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Displaying records 21 to 30 of 37 records.
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21. International photomask linewidth comparison by NIST and PTB
Topic: Nanomanufacturing
Published: 10/17/2008
Authors: James Edward Potzick, Ronald G Dixson, Richard Quintanilha, Michael T. Stocker, Andras Vladar, Egbert Buhr, Bernd Bodermann, Wolfgang Hassler-Grohne, Harald Bosse, C.G. Frase
Abstract: In preparation of the international Nano1 linewidth comparison on photomasks between 8 national metrology institutes, NIST and PTB have started a bilateral linewidth comparison in 2008, independent of and prior to the Nano1 comparison in order to tes ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=824713

22. Laser-assisted atom probe tomography of MBE grown GaN nanowire heterostructures
Topic: Nanomanufacturing
Published: 2/24/2014
Authors: Norman A Sanford, Paul Timothy Blanchard, Matthew David Brubaker, Kristine A Bertness, John B. Schlager, R Kirchofer, David R Diercks, Brian Gorman
Abstract: Laser-assisted atom probe tomography (L-APT) was performed on GaN nanowires (NWs) and axial GaN/InGaN nanowire heterostructures. All samples were grown by MBE on Si(111) substrates. The laser pulse energy (PE) at 355 nm used in L-APT analysis of Ga ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=914658

23. Measurement Traceability and Quality Assurance in a Nanomanufacturing Environment
Topic: Nanomanufacturing
Published: 9/25/2009
Authors: Ndubuisi George Orji, Ronald G Dixson, Aaron Cordes, Benjamin Bunday, John Allgair
Abstract: A key requirement for nano-manufacturing is maintaining acceptable traceability of measurements performed to determine size. Given that properties and functionality at the nanoscale are governed by absolute size, maintaining the traceability of dimen ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=903286

24. Measuring the Structure of Epitaxially Assembled Block Copolymer Domains with Soft X-ray Diffraction
Topic: Nanomanufacturing
Published: 11/30/2009
Authors: Gila Stein, James Alexander Liddle, Andrew Aquila, Eric M Gullikson
Abstract: The size, shape, and roughness of poly(styrene-b-methyl methacrylate) block copolymer domains assembled on an epitaxial template are characterized with soft x-ray diffraction. The domain size and shape are deformed when the dimensions of the epitax ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=903155

25. NIST's Logistics Integration Solutions
Series: Letter Circular
Topic: Nanomanufacturing
Published: 9/1/2004
Author: Sharon J. Kemmerer
Abstract: The NIST Manufacturing Interoperability Program staff has years of experience developing standards, validating solutions, and providing interoperability results in the field of manufacturing. Building on this experience, NIST can: (1) Work with indu ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=822197

26. Noncontact measurement of charge carrier lifetime and mobility in GaN nanowires
Topic: Nanomanufacturing
Published: 8/27/2012
Authors: Christopher M. Dodson, Patrick Parkinson, Kristine A Bertness, Hannah J Joyce, Laura M Herz, Norman A Sanford, Michael B Johnston
Abstract: The first noncontact photoconductivity measurements of gallium nitride nanowires (NWs) are presented, revealing a high crystallographic and optoelectronic quality achieved by use of catalyst-free molecular beam epitaxy. In comparison with bulk ma ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=911320

27. O2 A-band line parameters to support atmospheric remote sensing. Part II: The rare isotopologues
Topic: Nanomanufacturing
Published: 7/21/2011
Authors: Joseph Terence Hodges, David A Long, Daniel K Havey, S. S. Yu, M Okumura, Charles E Miller
Abstract: Frequency-stabilized cavity ring-down spectroscopy (FS-CRDS) was employed to measure over 100 transitions in the R-branch of the b1Σg+←X3Σg-(0,0) band for the rare O2 isotopologues. The use of 17O- and 18O-enriched mixtures allowed fo ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=907932

28. OPTIMIZING GAUSSIAN FILTER LONG WAVELENGTH CUTOFF »c FOR IMPROVING 3D BALLISTICS SIGNATURE CORRELATIONS
Topic: Nanomanufacturing
Published: 10/19/2008
Authors: Jun-Feng Song, Li Ma, Theodore Vincent Vorburger, Susan M Ballou
Abstract: In the ballistics measurements and correlations, optimum selection of c has particular importance for an unambiguous extraction of Individual Characteristics from the Class Characteristics . Poorly selected c might result in the Class Character ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=824686

29. Optical Through-Focus Technique that Differentiates Small Changes in Line Width, Line Height and Sidewall Angle for CD, Overlay, and Defect Metrology Applications
Topic: Nanomanufacturing
Published: 4/16/2008
Authors: Ravikiran Attota, Richard M Silver, Bryan M Barnes
Abstract: We present a new optical technique for dimensional analysis of sub 100 nm sized targets by analyzing through-focus images obtained using a conventional bright-field optical microscope.  We present a method to create through-focus image maps (TFIM) us ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=824634

30. Preface, Introduction and Chapter 11 to appear in the book Control from MEMS to Atoms
Topic: Nanomanufacturing
Published: 12/31/2012
Authors: Jason John Gorman, Benjamin Shapiro
Abstract: Preface Abstract: This is the preface of the book. No abstract is available. Introduction Abstract: The goal of this book is to show how control systems can be successfully applied to applications in micro- and nanosystems, to explore the wide v ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=907965



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