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Topic Area: Characterization, Nanometrology, and Nanoscale Measurements

Displaying records 121 to 130 of 145 records.
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121. Enhanced Spatial Resolution Scanning Kelvin Force Microscopy Using Conductive Carbon Nanotube Tips
Topic: Characterization, Nanometrology, and Nanoscale Measurements
Published: 10/5/2009
Authors: Joseph J Kopanski, Paul McClure, Vladimir Mancevski
Abstract: The response of a scanning Kelvin force microscope (SKFM) was measured with conventional micromachined silicon tips coated with Au and with advanced tips terminated with a carbon nanotube (CNT). A simple model of the SKFM predicts enhanced spatial re ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=903125

122. Frontiers of Characterization and Metrology for Nanoelectronics: 2009
Topic: Characterization, Nanometrology, and Nanoscale Measurements
Published: 10/5/2009
Authors: David G Seiler, Alain C. Diebold, Robert McDonald, C. Michael Garner, Dan Herr, Rajinder P. Khosla, Erik M Secula
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=904357

123. First approaches to standard protocols and reference materials for the assessment of potential hazards associated with nanomaterials
Topic: Characterization, Nanometrology, and Nanoscale Measurements
Published: 9/19/2009
Authors: Iseult Lynch, Hans Bouwmeester, Hans Marvin, Alan Casey, Gordon Chambers, Markus Berges, Martin Clift, Teresa Fernandes, Lise Fjellsbo, Lucienne Juillerat, Gert Roebben, Christoph Klein, Qinglan Wu, Vincent A Hackley, Jean-Pierre Kaiser, Wolfgang Kreyling, C. Michael Garner, Peter Hatto, Kenneth Dawson, Michael Riediker
Abstract: This report presents the outcome of the discussions of 60 experts in the field of safety assessment of manufactured NMs from academia, industry, government and non-profit organizations on some of the critical issues pertaining to the development of s ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=902692

124. Elastic modulus of low-k dielectric thin films measured by load-dependent contact-resonance atomic force microscopy
Topic: Characterization, Nanometrology, and Nanoscale Measurements
Published: 9/14/2009
Authors: Gheorghe Stan, Sean King, Robert Francis Cook
Abstract: Correlated force and contact-resonance versus displacement responses have been resolved using load-dependent contact-resonance atomic force microscopy (AFM) to determine the elastic modulus of low-k dielectric thin films. The measurements consisted ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=902329

125. ENABLING STANDARDS FOR NANOMATERIAL CHARACTERIZATION
Topic: Characterization, Nanometrology, and Nanoscale Measurements
Published: 8/13/2009
Authors: Vincent A Hackley, Martin Fritts, James F Kelly, Anil K. Patri, Alan F. Rawle
Abstract: A two-day international workshop was convened recently in order to scope out and address the urgent need for standards to accurately characterize the physico-chemical and biological properties of engineered nanomaterials. These standards are needed b ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=902370

126. Raman and electron microscopy analysis of carbon nanotubes exposed to high power laser irradiance
Topic: Characterization, Nanometrology, and Nanoscale Measurements
Published: 5/5/2009
Authors: John H Lehman, Christopher L Cromer, Krishna Ramadurai, Roop Mahajan, Anne Dillon
Abstract: High power laser radiometry requires efficient and damage-resistant detectors. The current study explores the evolving nature of carbon nanotube coatings for such detectors upon their exposure to incrementally increasing laser power levels. Electron ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=901094

127. Reference Metrology in a Research Fab: The NIST Clean Calibrations Thrust
Topic: Characterization, Nanometrology, and Nanoscale Measurements
Published: 4/12/2009
Authors: Ronald G Dixson, Ndubuisi George Orji, Joseph Fu, Thomas B Renegar, Xiaoyu A Zheng, Theodore Vincent Vorburger, Albert M. Hilton, Marc J Cangemi, Lei Chen, Michael A. Hernandez, Russell E Hajdaj, Michael R Bishop, Aaron Cordes
Abstract: In 2004, the National Institute of Standards and Technology (NIST) commissioned the Advanced Measurement Laboratory (AML) – a state-of-the-art, five-wing laboratory complex for leading edge NIST research. The NIST NanoFab – a 1765 m2 (19,000 ft2) cl ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=902187

128. Development of quantitative electric force microscopy for surface and subsurface characterization of nanostructures in polymeric coatings
Topic: Characterization, Nanometrology, and Nanoscale Measurements
Published: 4/1/2009
Author: Minhua Zhao
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=902060

129. Dielectric Spectroscopy Investigation of Relaxation in C60-Polyisoprene Nanocomposites
Topic: Characterization, Nanometrology, and Nanoscale Measurements
Published: 3/23/2009
Authors: Yifu Ding, Sebastian Pawlus, Alexei Sokolov, Jack F Douglas, Alamgir Karim, Christopher L Soles
Abstract: We investigate the influence of adding C60 nanoparticles on the dielectric relaxation spectra of both unentangled and entangled polyisoprene (PIP). Relaxation modes corresponding to both segmental and chain relaxation were analyzed over a broad tempe ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=900194

130. In situ measurement of annealing-induced line shape decay in nanoimprinted polymers using scatterometry
Topic: Characterization, Nanometrology, and Nanoscale Measurements
Published: 3/2/2009
Authors: Heather J Patrick, Thomas Avery Germer, Yifu Ding, Hyun Wook Ro, Lee J Richter, Christopher L Soles
Abstract: Thermal embossing nanoimprint lithography (NIL) is an area of continuing interest because it allows direct patterning of nanoscale structures into a wide variety of functional polymer materials. Measuring the shape evolution of nanoimprinted lines d ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=901568