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Topic Area: Advanced Materials

Displaying records 41 to 50 of 59 records.
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41. Challenges and Opportunities of Organic Electronics
Topic: Advanced Materials
Published: 4/2/2010
Author: Calvin Chan
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=905387

42. Organic Electronics: Challenges and Opportunities
Topic: Advanced Materials
Published: 3/31/2010
Author: Calvin Chan
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=905389

43. Harnessing Wrinkle Delamination Mechanics to Measure and Pattern Polymer Coatings
Topic: Advanced Materials
Published: 3/21/2010
Authors: Adam J. Nolte, Jun Y. Chung, Christopher M Stafford
Abstract: Compressive stresses in stiff polymer coatings can give rise to surface instabilities in which the coating adopts a sinusoidally wrinkled morphology with a dominant wavelength, d, as displayed in Figure 1a. Such instabilities are generally observed ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=904141

44. Measuring the viscoelastic properties of confined polymer films by thermal wrinkling
Topic: Advanced Materials
Published: 3/21/2010
Authors: Edwin P Chan, Kirt Anthony Page, Christopher M Stafford
Abstract: We demonstrate that thermal wrinkling can be utilized to measure the rubbery modulus and shear viscosity of polystyrene (PS) thin films as a function of temperature. Specifically, we use surface laser-light scattering (SLS) to characterize the wrinkl ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=904142

45. Spray Deposited Poly-3-hexylthiophene Thin Film Transistors
Topic: Advanced Materials
Published: 12/11/2009
Authors: Calvin Chan, Lee J Richter, David Germack, Brad Conrad, Daniel A Fischer, Dean M DeLongchamp, David J Gundlach
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=905385

46. Generation of Monolayer Gradients in Surface Energy and Chemistry for Block Copolymer Thin Film Studies
Topic: Advanced Materials
Published: 12/1/2009
Authors: Julie N. L. Albert, Michael J. Baney, Christopher M Stafford, Jennifer Y. Kelly, Thomas H Epps
Abstract: We utilize an innovative vapor deposition set-up and cross-diffusion of functionalized chlorosilanes under dynamic vacuum to generate a linear gradient in surface energy and composition on a silicon substrate. The gradient can be tuned by manipulati ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=902680

47. Inter-Laboratory Comparisons of NbTi Critical Current Measurements
Topic: Advanced Materials
Published: 6/22/2009
Authors: Arno Godeke, D. Turrioni, T. Boutboul, Najib Cheggour, A. K. Ghosh, Loren F Goodrich, M Meinesz, A. den Ouden
Abstract: We report on a multi-institute comparison of critical current data, measured on a modern Large Hadron Collider (LHC) NbTi wire that has shown a standard deviation below 1% in critical current density spread in more than 1500 measurements. Inter-labor ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=900166

48. Internal tin Nb3Sn conductors engineered for fusion and particle accelerator applications
Topic: Advanced Materials
Published: 6/22/2009
Authors: Jeffrey Parrell, Y. Zhang, Michael Field, M Meinesz, Yonghua Huang, H Miao, Seungok Hong, Najib Cheggour, Loren F Goodrich
Abstract: The critical current density (Jc) of Nb3Sn strand has been significantly improved over the last several years. For most magnet applications, high Jc internal tin has displaced bronze process strand. The highest Jc values are obtained from distributed ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=900165

49. Test Results of the First US ITER TF Conductor in SULTAN
Topic: Advanced Materials
Published: 6/22/2009
Authors: Nicolai N. Martovetsky, Daniel R. Hatfield, John R. Miller, Chen-yu Gung, Joel S. Schultz, Najib Cheggour, Loren F Goodrich, Pierluigi Bruzzone, Boris Stepanov, Rainer Wesche, Bernd Seeber
Abstract: The US Domestic Agency is one of six parties supplying TF cable-in-conduit conductors (CICCs) for ITER. Previous tests have shown that measured performance of the TF CICCs can be much lower than expected from the strand properties at the projected un ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=900251

50. Nanoimprint Lithography for the Direct Patterning of Nanoporous Interlayer Dielectric Insulator Materials
Topic: Advanced Materials
Published: 3/28/2008
Authors: Hyun Wook Ro, Hae-Jeong Lee, Eric K Lin, Alamgir Karim, Daniel R. Hines, Do Y. Yoon, Christopher L Soles
Abstract: Directly patterning dielectric insulator materials for semiconductor devices via nanoimprint lithography has the potential to simplify fabrication processes and reduce manufacturing costs. However, the prospect of mechanically forming these material ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=852733