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You searched on: Topic Area: Characterization, Nanometrology, and Nanoscale Measurements

Displaying records 111 to 120 of 125 records.
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111. Steady-state and transient photoconductivity in c-axis GaN nanowires grown by nitrogen-plasma-assisted molecular beam epitaxy
Topic: Characterization, Nanometrology, and Nanoscale Measurements
Published: 2/12/2010
Authors: Norman A Sanford, Paul Timothy Blanchard, Kristine A Bertness, Lorelle Mansfield, John B. Schlager, Aric Warner Sanders, Alexana Roshko, Beau Burton, Steven George
Abstract: Analysis of steady-state and transient photoconductivity measurements at room temperature performed on c-axis oriented GaN nanowires yielded estimates of free carrier concentration, drift, mobility, surface band bending, and surface capture coefficie ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=33133

112. Subsurface Characterization of Carbon Nanotubes in Polymer Composites via Quantitative Electric Force Microscopy
Topic: Characterization, Nanometrology, and Nanoscale Measurements
Published: 2/3/2010
Authors: Minhua Zhao, Xiaohong Gu, Sharon E. Lowther, Cheol Park, Jerry Jean, Tinh Nguyen
Abstract: In this study, quantitative Electric Force Microscopy (EFM) characterization of CNTs dispersed in free-standing polymer composite films is pursued. The effect of experimental parameters including humidity conditions, EFM probe geometry, tip-sample ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=904262

113. Nanoscale Measurements With the TSOM Optical Method
Series: OTHER
Topic: Characterization, Nanometrology, and Nanoscale Measurements
Published: 1/4/2010
Author: Ravikiran Attota
Abstract: A novel through-focus scanning optical microscope (TSOM - pronounced as 'tee-som') technique that produces nanometer dimensional measurement sensitivity using a conventional optical microscope by analyzing images obtained at different focus positions ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=904673

114. Transmission Electron Diffraction from nanoparticles, nanowires and thin films in an SEM using conventional EBSD equipment
Topic: Characterization, Nanometrology, and Nanoscale Measurements
Published: 1/1/2010
Authors: Roy Howard Geiss, Robert R Keller, David Thomas Read
Abstract: We describe a new scanning electron microscope (SEM) method for obtaining and analyzing the crystallographic structure and orientation in nanoparticles and ultrathin films using conventional electron backscatter diffraction (EBSD) equipment.
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=905080

115. Spray Deposited Poly-3-hexylthiophene Thin Film Transistors
Topic: Characterization, Nanometrology, and Nanoscale Measurements
Published: 12/11/2009
Authors: Calvin Chan, Lee J Richter, David Germack, Brad Conrad, Daniel A Fischer, Dean M DeLongchamp, David J Gundlach
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=905385

116. Fabrication with Flip-Chip Lamination
Topic: Characterization, Nanometrology, and Nanoscale Measurements
Published: 11/15/2009
Authors: Mariona Coll Bau, Curt A Richter, Christina Ann Hacker
Abstract: Fabrication with Flip-Chip Lamination , Mariona Coll, DR Hines, CA Richter, CA Hacker, Nanotechnology colloquium, Wake Forest University, 11-09.
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=907071

117. Fabrication with Flip-Chip Lamination
Topic: Characterization, Nanometrology, and Nanoscale Measurements
Published: 10/15/2009
Authors: Mariona Coll Bau, Curt A Richter, Christina Ann Hacker
Abstract: Fabrication with Flip-Chip Lamination , Mariona Coll, DR Hines, CA Richter, CA Hacker, MRSEC surface physics colloquium, University of Maryland, College Park, 10-09.
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=907072

118. Size Measurement of Nanoparticles using Atomic Force Microscopy
Topic: Characterization, Nanometrology, and Nanoscale Measurements
Published: 10/1/2009
Authors: Jaroslaw Grobelny, Frank W DelRio, Pradeep Narayanan Namboodiri, Doo-In Kim, Vincent A Hackley, Robert Francis Cook
Abstract: In this assay protocol, procedures for dispersing gold nanoparticles on various surfaces such that they are suitable for imaging and height measurement via intermittent contact mode AFM are first described. The procedures for AFM calibration and ope ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=854085

119. First approaches to standard protocols and reference materials for the assessment of potential hazards associated with nanomaterials
Topic: Characterization, Nanometrology, and Nanoscale Measurements
Published: 9/19/2009
Authors: Iseult Lynch, Hans Bouwmeester, Hans Marvin, Alan Casey, Gordon Chambers, Markus Berges, Martin Clift, Teresa Fernandes, Lise Fjellsbo, Lucienne Juillerat, Gert Roebben, Christoph Klein, Qinglan Wu, Vincent A Hackley, Jean-Pierre Kaiser, Wolfgang Kreyling, C. Michael Garner, Peter Hatto, Kenneth Dawson, Michael Riediker
Abstract: This report presents the outcome of the discussions of 60 experts in the field of safety assessment of manufactured NMs from academia, industry, government and non-profit organizations on some of the critical issues pertaining to the development of s ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=902692

120. Scatterometry for in situ measurement of pattern reflow in nanoimprinted polymers
Topic: Characterization, Nanometrology, and Nanoscale Measurements
Published: 12/9/2008
Authors: Heather J Patrick, Thomas Avery Germer, Yifu Ding, Hyun Wook Ro, Lee J Richter, Christopher L Soles
Abstract: We use optical scatterometry to extract the time evolution of the profile of nanoimprinted lines in low and high molecular mass polymer gratings during reflow at the glass transition temperature. The data are obtained continuously during the anneal ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=900878



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