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Topic Area: Nanomanufacturing
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Displaying records 1 to 10 of 79 records.
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1. Friction imprint effect in mechanically cleaved BaTiO3 (001)
Topic: Nanomanufacturing
Published: 9/28/2014
Authors: Christian John Long, Daniel Ebeling, Santiago D. Solares, Rachel J. Cannara
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=916209

2. Dielectric characterization by microwave cavity perturbation corrected for non-uniform fields
Topic: Nanomanufacturing
Published: 7/23/2014
Authors: Nathan Daniel Orloff, Jan Obrzut, Christian John Long, Thomas Fung Lam, James C Booth, David R Novotny, James Alexander Liddle, Pavel Kabos
Abstract: The non-uniform fields that occur due to the slot in the cavity through which the sample is inserted and those due to the sample geometry itself decrease the accuracy of dielectric characterization by cavity perturbation at microwave frequencies. ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=915011

3. Design of MEMS based three-axis motion stage by incorporating a nested structure
Topic: Nanomanufacturing
Published: 6/5/2014
Authors: Yong Sik Kim, Nicholas G Dagalakis, Satyandra K. Gupta
Abstract: A new design of three degrees-of-freedom (DOFs) translational motion stage (XYZ-stage) is presented in this paper. This XYZ-stage is based on Micro-electro-mechanical systems (MEMS) and designed by combining three existing 1-DOF motion stages through ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=915777

4. Time-resolved surface infrared spectroscopy during atomic layer deposition of TiO2 using tetrakis(dimethylamido)titanium and water
Topic: Nanomanufacturing
Published: 4/23/2014
Authors: Brent A Sperling, John Hoang, William Andrew Kimes, James E Maslar, Kristen L Steffens, Nhan V Nguyen
Abstract: Atomic layer deposition of titanium dioxide using tetrakis(dimethylamido)titanium (TDMAT) and water vapor is studied by reflection-absorption infrared spectroscopy (RAIRS) with a time resolution of 120 ms. Decomposition of the adsorbed TDMAT is ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=915032

5. Laser-assisted atom probe tomography of MBE grown GaN nanowire heterostructures
Topic: Nanomanufacturing
Published: 2/24/2014
Authors: Norman A Sanford, Paul Timothy Blanchard, Matthew David Brubaker, Kristine A Bertness, John B Schlager, R Kirchofer, David R Diercks, Brian Gorman
Abstract: Laser-assisted atom probe tomography (L-APT) was performed on GaN nanowires (NWs) and axial GaN/InGaN nanowire heterostructures. All samples were grown by MBE on Si(111) substrates. The laser pulse energy (PE) at 355 nm used in L-APT analysis of Ga ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=914658

6. Does Your SEM Really Tell the Truth? - How would you know? Part 1
Topic: Nanomanufacturing
Published: 12/16/2013
Authors: Michael T Postek, Andras Vladar
Abstract: The scanning electron microscope (SEM) has gone through a tremendous evolution to become a critical tool for many and diverse scientific and industrial applications. The high resolution of the SEM is especially suited for both qualitative and quantit ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=912761

7. Atom probe tomography evaporation behavior of C-axis GaN nanowires: Crystallographic, stoichiometric, and detection efficiency aspects
Topic: Nanomanufacturing
Published: 11/13/2013
Authors: Norman A Sanford, David R Diercks, Brian Gorman, R Kirchofer, Kristine A Bertness, Matthew David Brubaker
Abstract: The field evaporation behavior of c-axis GaN nanowires was explored in two different laser-pulsed atom probe tomography (APT) instruments. Transmission electron microscopy imaging before and after atom probe tomography analysis was used to assist in ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=915760

8. Three-dimensional deep sub-wavelength defect detection using (lambda) = 193 nm optical microscopy
Topic: Nanomanufacturing
Published: 10/25/2013
Authors: Bryan M Barnes, Martin Y Sohn, Francois R. Goasmat, Hui H. Zhou, Andras Vladar, Richard M Silver, Abraham Arceo
Abstract: Identifying defects in photolithographic patterning is a persistent challenge in semiconductor manufacturing. Well-established optical methods in current use are jeopardized by upcoming sub-20 nm device dimensions. Volumetric processing of focus-reso ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=914244

9. Size-independent effects on nanoparticle retention behavior in asymmetric flow field-flow fractionation
Topic: Nanomanufacturing
Published: 5/29/2013
Authors: Julien C. Gigault, Vincent A Hackley
Abstract: In this work we highlight the size-independent influence of the material properties of nanoparticles on their retention behavior in asymmetric-flow field-flow fractionation (A4F). The phenomena described here suggest there are limits to the effec ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=913433

10. Block-copolymer healing of simple defects in a chemoepitaxial template
Topic: Nanomanufacturing
Published: 4/11/2013
Authors: Paul N. Patrone, Gregg M. Gallatin
Abstract: Using a phase-field model of block copolymers (BCPs), we characterize how a chemoepitaxial template with parallel lines of arbitrary width affects the BCP microdomain shape. The model, which is an extension of the Leibler-Ohta-Kawasaki theory, accoun ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=913545



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