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Topic Area: Nanomanufacturing
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1. Block-copolymer healing of simple defects in a chemoepitaxial template
Topic: Nanomanufacturing
Published: 4/11/2013
Authors: Paul Nathan Patrone, Gregg M. Gallatin
Abstract: Using a phase-field model of block copolymers (BCPs), we characterize how a chemoepitaxial template with parallel lines of arbitrary width affects the BCP microdomain shape. The model, which is an extension of the Leibler-Ohta-Kawasaki theory, accoun ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=913545

2. Creating large out-of-plane displacement electrothermal motion stage by incorporating beams with step features
Topic: Nanomanufacturing
Published: 3/26/2013
Authors: Yong Sik Kim, Nicholas G Dagalakis, Satyandra K. Gupta
Abstract: Realizing out-of-plane actuation in micro-electro-mechanical systems (MEMS) is still a challenging task. In this paper, the design, fabrication methods and experimental results for a MEMS-based out-of-plane motion stage is presented based on bulk mic ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=913234

3. Quantum Dot Fluorescence Lifetime Engineering with DNA Origami Constructs
Topic: Nanomanufacturing
Published: 1/21/2013
Authors: James Alexander Liddle, Seung-Hyeon Ko, Kan Du
Abstract: The ability to organize nanostructures of disparate types and materials – such as metal nanoparticles and semiconductor quantum dots – is challenging but essential for the creation of novel materials and devices. Metal nanoparticles (NPs) have intere ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=911962

4. DNA Evolves
Topic: Nanomanufacturing
Published: 12/1/2012
Authors: James Alexander Liddle, Seung-Hyeon Ko
Abstract: None
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=912291

5. Optimization of Dispersion and Surface Pretreatment for Single GaN Nanowire Devices
Topic: Nanomanufacturing
Published: 9/28/2012
Authors: Norman A Sanford, Kristine A Bertness, Andrew M. Herrero
Abstract: The correlation of residual contamination with void formation at the contact/SiO2 interface for single GaN NW devices was investigated. The morphology at the metal/SiO2 interface was observed by removing the annealed Ni/Au films from the SiO2 with ca ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=911627

6. Kinematic Modeling and Calibration of a Flexure Based Hexapod Nanopositioner
Topic: Nanomanufacturing
Published: 8/21/2012
Authors: Hongliang Shi, Hai-Jun Su, Nicholas G Dagalakis, John A Kramar
Abstract: This paper covers the kinematic modeling of a flexure-based, hexapod nanopositioner and a new method of calibration for this type of nanopositioner. This six degrees of freedom tri-stage nanopositioner can generate small displacement, high-resolution ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=911830

7. Contour Metrology using Critical Dimension Atomic Force Microscopy
Topic: Nanomanufacturing
Published: 4/9/2012
Authors: Ndubuisi George Orji, Ronald G Dixson, Andras Vladar, Bin Ming, Michael T Postek
Abstract: The critical dimension atomic force microscope (CD-AFM), which is used as a reference instrument in lithography metrology, has been proposed as a supplemental instrument for contour measurement and verification. However, although data from CD-AFM is ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=910915

8. On CD-AFM bias related to probe bending
Topic: Nanomanufacturing
Published: 4/9/2012
Authors: Vladimir A Ukraintsev, Ndubuisi George Orji, Theodore Vincent Vorburger, Ronald G Dixson, Joseph Fu, Richard M Silver
Abstract: Critical Dimension AFM (CD-AFM) is a widely used reference metrology. To characterize modern semiconductor devices, very small and flexible probes, often 15 nm to 20 nm in diameter, are now frequently used. Several recent publications have reported ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=910903

9. Traceable Calibration of a Critical Dimension Atomic Force Microscope
Topic: Nanomanufacturing
Published: 3/9/2012
Authors: Ronald G Dixson, Ndubuisi George Orji, Craig Dyer McGray, John E Bonevich, Jon C Geist
Abstract: The National Institute of Standards and Technology (NIST) has a multifaceted program in atomic force microscope (AFM) dimensional metrology. One component of this program, and the focus of this paper, is the use of critical dimension atomic force ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=908943

10. Strategies for Nanoscale Contour Metrology using Critical Dimension Atomic Force Microscopy
Topic: Nanomanufacturing
Published: 9/30/2011
Authors: Ndubuisi George Orji, Ronald G Dixson, Andras Vladar, Michael T Postek
Abstract: Contour metrology is one of the techniques used to verify optical proximity correction (OPC) in lithography models. The use of these methods, which are known as resolution enhancement techniques (RET), are necessitated by the continued decrease in f ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=909559