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Topic Area: Characterization, Nanometrology, and Nanoscale Measurements

Displaying records 101 to 110 of 216 records.
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101. Through-focus Scanning Optical Microscopy
Topic: Characterization, Nanometrology, and Nanoscale Measurements
Published: 12/31/2011
Author: Ravikiran Attota
Abstract: Through-focus scanning optical microscopy (TSOM) method provides three-dimensional information (i.e. the size, shape and location) about micro- and nanometer-scale structures. TSOM, based on a conventional optical microscope, achieves this by acquiri ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=908493

102. Nanometrology Using Through-Focus Scanning Optical Microscopy Method
Topic: Characterization, Nanometrology, and Nanoscale Measurements
Published: 12/21/2011
Authors: Ravikiran Attota, Richard M Silver
Abstract: We present an initial review of a novel through-focus scanning optical microscopy (TSOM) imaging method that produces nanometer dimensional measurement sensitivity using a conventional bright-field optical microscope. In the TSOM method a target is ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=905395

103. Three-dimensional Nanometrology with TSOM Optical Method
Topic: Characterization, Nanometrology, and Nanoscale Measurements
Published: 12/10/2011
Author: Ravikiran Attota
Abstract: Through-focus scanning optical microscopy (TSOM) is a new metrology method that achieves 3D nanoscale measurement sensitivity using conventional optical microscopes; measurement sensitivities are comparable to what is typical when using scatterometry ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=910045

104. Characterization and Resistive Switching Properties of Solution-Processed HfO2, HfSiO4, and ZrSiO4 Thin Films on Rigid and Flexible Substrates
Topic: Characterization, Nanometrology, and Nanoscale Measurements
Published: 12/7/2011
Authors: Joseph Leo Tedesco, Walter Zheng, Oleg A Kirillov, Sujitra Jeanie Pookpanratana, Hyuk-Jae Jang, Premsagar Purushotham Kavuri, Nhan V Nguyen, Curt A Richter
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=910358

105. Probing the paramagnetic interactions between the unpaired electronic spins of carbon atoms and the nuclear spins of hydrogen molecules with Raman spectroscopy
Topic: Characterization, Nanometrology, and Nanoscale Measurements
Published: 12/1/2011
Author: Andrea Centrone
Abstract: Carbon materials typically have a high density of unpaired electronic spins but the exact nature of the defect sites that give rise to their magnetic properties are not yet well understood. In this work, the paramagnetic interactions between the unpa ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=907299

106. TSOM Method for Nanoelectronics Dimensional Metrology
Topic: Characterization, Nanometrology, and Nanoscale Measurements
Published: 11/18/2011
Author: Ravikiran Attota
Abstract: Through-focus scanning optical microscopy (TSOM) is a relatively new method that transforms conventional optical microscopes into truly three-dimensional metrology tools for nanoscale to microscale dimensional analysis. TSOM achieves this by acquirin ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=908623

107. Carbon Nanotube Nucleation Driven by Catalyst Morphology Dynamics
Topic: Characterization, Nanometrology, and Nanoscale Measurements
Published: 11/14/2011
Authors: Elena Pigos, Evgeni S Penev, Morgana A Ribas, Renu Sharma, Boris I. Yakobson, Avetik R. Harutyunyan
Abstract: In situ observation of carbon nanotube nucleation process accompanied by catalyst particle dynamic morphology reconstruction is considered within a thermodynamic approach, and reveals the driving force for the liftoff,a crucial event in the nanotube ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=908296

108. Strategies for Nanoscale Contour Metrology using Critical Dimension Atomic Force Microscopy
Topic: Characterization, Nanometrology, and Nanoscale Measurements
Published: 9/30/2011
Authors: Ndubuisi George Orji, Ronald G Dixson, Andras Vladar, Michael T Postek
Abstract: Contour metrology is one of the techniques used to verify optical proximity correction (OPC) in lithography models. The use of these methods, which are known as resolution enhancement techniques (RET), are necessitated by the continued decrease in f ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=909559

109. Implications of the choice of interatomic potential on planar faults and surface properties in nickel
Topic: Characterization, Nanometrology, and Nanoscale Measurements
Published: 9/21/2011
Authors: Chandler A Becker, Francesca M Tavazza, Lyle E Levine
Abstract: With the increasing use of molecular simulation to understand deformation mechanisms in transition metals, it is important to assess how well the simulations capture behavior both near equilibrium and under more extreme conditions. In particular, it ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=906781

110. Measuring agglomerate size distribution and dependence of localized surface plasmon resonance absorbance on gold nanoparticle agglomerate size using analytical ultracentrifugation
Topic: Characterization, Nanometrology, and Nanoscale Measurements
Published: 9/3/2011
Authors: Justin M Zook, Vinayak Rastogi, Robert I. MacCuspie, Athena M Keene, Jeffrey A Fagan
Abstract: Nanoparticles frequently agglomerate when dispersed into relevant biological and environmental media, with the resulting change to the effective size distribution dramatically affecting the potential nanotoxicity and the absorbance for biosensor ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=908878



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