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Topic Area: Nanomanufacturing
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Displaying records 61 to 70 of 73 records.
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61. Design of an On-Chip Micro-Scale Nanoassembly System
Topic: Nanomanufacturing
Published: 11/3/2006
Authors: Jason John Gorman, Yong Sik Kim, Andras Vladar, Nicholas G Dagalakis
Abstract: In this paper, the design and proposed operation of a MEMS-based nanoassembly system is presented. The nanoassembly system is comprised of four nanomanipulators that can work independently or cooperatively. The design of the nanomanipulators will be ...

62. Probe-Based Micro-Scale Manipulation and Assembly Using Force Feedback
Topic: Nanomanufacturing
Published: 6/26/2006
Authors: Jason John Gorman, Nicholas G Dagalakis
Abstract: Repeatable manipulation and assembly of micro-scale components is a critical capability for future developments in opto-electronics, hybrid microelectromechanical systems, and the integration of nano-scale devices into larger systems. This paper focu ...

63. Damping mechanisms for precision applications in UHV environment
Topic: Nanomanufacturing
Published: 5/1/2006
Authors: Sumanth B. Chikkamaranahalli, R. R Vallance, Bradley N Damazo, Richard M Silver
Abstract: Surface analysis techniques such as scanning probe microscopy (SPM) have undergone significant advances and are attractive for application to electron and optical devices such as micro lenses, vacuum tubes, electron tubes, etc. For surface stability ...

64. Dynamic Modeling and Vibration Analysis of a UHV Scanning Tunneling
Topic: Nanomanufacturing
Published: 8/17/2005
Authors: Sumanth B. Chikkamaranahalli, R. R Vallance, Bradley N Damazo, Richard M Silver, James D Gilsinn
Abstract: Techniques based on scanning probe microscopy (SPM) are used to fabricate surface structures with dimensions ranging from 10 - 100mm. These structures have been fabricated and imaged using a scanning tunneling microscope (STM), and the STM requires ...

65. Optical Flatness Metrology for 300 mm Silicon Wafers
Topic: Nanomanufacturing
Published: 4/1/2005
Authors: Ulf Griesmann, Quandou Wang, T D Raymond
Abstract: At the National Institute of Standards and Technology (NIST), we are developing two interferometric methods for measuring the thickness variation and flatness of free-standing and chucked silicon wafers with diameters up to 300mm. The eXtremely accu ...

66. NIST's Logistics Integration Solutions
Series: Letter Circular
Topic: Nanomanufacturing
Published: 9/1/2004
Author: Sharon J. Kemmerer
Abstract: The NIST Manufacturing Interoperability Program staff has years of experience developing standards, validating solutions, and providing interoperability results in the field of manufacturing. Building on this experience, NIST can: (1) Work with indu ...

67. Nano-Lithography in Ultra-High Vacuum (UHV) for Real World Applications
Topic: Nanomanufacturing
Published: 3/1/2004
Authors: James D Gilsinn, Hui Zhou, Bradley N Damazo, Joseph Fu, Richard M Silver
Abstract: As nano-lithography technology improves, more companies and research groups have the capability to create nano-scale structures. Scanning tunneling microscopes (STMs) are commonly used to create these structures and evaluate them afterward. One diffi ...

68. New Method for the Measurement of SEM Stage Vibrations
Topic: Nanomanufacturing
Published: 2/1/2004
Authors: Bradley N Damazo, Crossley E Jayewardene, Andras Vladar, William J. Keery, Michael T Postek

69. An Overview of Nano-Micro-Meso Scale Manufacturing at NIST
Topic: Nanomanufacturing
Published: 1/1/2000
Authors: E Clayton Teague, Jun-Feng Song, Bradley N Damazo, John Evans, Matthew A. Davies, Nicholas G Dagalakis
Abstract: The Manufacturing Engineering Laboratory (MEL) has a unique mission of discrete part manufacturing technology within the National Institute of Standards and Technology''s (NIST) mission of measurement, standards, data and infrastructure technology. S ...

70. Laser focusing of atoms for nanostructure fabrication
Topic: Nanomanufacturing
Published: 1/1/1996
Authors: J Mcclelland, Robert Celotta, Zeina Jabbour Kubarych, R Gupta
Abstract: Laser focusing of atoms has emerged as a viable form of nanofabrication. Structures are formed by focusing chromium atoms as they deposit onto a surface. The focusing occurs in a standing-wave laser field in one or two dimensions, resulting in arrays ...

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