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Topic Area: Nanomanufacturing
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Displaying records 51 to 60 of 77 records.
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51. New Method for the Measurement of SEM Stage Vibrations
Topic: Nanomanufacturing
Published: 2/1/2004
Authors: Bradley N Damazo, Crossley E Jayewardene, Andras Vladar, William J. Keery, Michael T Postek
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=823322

52. Noncontact measurement of charge carrier lifetime and mobility in GaN nanowires
Topic: Nanomanufacturing
Published: 8/27/2012
Authors: Christopher M. Dodson, Patrick Parkinson, Kristine A Bertness, Hannah J Joyce, Laura M Herz, Norman A Sanford, Michael B Johnston
Abstract: The first noncontact photoconductivity measurements of gallium nitride nanowires (NWs) are presented, revealing a high crystallographic and optoelectronic quality achieved by use of catalyst-free molecular beam epitaxy. In comparison with bulk ma ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=911320

53. O2 A-band line parameters to support atmospheric remote sensing. Part II: The rare isotopologues
Topic: Nanomanufacturing
Published: 7/21/2011
Authors: Joseph Terence Hodges, David A Long, Daniel K Havey, S. S. Yu, M Okumura, Charles E Miller
Abstract: Frequency-stabilized cavity ring-down spectroscopy (FS-CRDS) was employed to measure over 100 transitions in the R-branch of the b1Σg+←X3Σg-(0,0) band for the rare O2 isotopologues. The use of 17O- and 18O-enriched mixtures allowed fo ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=907932

54. OPTIMIZING GAUSSIAN FILTER LONG WAVELENGTH CUTOFF »c FOR IMPROVING 3D BALLISTICS SIGNATURE CORRELATIONS
Topic: Nanomanufacturing
Published: 10/19/2008
Authors: Jun-Feng Song, Li Ma, Theodore Vincent Vorburger, Susan M Ballou
Abstract: In the ballistics measurements and correlations, optimum selection of c has particular importance for an unambiguous extraction of Individual Characteristics from the Class Characteristics . Poorly selected c might result in the Class Character ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=824686

55. On CD-AFM bias related to probe bending
Topic: Nanomanufacturing
Published: 4/9/2012
Authors: Vladimir A Ukraintsev, Ndubuisi George Orji, Theodore Vincent Vorburger, Ronald G Dixson, Joseph Fu, Richard M Silver
Abstract: Critical Dimension AFM (CD-AFM) is a widely used reference metrology. To characterize modern semiconductor devices, very small and flexible probes, often 15 nm to 20 nm in diameter, are now frequently used. Several recent publications have reported ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=910903

56. Optical Flatness Metrology for 300 mm Silicon Wafers
Topic: Nanomanufacturing
Published: 4/1/2005
Authors: Ulf Griesmann, Quandou Wang, T D Raymond
Abstract: At the National Institute of Standards and Technology (NIST), we are developing two interferometric methods for measuring the thickness variation and flatness of free-standing and chucked silicon wafers with diameters up to 300mm. The eXtremely accu ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=822272

57. Optical Through-Focus Technique that Differentiates Small Changes in Line Width, Line Height and Sidewall Angle for CD, Overlay, and Defect Metrology Applications
Topic: Nanomanufacturing
Published: 4/16/2008
Authors: Ravikiran (Ravikiran) Attota, Richard M Silver, Bryan M Barnes
Abstract: We present a new optical technique for dimensional analysis of sub 100 nm sized targets by analyzing through-focus images obtained using a conventional bright-field optical microscope.  We present a method to create through-focus image maps (TFIM) us ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=824634

58. Optimization of Dispersion and Surface Pretreatment for Single GaN Nanowire Devices
Topic: Nanomanufacturing
Published: 9/28/2012
Authors: Norman A Sanford, Kristine A Bertness, Andrew M. Herrero
Abstract: The correlation of residual contamination with void formation at the contact/SiO2 interface for single GaN NW devices was investigated. The morphology at the metal/SiO2 interface was observed by removing the annealed Ni/Au films from the SiO2 with ca ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=911627

59. Preface, Introduction and Chapter 11 to appear in the book Control from MEMS to Atoms
Topic: Nanomanufacturing
Published: 12/31/2012
Authors: Jason John Gorman, Benjamin Shapiro
Abstract: Preface Abstract: This is the preface of the book. No abstract is available. Introduction Abstract: The goal of this book is to show how control systems can be successfully applied to applications in micro- and nanosystems, to explore the wide v ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=907965

60. Probe-Based Micro-Scale Manipulation and Assembly Using Force Feedback
Topic: Nanomanufacturing
Published: 6/26/2006
Authors: Jason John Gorman, Nicholas G Dagalakis
Abstract: Repeatable manipulation and assembly of micro-scale components is a critical capability for future developments in opto-electronics, hybrid microelectromechanical systems, and the integration of nano-scale devices into larger systems. This paper focu ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=822694



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