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Topic Area: Nanomanufacturing
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Displaying records 61 to 70 of 75 records.
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61. Reducing Thermal Noise in Molecular Force Spectroscopy
Topic: Nanomanufacturing
Published: 6/2/2008
Author: Gordon Allan Shaw
Abstract: Molecular force spectroscopy is the practice of testing the mechanical properties of single molecules.  The precision determination of these properties requires an instrument capable of piconewton-level force measurement.  The atomic force ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=824638

62. Review of Current Progress in Nanometrology with Helium Ions
Topic: Nanomanufacturing
Published: 9/19/2011
Authors: Michael T Postek, Andras Vladar, Bin Ming, Charles Archie
Abstract: Scanning electron microscopy has been employed as an imaging and measurement tool for more than 50 years and it continues as a primary tool in many research and manufacturing facilities across the world. A new challenger to this work is the helium ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=905541

63. Simulated SEM Images for Resolution Measurement
Topic: Nanomanufacturing
Published: 7/30/2008
Authors: Petr Cizmar, Andras Vladar, Bin Ming, Michael T Postek
Abstract: Resolution is a key performance metric, which often defines the quality of a scanning electron microscope (SEM). Traditionally, there is the subjective measurement of the distance between two points on special ''resolution'' samples and there are sev ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=823050

64. Size-independent effects on nanoparticle retention behavior in asymmetric flow field-flow fractionation
Topic: Nanomanufacturing
Published: 5/29/2013
Authors: Julien C. Gigault, Vincent A Hackley
Abstract: In this work we highlight the size-independent influence of the material properties of nanoparticles on their retention behavior in asymmetric-flow field-flow fractionation (A4F). The phenomena described here suggest there are limits to the effec ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=913433

65. Strategies for Nanoscale Contour Metrology using Critical Dimension Atomic Force Microscopy
Topic: Nanomanufacturing
Published: 9/30/2011
Authors: Ndubuisi George Orji, Ronald G Dixson, Andras Vladar, Michael T Postek
Abstract: Contour metrology is one of the techniques used to verify optical proximity correction (OPC) in lithography models. The use of these methods, which are known as resolution enhancement techniques (RET), are necessitated by the continued decrease in f ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=909559

66. The Nanomechanical Properties of Thin Film of Type I Collagen Fibrils
Topic: Nanomanufacturing
Published: 3/2/2010
Authors: Koo-Hyun Chung, Kiran Bhadriraju, Tighe Spurlin, Robert Francis Cook, Anne L Plant
Abstract: Cells sense and respond to the mechanical properties of the substrate to which they adhere. Matrices composed of collagen have been an important experimental system to study cell responses to the stiffness of the extracellular matrix. We had previo ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=824709

67. The New Steel? Enabling the Carbon Nanomaterials Revolution: Markets, Metrology, Safety, and Scale-up
Series: Special Publication (NIST SP)
Report Number: 6203-1
Topic: Nanomanufacturing
Published: 8/31/2011
Author: James Alexander Liddle
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=908990

68. The effect of growth orientation and diameter on the elasticity of GaN Nanowires - a combined insitu TEM and atomistic modeling investigation
Topic: Nanomanufacturing
Published: 12/20/2010
Authors: Kristine A Bertness, Norman A Sanford, Albert Davydov
Abstract: We characterized the elastic properties of GaN nanowires grown along different crystallographic orientations. In situ transmission electron microscopy tensile tests were conducted using a MEMS-based nanoscale testing system. Complementary atomistic s ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=906878

69. Three-dimensional deep sub-wavelength defect detection using (lambda) = 193 nm optical microscopy
Topic: Nanomanufacturing
Published: 10/25/2013
Authors: Bryan M Barnes, Martin Y Sohn, Francois R. Goasmat, Hui Zhou, Andras Vladar, Richard M Silver, Abraham Arceo
Abstract: Identifying defects in photolithographic patterning is a persistent challenge in semiconductor manufacturing. Well-established optical methods in current use are jeopardized by upcoming sub-20 nm device dimensions. Volumetric processing of focus-reso ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=914244

70. Through-focus scanning optical microscope imaging method for nano-scale dimensional analysis
Topic: Nanomanufacturing
Published: 9/1/2008
Authors: Ravikiran Attota, Richard M Silver
Abstract: We present a novel optical technique that produces nanometer dimensional measurement sensitivity using a conventional bright-field optical microscope, by analyzing two-dimensional through-focus scanning optical microscope (TSOM) images constructed us ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=824668



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