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Displaying records 71 to 80 of 81 records.
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71. The Nanomechanical Properties of Thin Film of Type I Collagen Fibrils
Topic: Nanomanufacturing
Published: 3/2/2010
Authors: Koo-Hyun Chung, Kiran Bhadriraju, Tighe Spurlin, Robert Francis Cook, Anne L Plant
Abstract: Cells sense and respond to the mechanical properties of the substrate to which they adhere. Matrices composed of collagen have been an important experimental system to study cell responses to the stiffness of the extracellular matrix. We had previo ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=824709

72. The New Steel? Enabling the Carbon Nanomaterials Revolution: Markets, Metrology, Safety, and Scale-up
Series: Special Publication (NIST SP)
Report Number: 6203-1
Topic: Nanomanufacturing
Published: 8/31/2011
Author: James Alexander Liddle
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=908990

73. The effect of growth orientation and diameter on the elasticity of GaN Nanowires - a combined insitu TEM and atomistic modeling investigation
Topic: Nanomanufacturing
Published: 12/20/2010
Authors: Kristine A Bertness, Norman A Sanford, Albert Davydov
Abstract: We characterized the elastic properties of GaN nanowires grown along different crystallographic orientations. In situ transmission electron microscopy tensile tests were conducted using a MEMS-based nanoscale testing system. Complementary atomistic s ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=906878

74. Three-dimensional deep sub-wavelength defect detection using (lambda) = 193 nm optical microscopy
Topic: Nanomanufacturing
Published: 10/25/2013
Authors: Bryan M Barnes, Martin Y Sohn, Francois R. Goasmat, Hui H. Zhou, Andras Vladar, Richard M Silver, Abraham Arceo
Abstract: Identifying defects in photolithographic patterning is a persistent challenge in semiconductor manufacturing. Well-established optical methods in current use are jeopardized by upcoming sub-20 nm device dimensions. Volumetric processing of focus-reso ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=914244

75. Through-focus scanning optical microscope imaging method for nano-scale dimensional analysis
Topic: Nanomanufacturing
Published: 9/1/2008
Authors: Ravikiran Attota, Richard M Silver
Abstract: We present a novel optical technique that produces nanometer dimensional measurement sensitivity using a conventional bright-field optical microscope, by analyzing two-dimensional through-focus scanning optical microscope (TSOM) images constructed us ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=824668

76. Time-resolved surface infrared spectroscopy during atomic layer deposition of TiO2 using tetrakis(dimethylamido)titanium and water
Topic: Nanomanufacturing
Published: 4/23/2014
Authors: Brent A Sperling, John Hoang, William Andrew Kimes, James E Maslar, Kristen L Steffens, Nhan V Nguyen
Abstract: Atomic layer deposition of titanium dioxide using tetrakis(dimethylamido)titanium (TDMAT) and water vapor is studied by reflection-absorption infrared spectroscopy (RAIRS) with a time resolution of 120 ms. Decomposition of the adsorbed TDMAT is ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=915032

77. Towards Accurate Feature Shape Metrology
Topic: Nanomanufacturing
Published: 3/22/2008
Authors: Ndubuisi George Orji, Ronald G Dixson, B Bunday, J Allgair
Abstract: Over the last few years, the need for shape metrology for process control has increased. A key component of shape metrology is sidewall angle (SWA). However, few instruments measure SWA directly. The critical dimension atomic force microscope (CD-AFM ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=824629

78. Traceable Calibration of a Critical Dimension Atomic Force Microscope
Topic: Nanomanufacturing
Published: 3/9/2012
Authors: Ronald G Dixson, Ndubuisi George Orji, Craig Dyer McGray, John E Bonevich, Jon C Geist
Abstract: The National Institute of Standards and Technology (NIST) has a multifaceted program in atomic force microscope (AFM) dimensional metrology. One component of this program, and the focus of this paper, is the use of critical dimension atomic force ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=908943

79. Traceable Calibration of a Critical Dimension Atomic Force Microscope
Topic: Nanomanufacturing
Published: 6/6/2011
Authors: Ronald G Dixson, Ndubuisi George Orji, Craig Dyer McGray, Jon C Geist
Abstract: The National Institute of Standards and Technology (NIST) has a multifaceted program in atomic force microscope (AFM) dimensional metrology. One component of this effort is a custom in-house metrology AFM, called the calibrated AFM (C-AFM). The NI ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=908552

80. Understanding Imaging and Metrology with the Helium Ion Microscope
Topic: Nanomanufacturing
Published: 3/1/2009
Authors: Michael T Postek, Andras Vladar, Bin Ming
Abstract: The development of accurate metrology for the characterization of nanomaterials is one barrier to innovation confronting all phases of nanotechnology. Ultra-high resolution microscopy is a key technology needed to achieve this goal. But, current micr ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=902394



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