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Topic Area: Nanomanufacturing
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Displaying records 51 to 60 of 76 records.
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51. Cellulose Nanocrystals the Next Big Nano-thing?
Topic: Nanomanufacturing
Published: 8/6/2008
Authors: Michael T Postek, Andras Vladar, John A. Dagata, Natalia Farkas, Bin Ming, Ronald Sabo, Theodore H Wegner
Abstract: Biomass surrounds us from the smallest alga to the largest redwood tree. Even the largest trees owe their strength to a newly-appreciated class of nanomaterials known as cellulose nanocrystals (CNC). Cellulose, the world s most abundant natural, rene ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=824683

52. Metrology at the Nanoscale: What are the Grand Challenges?
Topic: Nanomanufacturing
Published: 8/6/2008
Authors: Kevin W Lyons, Michael T Postek
Abstract: Nanometrology provides the means to measure and characterize nanometer scale process and product performance and covers an expanse of topics including instrumentation, measurement methods (off-line and in-process applications), and standards. To meet ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=824701

53. Simulated SEM Images for Resolution Measurement
Topic: Nanomanufacturing
Published: 7/30/2008
Authors: Petr Cizmar, Andras Vladar, Bin Ming, Michael T Postek
Abstract: Resolution is a key performance metric, which often defines the quality of a scanning electron microscope (SEM). Traditionally, there is the subjective measurement of the distance between two points on special ''resolution'' samples and there are sev ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=823050

54. High resolution full-field imaging of nanostructures using compact extreme ultraviolet lasers
Topic: Nanomanufacturing
Published: 7/21/2008
Authors: Norman A Sanford, F Brizuela, Kristine A Bertness
Abstract: Recent advances in the development of high peak brightness table-top extreme ultraviolet (EUV) and soft x-ray (SRX) lasers have opened new opportunities for the demonstration of compact full-field EUV/SXR microscopes capable of capturing images with ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=908697

55. Reducing Thermal Noise in Molecular Force Spectroscopy
Topic: Nanomanufacturing
Published: 6/2/2008
Author: Gordon Allan Shaw
Abstract: Molecular force spectroscopy is the practice of testing the mechanical properties of single molecules.  The precision determination of these properties requires an instrument capable of piconewton-level force measurement.  The atomic force ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=824638

56. Optical Through-Focus Technique that Differentiates Small Changes in Line Width, Line Height and Sidewall Angle for CD, Overlay, and Defect Metrology Applications
Topic: Nanomanufacturing
Published: 4/16/2008
Authors: Ravikiran (Ravikiran) Attota, Richard M Silver, Bryan M Barnes
Abstract: We present a new optical technique for dimensional analysis of sub 100 nm sized targets by analyzing through-focus images obtained using a conventional bright-field optical microscope.  We present a method to create through-focus image maps (TFIM) us ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=824634

57. Towards Accurate Feature Shape Metrology
Topic: Nanomanufacturing
Published: 3/22/2008
Authors: Ndubuisi G. (Ndubuisi George) Orji, Ronald G Dixson, B Bunday, J Allgair
Abstract: Over the last few years, the need for shape metrology for process control has increased. A key component of shape metrology is sidewall angle (SWA). However, few instruments measure SWA directly. The critical dimension atomic force microscope (CD-AFM ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=824629

58. A Characterization of Probe Dynamic Behaviors in Critical Dimension Atomic Force Microscopy
Topic: Nanomanufacturing
Published: 3/17/2008
Authors: Shaw C Feng, Che B. Joung, Theodore Vincent Vorburger
Abstract: Critical Dimension (CD) Atomic Force Microscopy (AFM) is a primary means to measure the geometric shapes of walls and trenches on the nanometer scale in laboratories supporting the electronic industry. However, with CD-AFM, it is difficult to predict ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=824625

59. Integration, Interoperability, and Information Management: What are the Key Issues to Nanomanufacturing?
Topic: Nanomanufacturing
Published: 9/1/2007
Author: Kevin W Lyons
Abstract: Nanomanufacturing can be defined as all manufacturing activities that collectively support an approach to design, produce, control, modify, manipulate, and assemble nanometer scale objects and features for the purpose of fabricating a product or syst ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=822744

60. Computational Models of the Nano Probe Tip for Static Behaviors
Topic: Nanomanufacturing
Published: 6/1/2007
Authors: Shaw C Feng, Theodore Vincent Vorburger, Che B. Joung, Li Ma
Abstract: As integrated circuits become smaller and faster, the measurement of line width must have less uncertainty and more versatility. The common requirement for uncertainty is less than 10 nanometers. The industrial need for versatility is three dimension ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=822327



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