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You searched on: Topic Area: Nanomanufacturing Sorted by: title

Displaying records 31 to 38.
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31. Preface, Introduction and Chapter 11 to appear in the book Control from MEMS to Atoms
Topic: Nanomanufacturing
Published: 12/31/2012
Authors: Jason John Gorman, Benjamin Shapiro
Abstract: Preface Abstract: This is the preface of the book. No abstract is available. Introduction Abstract: The goal of this book is to show how control systems can be successfully applied to applications in micro- and nanosystems, to explore the wide v ...

32. Re-calibration of the NIST SRM 2059 Master Standard using Traceable Atomic Force Microscope Metrology
Topic: Nanomanufacturing
Published: 10/17/2008
Authors: Ronald G Dixson, James Edward Potzick, Ndubuisi George Orji
Abstract: The National Institute of Standards and Technology (NIST) has had a robust program in photomask dimensional metrology since the late 70s when the late Diana Nyyssonen and coworkers developed the first chrome-on-glass (COG) Standard Reference Materi ...

33. Simulated SEM Images for Resolution Measurement
Topic: Nanomanufacturing
Published: 7/30/2008
Authors: Petr Cizmar, Andras Vladar, Bin Ming, Michael T Postek
Abstract: Resolution is a key performance metric, which often defines the quality of a scanning electron microscope (SEM). Traditionally, there is the subjective measurement of the distance between two points on special ''resolution'' samples and there are sev ...

34. Size-independent effects on nanoparticle retention behavior in asymmetric flow field-flow fractionation
Topic: Nanomanufacturing
Published: 5/29/2013
Authors: Julien C. Gigault, Vincent A Hackley
Abstract: In this work we highlight the size-independent influence of the material properties of nanoparticles on their retention behavior in asymmetric-flow field-flow fractionation (A4F). The phenomena described here suggest there are limits to the effec ...

35. Strategies for Nanoscale Contour Metrology using Critical Dimension Atomic Force Microscopy
Topic: Nanomanufacturing
Published: 9/30/2011
Authors: Ndubuisi George Orji, Ronald G Dixson, Andras Vladar, Michael T Postek
Abstract: Contour metrology is one of the techniques used to verify optical proximity correction (OPC) in lithography models. The use of these methods, which are known as resolution enhancement techniques (RET), are necessitated by the continued decrease in f ...

36. Three-dimensional deep sub-wavelength defect detection using (lambda) = 193 nm optical microscopy
Topic: Nanomanufacturing
Published: 10/25/2013
Authors: Bryan M Barnes, Martin Y Sohn, Francois R. Goasmat, Hui Zhou, Andras Vladar, Richard M Silver, Abraham Arceo
Abstract: Identifying defects in photolithographic patterning is a persistent challenge in semiconductor manufacturing. Well-established optical methods in current use are jeopardized by upcoming sub-20 nm device dimensions. Volumetric processing of focus-reso ...

37. Through-focus scanning optical microscope imaging method for nano-scale dimensional analysis
Topic: Nanomanufacturing
Published: 9/1/2008
Authors: Ravikiran Attota, Richard M Silver
Abstract: We present a novel optical technique that produces nanometer dimensional measurement sensitivity using a conventional bright-field optical microscope, by analyzing two-dimensional through-focus scanning optical microscope (TSOM) images constructed us ...

38. Towards Accurate Feature Shape Metrology
Topic: Nanomanufacturing
Published: 3/22/2008
Authors: Ndubuisi George Orji, Ronald G Dixson, B Bunday, J Allgair
Abstract: Over the last few years, the need for shape metrology for process control has increased. A key component of shape metrology is sidewall angle (SWA). However, few instruments measure SWA directly. The critical dimension atomic force microscope (CD-AFM ...

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