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You searched on: Topic Area: Nanomanufacturing Sorted by: title

Displaying records 31 to 40 of 41 records.
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31. Orthogonal Analysis of Functional Gold Nanoparticles for Biomedical Applications
Topic: Nanomanufacturing
Published: 9/11/2015
Authors: De-Hao D. Tsai, Yi-Fu Lu, Frank W DelRio, Tae Joon Cho, Suvajyoti S. Guha, Michael Russel Zachariah, Fan Zhang, Andrew John Allen, Vincent A Hackley
Abstract: We report a comprehensive strategy based on implementation of orthogonal measurement techniques to provide critical and verifiable material characteristics for functionalized gold nanoparticles (AuNPs) used in biomedical applications. Thiolated polye ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=918793

32. PDH-locked, frequency-stabilized cavity ring-down spectrometer
Topic: Nanomanufacturing
Published: 6/16/2011
Authors: Joseph Terence Hodges, A. Cygan, Piotr Maslowski, Katarzyna Ewelina Bielska, S. Wojtewicz, J. Domyslawska, H Abe, R.S. Trawinski, R. Ciurylo
Abstract: We describe a high sensitivity and high spectral resolution laser absorption spectrometer based upon the frequency-stabilized cavity ring-down spectroscopy (FS-CRDS) technique. We used the Pound-Drever-Hall (PDH) method to lock the probe laser to th ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=907960

33. Preface, Introduction and Chapter 11 to appear in the book Control from MEMS to Atoms
Topic: Nanomanufacturing
Published: 12/31/2012
Authors: Jason John Gorman, Benjamin Shapiro
Abstract: Preface Abstract: This is the preface of the book. No abstract is available. Introduction Abstract: The goal of this book is to show how control systems can be successfully applied to applications in micro- and nanosystems, to explore the wide v ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=907965

34. Rapid Prototyping of Nanofluidic Slits in a Silicone Bilayer
Topic: Nanomanufacturing
Published: 11/17/2015
Authors: Thomas Pedicino Kole, Kuo-Tang Liao, Daniel Robert Paul Schiffels, Bojan R Ilic, Elizabeth A Strychalski, Jason G Kralj, James Alexander Liddle, Anatoly Dritschilo, Samuel M Stavis
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=918788

35. Re-calibration of the NIST SRM 2059 Master Standard using Traceable Atomic Force Microscope Metrology
Topic: Nanomanufacturing
Published: 10/17/2008
Authors: Ronald G Dixson, James Edward Potzick, Ndubuisi George Orji
Abstract: The National Institute of Standards and Technology (NIST) has had a robust program in photomask dimensional metrology since the late 70s when the late Diana Nyyssonen and coworkers developed the first chrome-on-glass (COG) Standard Reference Materi ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=824724

36. Simulated SEM Images for Resolution Measurement
Topic: Nanomanufacturing
Published: 7/30/2008
Authors: Petr Cizmar, Andras Vladar, Bin Ming, Michael T Postek
Abstract: Resolution is a key performance metric, which often defines the quality of a scanning electron microscope (SEM). Traditionally, there is the subjective measurement of the distance between two points on special ''resolution'' samples and there are sev ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=823050

37. Size-independent effects on nanoparticle retention behavior in asymmetric flow field-flow fractionation
Topic: Nanomanufacturing
Published: 5/29/2013
Authors: Julien C. Gigault, Vincent A Hackley
Abstract: In this work we highlight the size-independent influence of the material properties of nanoparticles on their retention behavior in asymmetric-flow field-flow fractionation (A4F). The phenomena described here suggest there are limits to the effec ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=913433

38. Strategies for Nanoscale Contour Metrology using Critical Dimension Atomic Force Microscopy
Topic: Nanomanufacturing
Published: 9/30/2011
Authors: Ndubuisi George Orji, Ronald G Dixson, Andras Vladar, Michael T Postek
Abstract: Contour metrology is one of the techniques used to verify optical proximity correction (OPC) in lithography models. The use of these methods, which are known as resolution enhancement techniques (RET), are necessitated by the continued decrease in f ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=909559

39. Three-dimensional deep sub-wavelength defect detection using (lambda) = 193 nm optical microscopy
Topic: Nanomanufacturing
Published: 10/25/2013
Authors: Bryan M Barnes, Martin Y Sohn, Francois R. Goasmat, Hui Zhou, Andras Vladar, Richard M Silver, Abraham Arceo
Abstract: Identifying defects in photolithographic patterning is a persistent challenge in semiconductor manufacturing. Well-established optical methods in current use are jeopardized by upcoming sub-20 nm device dimensions. Volumetric processing of focus-reso ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=914244

40. Through-focus scanning optical microscope imaging method for nano-scale dimensional analysis
Topic: Nanomanufacturing
Published: 9/1/2008
Authors: Ravikiran Attota, Richard M Silver
Abstract: We present a novel optical technique that produces nanometer dimensional measurement sensitivity using a conventional bright-field optical microscope, by analyzing two-dimensional through-focus scanning optical microscope (TSOM) images constructed us ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=824668



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