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Topic Area: Characterization, Nanometrology, and Nanoscale Measurements

Displaying records 191 to 200 of 211 records.
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191. ENABLING STANDARDS FOR NANOMATERIAL CHARACTERIZATION
Topic: Characterization, Nanometrology, and Nanoscale Measurements
Published: 8/13/2009
Authors: Vincent A Hackley, Martin Fritts, James F Kelly, Anil K. Patri, Alan F. Rawle
Abstract: A two-day international workshop was convened recently in order to scope out and address the urgent need for standards to accurately characterize the physico-chemical and biological properties of engineered nanomaterials. These standards are needed b ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=902370

192. Raman and electron microscopy analysis of carbon nanotubes exposed to high power laser irradiance
Topic: Characterization, Nanometrology, and Nanoscale Measurements
Published: 5/5/2009
Authors: John H Lehman, Christopher L Cromer, Krishna Ramadurai, Roop Mahajan, Anne Dillon
Abstract: High power laser radiometry requires efficient and damage-resistant detectors. The current study explores the evolving nature of carbon nanotube coatings for such detectors upon their exposure to incrementally increasing laser power levels. Electron ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=901094

193. Reference Metrology in a Research Fab: The NIST Clean Calibrations Thrust
Topic: Characterization, Nanometrology, and Nanoscale Measurements
Published: 4/12/2009
Authors: Ronald G Dixson, Ndubuisi George Orji, Joseph Fu, Thomas B Renegar, Xiaoyu A Zheng, Theodore Vincent Vorburger, Albert M. Hilton, Marc J Cangemi, Lei Chen, Michael A. Hernandez, Russell E Hajdaj, Michael R Bishop, Aaron Cordes
Abstract: In 2004, the National Institute of Standards and Technology (NIST) commissioned the Advanced Measurement Laboratory (AML) ‹ a state-of-the-art, five-wing laboratory complex for leading edge NIST research. The NIST NanoFab ‹ a 1765 m2 (19,000 ft2) cl ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=902187

194. Development of quantitative electric force microscopy for surface and subsurface characterization of nanostructures in polymeric coatings
Topic: Characterization, Nanometrology, and Nanoscale Measurements
Published: 4/1/2009
Author: Minhua Zhao
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=902060

195. Dielectric Spectroscopy Investigation of Relaxation in C60-Polyisoprene Nanocomposites
Topic: Characterization, Nanometrology, and Nanoscale Measurements
Published: 3/23/2009
Authors: Yifu Ding, Sebastian Pawlus, Alexei Sokolov, Jack F Douglas, Alamgir Karim, Christopher L Soles
Abstract: We investigate the influence of adding C60 nanoparticles on the dielectric relaxation spectra of both unentangled and entangled polyisoprene (PIP). Relaxation modes corresponding to both segmental and chain relaxation were analyzed over a broad tempe ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=900194

196. In situ measurement of annealing-induced line shape decay in nanoimprinted polymers using scatterometry
Topic: Characterization, Nanometrology, and Nanoscale Measurements
Published: 3/2/2009
Authors: Heather J Patrick, Thomas Avery Germer, Yifu Ding, Hyun W. Ro, Lee J Richter, Christopher L Soles
Abstract: Thermal embossing nanoimprint lithography (NIL) is an area of continuing interest because it allows direct patterning of nanoscale structures into a wide variety of functional polymer materials. Measuring the shape evolution of nanoimprinted lines d ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=901568

197. Scatterometry for in situ measurement of pattern reflow in nanoimprinted polymers
Topic: Characterization, Nanometrology, and Nanoscale Measurements
Published: 12/9/2008
Authors: Heather J Patrick, Thomas Avery Germer, Yifu Ding, Hyun W. Ro, Lee J Richter, Christopher L Soles
Abstract: We use optical scatterometry to extract the time evolution of the profile of nanoimprinted lines in low and high molecular mass polymer gratings during reflow at the glass transition temperature. The data are obtained continuously during the anneal ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=900878

198. Comparison of NIST SI Force Scale to NPL SI Mass Scale
Topic: Characterization, Nanometrology, and Nanoscale Measurements
Published: 10/19/2008
Authors: Christopher W. Jones, John A Kramar, Stuart Davidson, Richard Leach, Jon Robert Pratt
Abstract: Small masses in the 1.0 mg to 0.1 mg range were developed and calibrated at NPL with traceability to the IPK. These masses were transported to NIST at Gaithersburg and used as deadweights on the NIST electrostatic force balance, to facilitate a mass- ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=824727

199. Characterization of Probe Dynamic Behaviors in Critical Dimension Atomic Force Microscopy
Topic: Characterization, Nanometrology, and Nanoscale Measurements
Published: 10/15/2008
Authors: Shaw C Feng, Che B. Joung, Theodore Vincent Vorburger
Abstract: Critical Dimension Atomic Force Microscopy (CD-AFM) is a primary means to measure the geometric shapes of walls and trenches on the nanometer scale in laboratories supporting the electronic industry. As the widths of commercially available CD-AFM pro ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=824690

200. Through-focus Scanning and Scatterfield Optical Methods for Advanced Overlay Target Analysis
Topic: Characterization, Nanometrology, and Nanoscale Measurements
Published: 9/1/2008
Authors: Ravikiran Attota, Michael T. Stocker, Richard M Silver, Nathanael A Heckert, Hui H. Zhou, Richard J Kasica, Lei Chen, Ronald G Dixson, Ndubuisi George Orji, Bryan M Barnes, Peter Lipscomb
Abstract: In this paper we present overlay measurement techniques that use small overlay targets for advanced semiconductor applications. We employ two different optical methods to measure overlay using modified conventional optical microscope platforms. They ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=902294



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