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Topic Area: Nanomanufacturing
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Displaying records 61 to 70 of 79 records.
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61. A Characterization of Probe Dynamic Behaviors in Critical Dimension Atomic Force Microscopy
Topic: Nanomanufacturing
Published: 3/17/2008
Authors: Shaw C Feng, Che B. Joung, Theodore Vincent Vorburger
Abstract: Critical Dimension (CD) Atomic Force Microscopy (AFM) is a primary means to measure the geometric shapes of walls and trenches on the nanometer scale in laboratories supporting the electronic industry. However, with CD-AFM, it is difficult to predict ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=824625

62. Integration, Interoperability, and Information Management: What are the Key Issues to Nanomanufacturing?
Topic: Nanomanufacturing
Published: 9/1/2007
Author: Kevin W Lyons
Abstract: Nanomanufacturing can be defined as all manufacturing activities that collectively support an approach to design, produce, control, modify, manipulate, and assemble nanometer scale objects and features for the purpose of fabricating a product or syst ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=822744

63. Computational Models of the Nano Probe Tip for Static Behaviors
Topic: Nanomanufacturing
Published: 6/1/2007
Authors: Shaw C Feng, Theodore Vincent Vorburger, Che B. Joung, Li Ma
Abstract: As integrated circuits become smaller and faster, the measurement of line width must have less uncertainty and more versatility. The common requirement for uncertainty is less than 10 nanometers. The industrial need for versatility is three dimension ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=822327

64. Computational Models of the Nana Probe Tip for Static Behaviors (Abstract Only)
Topic: Nanomanufacturing
Published: 2/1/2007
Authors: Shaw C Feng, Theodore Vincent Vorburger, Che B. Joung, Joseph Fu, Ronald G Dixson, Li Ma
Abstract: As integrated circuits become smaller and faster, the measurement of line width must have less uncertainty and more versatility. The common requirement for uncertainty is less than 10 nanometers. The industrial need for versatility is three dimension ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=822658

65. Manufacture and Metrology of 300 mm Silicon Wafers with Ultra-Low Thickness Variations
Report Number: 823030
Topic: Nanomanufacturing
Published: 1/2/2007
Authors: Ulf Griesmann, Quandou Wang, Marc Tricard, Paul Dumas, Christopher Hill
Abstract: With the evolution of exposure tools for optical lithography towards larger numerical apertures, the semiconductor industry expects continued demand for improved wafer flatness at the exposure site. The Allowable site flatness for 300 mm wafers is ex ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=823030

66. Control of MEMS Nanopositioners With Nano-Scale Resolution
Topic: Nanomanufacturing
Published: 11/10/2006
Authors: Jason John Gorman, Yong Sik Kim, Nicholas G Dagalakis
Abstract: Several approaches for the precision control of micro-scale positioning mechanisms, or MEMS nanopositioners, are presented along with initial experimental results which demonstrate nano-scale positioning resolution. The MEMS nanopositioners discussed ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=823602

67. Design of an On-Chip Micro-Scale Nanoassembly System
Topic: Nanomanufacturing
Published: 11/3/2006
Authors: Jason John Gorman, Yong Sik Kim, Andras Vladar, Nicholas G Dagalakis
Abstract: In this paper, the design and proposed operation of a MEMS-based nanoassembly system is presented. The nanoassembly system is comprised of four nanomanipulators that can work independently or cooperatively. The design of the nanomanipulators will be ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=823599

68. Probe-Based Micro-Scale Manipulation and Assembly Using Force Feedback
Topic: Nanomanufacturing
Published: 6/26/2006
Authors: Jason John Gorman, Nicholas G Dagalakis
Abstract: Repeatable manipulation and assembly of micro-scale components is a critical capability for future developments in opto-electronics, hybrid microelectromechanical systems, and the integration of nano-scale devices into larger systems. This paper focu ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=822694

69. Damping mechanisms for precision applications in UHV environment
Topic: Nanomanufacturing
Published: 5/1/2006
Authors: Sumanth B. Chikkamaranahalli, R. R Vallance, Bradley N Damazo, Richard M Silver
Abstract: Surface analysis techniques such as scanning probe microscopy (SPM) have undergone significant advances and are attractive for application to electron and optical devices such as micro lenses, vacuum tubes, electron tubes, etc. For surface stability ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=822541

70. Dynamic Modeling and Vibration Analysis of a UHV Scanning Tunneling
Topic: Nanomanufacturing
Published: 8/17/2005
Authors: Sumanth B. Chikkamaranahalli, R. R Vallance, Bradley N Damazo, Richard M Silver, James D Gilsinn
Abstract: Techniques based on scanning probe microscopy (SPM) are used to fabricate surface structures with dimensions ranging from 10 - 100mm. These structures have been fabricated and imaged using a scanning tunneling microscope (STM), and the STM requires ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=822269



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