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Topic Area: Nanomanufacturing
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11. Catalyst-free GaN Nanowires as Nanoscale Light Emitters
Topic: Nanomanufacturing
Published: Date unknown
Authors: Kristine A Bertness, Norman A Sanford, John B Schlager, Alexana Roshko, Todd E Harvey, Paul Timothy Blanchard, Matthew David Brubaker, Andrew M. Herrero, Aric Warner Sanders
Abstract: Catalyst-free growth of GaN nanowires with molecular beam epitaxy produces material of exceptionally high quality with long minority carrier lifetimes and low surface recombination velocity. The nanowires grow by thermodynamic driving forces that enh ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=910889

12. Cellulose Nanocrystals the Next Big Nano-thing?
Topic: Nanomanufacturing
Published: 8/6/2008
Authors: Michael T Postek, Andras Vladar, John A. Dagata, Natalia Farkas, Bin Ming, Ronald Sabo, Theodore H Wegner
Abstract: Biomass surrounds us from the smallest alga to the largest redwood tree. Even the largest trees owe their strength to a newly-appreciated class of nanomaterials known as cellulose nanocrystals (CNC). Cellulose, the world s most abundant natural, rene ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=824683

13. Computational Models of the Nana Probe Tip for Static Behaviors (Abstract Only)
Topic: Nanomanufacturing
Published: 2/1/2007
Authors: Shaw C Feng, Theodore Vincent Vorburger, Che B. Joung, Joseph Fu, Ronald G Dixson, Li Ma
Abstract: As integrated circuits become smaller and faster, the measurement of line width must have less uncertainty and more versatility. The common requirement for uncertainty is less than 10 nanometers. The industrial need for versatility is three dimension ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=822658

14. Computational Models of the Nano Probe Tip for Static Behaviors
Topic: Nanomanufacturing
Published: 6/1/2007
Authors: Shaw C Feng, Theodore Vincent Vorburger, Che B. Joung, Li Ma
Abstract: As integrated circuits become smaller and faster, the measurement of line width must have less uncertainty and more versatility. The common requirement for uncertainty is less than 10 nanometers. The industrial need for versatility is three dimension ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=822327

15. Contactless Differential Conductivity Detection
Topic: Nanomanufacturing
Published: 10/12/2008
Authors: Gordon Allan Shaw, David J Ross, Steven Earl Fick, Wyatt N Vreeland
Abstract: We propose a new technique, contactless differential conductivity detection (CDCD,) to improve the detection limit of contactless conductivity detection for capillary and microchannel electrophoresis. By exploiting a 3-electrode differential configu ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=824689

16. Contour Metrology using Critical Dimension Atomic Force Microscopy
Topic: Nanomanufacturing
Published: 4/9/2012
Authors: Ndubuisi George Orji, Ronald G Dixson, Andras Vladar, Bin Ming, Michael T Postek
Abstract: The critical dimension atomic force microscope (CD-AFM), which is used as a reference instrument in lithography metrology, has been proposed as a supplemental instrument for contour measurement and verification. However, although data from CD-AFM is ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=910915

17. Control of MEMS Nanopositioners With Nano-Scale Resolution
Topic: Nanomanufacturing
Published: 11/10/2006
Authors: Jason John Gorman, Yong Sik Kim, Nicholas G Dagalakis
Abstract: Several approaches for the precision control of micro-scale positioning mechanisms, or MEMS nanopositioners, are presented along with initial experimental results which demonstrate nano-scale positioning resolution. The MEMS nanopositioners discussed ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=823602

18. Creating large out-of-plane displacement electrothermal motion stage by incorporating beams with step features
Topic: Nanomanufacturing
Published: 3/26/2013
Authors: Yong Sik Kim, Nicholas G Dagalakis, Satyandra K. Gupta
Abstract: Realizing out-of-plane actuation in micro-electro-mechanical systems (MEMS) is still a challenging task. In this paper, the design, fabrication methods and experimental results for a MEMS-based out-of-plane motion stage is presented based on bulk mic ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=913234

19. DNA Evolves
Topic: Nanomanufacturing
Published: 12/1/2012
Authors: James Alexander Liddle, Seung-Hyeon Ko
Abstract: None
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=912291

20. Damping mechanisms for precision applications in UHV environment
Topic: Nanomanufacturing
Published: 5/1/2006
Authors: Sumanth B. Chikkamaranahalli, R. R Vallance, Bradley N Damazo, Richard M Silver
Abstract: Surface analysis techniques such as scanning probe microscopy (SPM) have undergone significant advances and are attractive for application to electron and optical devices such as micro lenses, vacuum tubes, electron tubes, etc. For surface stability ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=822541