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You searched on: Topic Area: Characterization, Nanometrology, and Nanoscale Measurements

Displaying records 1 to 10 of 153 records.
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1. Enabling Quantitative Optical Imaging for In-die-capable Critical Dimension Targets
Topic: Characterization, Nanometrology, and Nanoscale Measurements
Published: 4/4/2016
Authors: Bryan M Barnes, Mark Alexander Henn, Martin Y Sohn, Hui Zhou, Richard M Silver
Abstract: Dimensional scaling trends will eventually bring the semiconductor critical dimensions (CDs) down to only a few atoms in width. New optical techniques are required to address intra-die variability for these CDs using sufficiently small in-die metrolo ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=920551

2. Optimizing noise for defect analysis with through-focus scanning optical microscopy
Topic: Characterization, Nanometrology, and Nanoscale Measurements
Published: 3/25/2016
Authors: Ravikiran Attota, John A Kramar
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=920308

3. Centroid and Orientation Precision of Localization Microscopy
Topic: Characterization, Nanometrology, and Nanoscale Measurements
Published: 3/11/2016
Authors: Craig Dyer McGray, Craig Robert Copeland, Samuel M Stavis, Jon C Geist
Abstract: The concept of localization precision, which is essential to localization microscopy, is formally extended from optical point sources to microscopic rigid bodies. Measurement functions are presented to calculate the planar position, orientation, and ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=918105

4. Impact of and correction for instrument sensitivity drift on nanoparticle size measurements by single-particle ICP-MS
Topic: Characterization, Nanometrology, and Nanoscale Measurements
Published: 2/8/2016
Authors: Hind El Hadri, Elijah J Petersen, Michael R Winchester
Abstract: Engineered nanomaterials (ENMs) are already incorporated into numerous consumer products, and increasing product applications are expected in future years. To enable an understanding of potential risks associated with these products, it is important ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=918257

5. Noise analysis for through-focus scanning optical microscopy method
Topic: Characterization, Nanometrology, and Nanoscale Measurements
Published: 2/3/2016
Author: Ravikiran Attota
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=919393

6. Steady State Vapor Bubble in Pool Boiling
Topic: Characterization, Nanometrology, and Nanoscale Measurements
Published: 2/3/2016
Authors: An Zou, Ashish Chanana, Amit Kumar Agrawal, Peter C. Wayner, Jr., Shalabh C. Maroo
Abstract: Boiling, a dynamic and multiscale process, has been studied for over five decades; however, a comprehensive understanding of the process is still lacking. The bubble ebullition cycle, which involves nucleation, growth and departure, happens over ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=918948

7. Characterization of nanoparticle suspensions using single particle inductively coupled plasma mass spectrometry
Series: Special Publication (NIST SP)
Report Number: 1200-21
Topic: Characterization, Nanometrology, and Nanoscale Measurements
Published: 1/8/2016
Authors: Karen E Murphy, Jingyu Liu, Antonio Rafael Montoro Bustos, Monique Erica Johnson, Michael R Winchester
Abstract: This NIST special publication (SP) is one in a series of NIST SPs that address research needs articulated in the National Nanotechnology Initiative (NNI) Environmental, Health, and Safety Research Strategy published in 2011 [1]. This Strategy identif ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=919428

8. Subsurface Imaging of Ungrounded Metal Lines Embedded in Dielectric with the Scanning Microwave Microscope
Topic: Characterization, Nanometrology, and Nanoscale Measurements
Published: 12/17/2015
Authors: Lin You, Jungjoon Ahn, Yaw S Obeng, Joseph J Kopanski
Abstract: We demonstrate the ability of the scanning microwave microscope (SMM) to measure the subsurface location of ungrounded. 1.2-μm wide metal lines embedded in a dielectric film. The SMM was used to image Al-Si-Cu metal lines in a test chip that wer ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=916157

9. Radiative damping in wave guide based FMR measured via analysis of perpendicular standing spin waves in sputtered Permalloy films
Topic: Characterization, Nanometrology, and Nanoscale Measurements
Published: 11/17/2015
Authors: Thomas J Silva, Justin M Shaw, Hans Toya Nembach, Mathias Weiler, Martin Schoen
Abstract: The damping α of the spinwave resonances in 75 nm, 120 nm, and 200 nm -thick Permalloy films is measured via vector-network- analyzer ferromagnetic-resonance (VNA-FMR). Inductive coupling between the sample and the waveguide leads to an addition ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=919208

10. Deep-subwavelength Nanometric Image Reconstruction using Fourier Domain Optical Normalization
Topic: Characterization, Nanometrology, and Nanoscale Measurements
Published: 11/5/2015
Authors: Jing Qin, Richard M Silver, Bryan M Barnes, Hui Zhou, Ronald G Dixson, Mark Alexander Henn
Abstract: Quantitative optical measurements of deep sub-wavelength, three-dimensional, nanometric structures with sensitivity to sub-nanometer details address an ubiquitous measurement challenge. A Fourier domain normalization approach is used in the Fourier ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=914423



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