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Topic Area: Nanomanufacturing
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1. 2nd Annual Tri-National Workshop on Standards for Nanotechnology - (NIST presentations)
Topic: Nanomanufacturing
Published: 12/10/2008
Authors: Ronald G Dixson, Jon Robert Pratt, Vincent A Hackley, James Edward Potzick, Richard A Allen, Ndubuisi George Orji, Michael T Postek, Herbert S Bennett, Theodore Vincent Vorburger, Jeffrey A Fagan, Robert L. Watters
Abstract: A new era of cooperation between North American National Measurement Institutes (NMIs) was ushered by the National Research Council of Canada Institute for National Measurement Standards (NRC-INMS) on February 7, 2007 when the first Tri-National wo ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=824641

2. A COMPACT, COMPOUND ACTUATOR FOR THE MOLECULAR MEASURING MACHINE
Topic: Nanomanufacturing
Published: 10/19/2008
Authors: Jing Li, Yin-Lin Shen, Jaehwa Jeong, Fredric Scire, John A Kramar
Abstract: A compact, two-stage, vertical actuator with built-in sensors has been developed for the Molecular Measuring Machine (M3) and other potential precision instrumentation applications, such as scanning probe microscopy (SPM). In this article, we descri ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=824698

3. A Characterization of Probe Dynamic Behaviors in Critical Dimension Atomic Force Microscopy
Topic: Nanomanufacturing
Published: 3/17/2008
Authors: Shaw C Feng, Che B. Joung, Theodore Vincent Vorburger
Abstract: Critical Dimension (CD) Atomic Force Microscopy (AFM) is a primary means to measure the geometric shapes of walls and trenches on the nanometer scale in laboratories supporting the electronic industry. However, with CD-AFM, it is difficult to predict ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=824625

4. A Decade of Commitment from the NIST Manufacturing Engineering Laboratory to Nanomanufacturing and Nanometrology
Topic: Nanomanufacturing
Published: 8/27/2009
Authors: Kevin W Lyons, Michael T Postek
Abstract: Advanced research in nanomanufacturing technologies and processes has continued at an accelerating rate over the past decade. Profitable niche applications such as the use of carbon nanotubes for improving battery performance and nanoparticle-enhance ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=902648

5. AFM characterization of nanopositioner in-plane stiffnesses
Topic: Nanomanufacturing
Published: 8/19/2010
Authors: Seung Ho Yang, Yong Sik Kim, Premsagar Purushotham Kavuri, Jae Myung Yoo, Young M. Choi, Nicholas G Dagalakis
Abstract: A versatile method for measurement of in-plane stiffness of micro-elements was developed and its usefulness has been demonstrated. The in-plane stiffness of a NIST nanopositioner has been measured directly using a colloidal probe in an AFM without an ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=906223

6. Accuracy Considerations for Critical Dimension Semiconductor Metrology
Topic: Nanomanufacturing
Published: 9/9/2008
Authors: Ronald G Dixson, Ndubuisi George Orji, B Bunday, J Allgair
Abstract: As the size of integrated circuit features continues to decrease, the accuracy of measurements becomes more important. Due to greater emphasis on precision rather than accuracy, many of the measurements made in semiconductor fabs are not traceable to ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=824699

7. An Overview of Nano-Micro-Meso Scale Manufacturing at NIST
Topic: Nanomanufacturing
Published: 1/1/2000
Authors: E Clayton Teague, Jun-Feng Song, Bradley N Damazo, John Evans, Matthew A. Davies, Nicholas G Dagalakis
Abstract: The Manufacturing Engineering Laboratory (MEL) has a unique mission of discrete part manufacturing technology within the National Institute of Standards and Technology''s (NIST) mission of measurement, standards, data and infrastructure technology. S ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=821917

8. Atom probe tomography evaporation behavior of C-axis GaN nanowires: Crystallographic, stoichiometric, and detection efficiency aspects
Topic: Nanomanufacturing
Published: 11/13/2013
Authors: Norman A Sanford, David R Diercks, Brian Gorman, R Kirchofer, Kristine A Bertness, Matthew David Brubaker
Abstract: The field evaporation behavior of c-axis GaN nanowires was explored in two different laser-pulsed atom probe tomography (APT) instruments. Transmission electron microscopy imaging before and after atom probe tomography analysis was used to assist in ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=915760

9. Blind estimation of general tip shape in AFM imaging
Topic: Nanomanufacturing
Published: 12/1/2008
Authors: Fenglei Tian, Xiaoping Qian, John S Villarrubia
Abstract: The use of flared tip and bi-directional servo control in some recent atomic force microscopes (AFM) has made it possible for these advanced AFMs to image structures of general shapes with undercuts and reentrant surfaces. Since AFM images are distor ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=824643

10. Block-copolymer healing of simple defects in a chemoepitaxial template
Topic: Nanomanufacturing
Published: 4/11/2013
Authors: Paul Nathan Patrone, Gregg M. Gallatin
Abstract: Using a phase-field model of block copolymers (BCPs), we characterize how a chemoepitaxial template with parallel lines of arbitrary width affects the BCP microdomain shape. The model, which is an extension of the Leibler-Ohta-Kawasaki theory, accoun ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=913545



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