale Measurements
Published: 11/18/2011
Author: Ravikiran Attota
Abstract: Through-focus scanning optical microscopy (TSOM) is a relatively new method that transforms conventional optical microscopes into truly three-dimensional metrology tools for nanoscale to microscale dimensional analysis. TSOM achieves this by acquirin ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=908623

69. Strategies for Nanoscale Contour Metrology using Critical Dimension Atomic Force Microscopy
Topic: Characterization, Nanometrology, and Nanoscale Measurements
Published: 9/30/2011
Authors: Ndubuisi George Orji, Ronald G Dixson, Andras Vladar, Michael T Postek
Abstract: Contour metrology is one of the techniques used to verify optical proximity correction (OPC) in lithography models. The use of these methods, which are known as resolution enhancement techniques (RET), are necessitated by the continued decrease in f ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=909559

70. Measuring agglomerate size distribution and dependence of localized surface plasmon resonance absorbance on gold nanoparticle agglomerate size using analytical ultracentrifugation
Topic: Characterization, Nanometrology, and Nanoscale Measurements
Published: 9/3/2011
Authors: Justin M Zook, Vinayak Rastogi, Robert I. MacCuspie, Athena M Keene, Jeffrey A Fagan
Abstract: Nanoparticles frequently agglomerate when dispersed into relevant biological and environmental media, with the resulting change to the effective size distribution dramatically affecting the potential nanotoxicity and the absorbance for biosensor ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=908878



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