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Topic Area: Characterization, Nanometrology, and Nanoscale Measurements

Displaying records 181 to 190 of 195 records.
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181. Scatterometry for in situ measurement of pattern reflow in nanoimprinted polymers
Topic: Characterization, Nanometrology, and Nanoscale Measurements
Published: 12/9/2008
Authors: Heather J Patrick, Thomas Avery Germer, Yifu Ding, Hyun W. Ro, Lee J Richter, Christopher L Soles
Abstract: We use optical scatterometry to extract the time evolution of the profile of nanoimprinted lines in low and high molecular mass polymer gratings during reflow at the glass transition temperature. The data are obtained continuously during the anneal ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=900878

182. Comparison of NIST SI Force Scale to NPL SI Mass Scale
Topic: Characterization, Nanometrology, and Nanoscale Measurements
Published: 10/19/2008
Authors: Christopher W. Jones, John A Kramar, Stuart Davidson, Richard Leach, Jon Robert Pratt
Abstract: Small masses in the 1.0 mg to 0.1 mg range were developed and calibrated at NPL with traceability to the IPK. These masses were transported to NIST at Gaithersburg and used as deadweights on the NIST electrostatic force balance, to facilitate a mass- ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=824727

183. Characterization of Probe Dynamic Behaviors in Critical Dimension Atomic Force Microscopy
Topic: Characterization, Nanometrology, and Nanoscale Measurements
Published: 10/15/2008
Authors: Shaw C Feng, Che B. Joung, Theodore Vincent Vorburger
Abstract: Critical Dimension Atomic Force Microscopy (CD-AFM) is a primary means to measure the geometric shapes of walls and trenches on the nanometer scale in laboratories supporting the electronic industry. As the widths of commercially available CD-AFM pro ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=824690

184. Through-focus Scanning and Scatterfield Optical Methods for Advanced Overlay Target Analysis
Topic: Characterization, Nanometrology, and Nanoscale Measurements
Published: 9/1/2008
Authors: Ravikiran Attota, Michael T. Stocker, Richard M Silver, Nathanael A Heckert, Hui Zhou, Richard J Kasica, Lei Chen, Ronald G Dixson, Ndubuisi George Orji, Bryan M Barnes, Peter Lipscomb
Abstract: In this paper we present overlay measurement techniques that use small overlay targets for advanced semiconductor applications. We employ two different optical methods to measure overlay using modified conventional optical microscope platforms. They ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=902294

185. Precise AFM Cantilever Spring Constant Calibration Using a Reference Cantilever Array
Topic: Characterization, Nanometrology, and Nanoscale Measurements
Published: 9/1/2007
Authors: Richard Swift Gates, M G Reitsma
Abstract: A new method of calibrating the stiffness of atomic force microscope (AFM) cantilevers is demonstrated using a unique array of uniform microfabricated reference cantilevers. A series of force-distance curves were obtained using a commercial AFM test ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=854219

186. Making Batch-Mode Size Measurements of Nanoparticles in Aqueous Media Using Dynamic Light Scattering
Topic: Characterization, Nanometrology, and Nanoscale Measurements
Published: 8/11/2007
Authors: Vincent A Hackley, Jeffrey D. Clogston
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=854412

187. Structure Characterization of Nanoporous Interlevel Dielectric Thin Films With X-Ray and Neutron Radiation
Topic: Characterization, Nanometrology, and Nanoscale Measurements
Published: 3/6/2007
Authors: Christopher L Soles, Hae-Jeong Lee, B D. Vogt, Eric K Lin, Wen-Li Wu
Abstract: The structure characterization of nanoporous interlevel dielectric (ILD) thin films is challenging because of the small sample volumes and nanometer dimensions of the pores. In this chapter, we review characterization methods for porous ILD material ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=852526

188. Direct Measurement of Cantilever Spring Constants and Correction of Cantilever Irregularities Using an Instrumented Indenter
Topic: Characterization, Nanometrology, and Nanoscale Measurements
Published: 1/22/2007
Authors: Z C. Ying, Mark Reitsma, Richard Swift Gates
Abstract: A method is presented that allows direct measurement of a wide range of spring constants of cantilevers using an indentation instrument with an integrated optical microscope. An accuracy of better than 10% can be achieved for spring constants from 0 ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=850970

189. Surface-plasmon enhancement of Brillouin light scattering from gold-nanodisk arrays on glass
Topic: Characterization, Nanometrology, and Nanoscale Measurements
Published: 1/1/2007
Authors: Zhandos Utegulov, B. T. Draine, Sudook A Kim, J. M. Shaw, Ward L Johnson
Abstract: Enhancement of Brillouin light scattering (BLS) at 532 nm was observed from Rayleigh-like and Sezawa-like acoustic modes of alkaline-earth boro-aluminosilicate glass covered with periodic arrays of gold nanodisks. This enhancement is larger than that ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=50589

190. Prototype Cantilevers for SI-Traceable NanoNewton Force Calibration
Topic: Characterization, Nanometrology, and Nanoscale Measurements
Published: 9/20/2006
Authors: Richard Swift Gates, Jon Robert Pratt
Abstract: A series of extremely uniform prototype reference cantilevers have been created that can be used to calibrate the spring constants of atomic force microscope (AFM) cantilevers and other micromechanical structures. By utilizing optimal combinations o ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=850947



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